JP4482535B2 - 加熱装置 - Google Patents
加熱装置 Download PDFInfo
- Publication number
- JP4482535B2 JP4482535B2 JP2006084106A JP2006084106A JP4482535B2 JP 4482535 B2 JP4482535 B2 JP 4482535B2 JP 2006084106 A JP2006084106 A JP 2006084106A JP 2006084106 A JP2006084106 A JP 2006084106A JP 4482535 B2 JP4482535 B2 JP 4482535B2
- Authority
- JP
- Japan
- Prior art keywords
- ceramic
- resistance
- heating
- low
- ceramic substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010438 heat treatment Methods 0.000 title claims description 125
- 239000000919 ceramic Substances 0.000 claims description 178
- 239000000758 substrate Substances 0.000 claims description 63
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 16
- 239000004917 carbon fiber Substances 0.000 claims description 16
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 37
- 239000000843 powder Substances 0.000 description 26
- 239000002994 raw material Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 17
- 238000005245 sintering Methods 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000010304 firing Methods 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 5
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000009429 electrical wiring Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001694 spray drying Methods 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000007723 die pressing method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910001954 samarium oxide Inorganic materials 0.000 description 1
- 229940075630 samarium oxide Drugs 0.000 description 1
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003826 uniaxial pressing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2214/00—Aspects relating to resistive heating, induction heating and heating using microwaves, covered by groups H05B3/00, H05B6/00
- H05B2214/04—Heating means manufactured by using nanotechnology
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Resistance Heating (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Surface Heating Bodies (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
直径Φ355mmの金型に、焼結後の厚みが2mmとなるように5wt%のY2O3を含有する窒化アルミニウム粉を入れ、一軸加圧成形により円盤状に成形した。また、(1wt%の炭素繊維と、2wt%のY2O3を含有する)低抵抗AlNにより、直径がΦ2mm、軸方向長さが3mmに作製した円柱状の焼結体をあらかじめ作製した。この円柱状の焼結体の体積抵抗率は10Ωcmであり、気孔率は12%、熱膨張係数は5.6ppm/Kであった。この円柱状の焼結体を、上述した円盤状の成形体の中央に孔を開け、埋め込んだ。このとき、低抵抗AlNは成形体より略0.3mm飛び出していた。この低抵抗AlNの円柱状焼結体が低抵抗セラミックス部材16になる。
一方、低抵抗のAlNよりなる円柱状の低抵抗セラミックス部材16を配設することなく、セラミックス基体を作製し、それ以外は実施例1と同様にして、全体を5wt%Y2O3含有窒化アルミニウムからなるヒータープレートを作成した。
直径Φ355mmの金型に、焼結後の厚みが2mmとなるように5wt%のY2O3を含有する窒化アルミニウム粉を入れ、一軸加圧成形により円盤状に成形した。成形体中のピッチ円直径(PCD)が165mmの位置に孔を開けて埋め込んだ。この低抵抗AlN焼結体は後述の焼成後に低抵抗セラミック部材18となる。
一方、低抵抗のAlNよりなる円柱状の低抵抗セラミックス部材18を配設することなくセラミックス基体を作製し、それ以外は実施例2と同様にして、全体を5wt%Y2O3含有窒化アルミニウムからなるヒータープレートを作成した。
11a 加熱面
12 抵抗発熱体
13 高周波電極
16 低抵抗セラミックス部材
Claims (5)
- 被加熱物を加熱する加熱面を有する絶縁性セラミックス基体と、
この絶縁性セラミックス基体の加熱面近傍に埋設された高周波電極と、
この高周波電極よりも前記加熱面から離れて当該絶縁性セラミックス基体に配設された発熱体と、
この絶縁性セラミックス基体の加熱面の一部に露出し、且つ、この絶縁性セラミックス基体内に設けられた導電性部材と接続する低抵抗セラミックス部材と
を備え、
前記低抵抗セラミックス部材は、前記絶縁性セラミックス基体と主成分を共通し、且つ、
,熱膨張係数が同等であることをことを特徴とする加熱装置。 - 前記低抵抗セラミックス部材は、前記絶縁性セラミックス基体と同種のセラミックスに、更に炭素繊維を含むことを特徴とする請求項1に記載の加熱装置。
- 前記絶縁性セラミックス基体及び前記低抵抗セラミックス部材が、共にAlN系セラミックスであることを特徴とする請求項1に記載の加熱装置。
- 前記低抵抗セラミックス部材が、絶縁性セラミックス基体の加熱面における被加熱物、もしくは載置される部材と対向する領域で、これらと接触するように表面に露出していることを特徴とする請求項1に記載の加熱装置。
- 前記低抵抗セラミックス部材が、前記高周波電極と接続していることを特徴とする請求項1に記載の加熱装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006084106A JP4482535B2 (ja) | 2006-03-24 | 2006-03-24 | 加熱装置 |
US11/689,654 US7390990B2 (en) | 2006-03-24 | 2007-03-22 | Heating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006084106A JP4482535B2 (ja) | 2006-03-24 | 2006-03-24 | 加熱装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007258609A JP2007258609A (ja) | 2007-10-04 |
JP4482535B2 true JP4482535B2 (ja) | 2010-06-16 |
Family
ID=38532278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006084106A Active JP4482535B2 (ja) | 2006-03-24 | 2006-03-24 | 加熱装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7390990B2 (ja) |
JP (1) | JP4482535B2 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010080909A (ja) * | 2008-08-26 | 2010-04-08 | Nuflare Technology Inc | ヒータ、半導体製造装置および半導体製造方法 |
JPWO2010027054A1 (ja) * | 2008-09-05 | 2012-02-02 | 国立大学法人北陸先端科学技術大学院大学 | カンチレバー加熱機構、それを用いたカンチレバーホルダ、及び、カンチレバー加熱方法 |
JP2010177415A (ja) * | 2009-01-29 | 2010-08-12 | Kyocera Corp | 保持用治具およびこれを備えた吸着装置 |
DE102009034307A1 (de) | 2009-07-21 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hochtemperaturheizung sowie Verfahren zu dessen Herstellung |
US9909197B2 (en) * | 2014-12-22 | 2018-03-06 | Semes Co., Ltd. | Supporting unit and substrate treating apparatus including the same |
DE102018105220A1 (de) * | 2018-03-07 | 2019-09-12 | Hauni Maschinenbau Gmbh | Verfahren zur Fertigung eines elektrisch betreibbaren Heizkörpers für einen Inhalator |
KR20210125539A (ko) * | 2019-03-18 | 2021-10-18 | 엔지케이 인슐레이터 엘티디 | 세라믹 히터 |
US20210183627A1 (en) * | 2019-12-11 | 2021-06-17 | International Business Machines Corporation | Apparatus For Reducing Wafer Contamination During ION-Beam Etching Processes |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002134590A (ja) * | 2000-10-23 | 2002-05-10 | Ngk Insulators Ltd | 半導体製造装置用サセプター |
JP2002526915A (ja) * | 1998-09-30 | 2002-08-20 | アプライド マテリアルズ インコーポレイテッド | 半導体ウェーハ処理装置にウェーハを保持する静電チャック内蔵カソード組立体 |
JP2004152865A (ja) * | 2002-10-29 | 2004-05-27 | Nhk Spring Co Ltd | ステージ |
JP2005041765A (ja) * | 2003-07-07 | 2005-02-17 | Ngk Insulators Ltd | 窒化アルミニウム焼結体、静電チャック、導電性部材、半導体製造装置用部材及び窒化アルミニウム焼結体の製造方法 |
JP2005294648A (ja) * | 2004-04-01 | 2005-10-20 | Ngk Insulators Ltd | 静電チャックとその製造方法 |
JP2007277702A (ja) * | 2006-03-16 | 2007-10-25 | Tokyo Electron Ltd | 基板載置台および基板処理装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100798179B1 (ko) * | 2001-04-27 | 2008-01-24 | 교세라 가부시키가이샤 | 웨이퍼 가열장치 |
-
2006
- 2006-03-24 JP JP2006084106A patent/JP4482535B2/ja active Active
-
2007
- 2007-03-22 US US11/689,654 patent/US7390990B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002526915A (ja) * | 1998-09-30 | 2002-08-20 | アプライド マテリアルズ インコーポレイテッド | 半導体ウェーハ処理装置にウェーハを保持する静電チャック内蔵カソード組立体 |
JP2002134590A (ja) * | 2000-10-23 | 2002-05-10 | Ngk Insulators Ltd | 半導体製造装置用サセプター |
JP2004152865A (ja) * | 2002-10-29 | 2004-05-27 | Nhk Spring Co Ltd | ステージ |
JP2005041765A (ja) * | 2003-07-07 | 2005-02-17 | Ngk Insulators Ltd | 窒化アルミニウム焼結体、静電チャック、導電性部材、半導体製造装置用部材及び窒化アルミニウム焼結体の製造方法 |
JP2005294648A (ja) * | 2004-04-01 | 2005-10-20 | Ngk Insulators Ltd | 静電チャックとその製造方法 |
JP2007277702A (ja) * | 2006-03-16 | 2007-10-25 | Tokyo Electron Ltd | 基板載置台および基板処理装置 |
Also Published As
Publication number | Publication date |
---|---|
US20070221649A1 (en) | 2007-09-27 |
US7390990B2 (en) | 2008-06-24 |
JP2007258609A (ja) | 2007-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4421595B2 (ja) | 加熱装置 | |
JP4482535B2 (ja) | 加熱装置 | |
JP4040284B2 (ja) | プラズマ発生用電極内蔵型サセプタ及びその製造方法 | |
JP4394667B2 (ja) | ヒータ付き静電チャックの製造方法 | |
JP4467453B2 (ja) | セラミックス部材及びその製造方法 | |
JP4476701B2 (ja) | 電極内蔵焼結体の製造方法 | |
JP4482472B2 (ja) | 静電チャック及びその製造方法 | |
JP5117146B2 (ja) | 加熱装置 | |
KR20070066890A (ko) | 정전척 | |
JP5341049B2 (ja) | セラミックス焼結体の製造方法、セラミックス焼結体およびセラミックスヒータ | |
JP2006196864A (ja) | アルミナ部材及びその製造方法 | |
JP2001274230A (ja) | 半導体製造装置用ウェハ保持体 | |
KR20050018599A (ko) | 전극 내장 발열체의 제조 방법 | |
KR20080037879A (ko) | 히터 및 이의 제조방법 | |
JP2004296254A (ja) | セラミックスヒータおよびそれを搭載した半導体あるいは液晶製造装置 | |
JP2006332068A (ja) | セラミックスヒータおよびそれを搭載した半導体あるいは液晶製造装置 | |
JP4436575B2 (ja) | ウエハ支持部材及びその製造方法 | |
JP2005093919A (ja) | 静電チャック及びその製造方法 | |
JP2004288887A (ja) | 半導体製造装置用ウェハ保持体およびそれを搭載した半導体製造装置 | |
JP4522963B2 (ja) | 加熱装置 | |
JP2004031596A (ja) | 端子電極部材 | |
JP4069875B2 (ja) | ウェハ保持部材 | |
JP2002176096A (ja) | 半導体処理装置用セラミックス部材の製造方法 | |
JP2004111289A (ja) | セラミックスヒータ及びその製造方法 | |
JP2005166821A (ja) | ウェーハ保持用静電チャック及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20071114 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20090629 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20090715 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100316 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100319 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130326 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4482535 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140326 Year of fee payment: 4 |