JP5328437B2 - 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置 - Google Patents

透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置 Download PDF

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JP5328437B2
JP5328437B2 JP2009074273A JP2009074273A JP5328437B2 JP 5328437 B2 JP5328437 B2 JP 5328437B2 JP 2009074273 A JP2009074273 A JP 2009074273A JP 2009074273 A JP2009074273 A JP 2009074273A JP 5328437 B2 JP5328437 B2 JP 5328437B2
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Prior art keywords
transmitted wavefront
transmitted
diffraction grating
refractive index
wavefront
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Japanese (ja)
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JP2010223903A (ja
JP2010223903A5 (OSRAM
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正磨 加藤
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Canon Inc
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Canon Inc
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Priority to JP2009074273A priority Critical patent/JP5328437B2/ja
Priority to EP10156669.3A priority patent/EP2233905A3/en
Priority to US12/728,878 priority patent/US8786863B2/en
Publication of JP2010223903A publication Critical patent/JP2010223903A/ja
Publication of JP2010223903A5 publication Critical patent/JP2010223903A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Geometry (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2009074273A 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置 Expired - Fee Related JP5328437B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009074273A JP5328437B2 (ja) 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置
EP10156669.3A EP2233905A3 (en) 2009-03-25 2010-03-16 Transmitted wavefront measuring method, refractive-index distribution measuring method, method of manufacturing optical element, and transmitted wavefront measuring apparatus
US12/728,878 US8786863B2 (en) 2009-03-25 2010-03-22 Transmitted wavefront measuring method, refractive-index distribution measuring method, and transmitted wavefront measuring apparatus that calculate a frequency distribution and obtain a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution

Applications Claiming Priority (1)

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JP2009074273A JP5328437B2 (ja) 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置

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JP2010223903A JP2010223903A (ja) 2010-10-07
JP2010223903A5 JP2010223903A5 (OSRAM) 2012-05-17
JP5328437B2 true JP5328437B2 (ja) 2013-10-30

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US (1) US8786863B2 (OSRAM)
EP (1) EP2233905A3 (OSRAM)
JP (1) JP5328437B2 (OSRAM)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5008650B2 (ja) * 2008-12-25 2012-08-22 キヤノン株式会社 屈折率分布計測方法及び屈折率分布計測装置
JP4968966B2 (ja) * 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP4895409B2 (ja) 2010-05-25 2012-03-14 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5021054B2 (ja) 2010-05-25 2012-09-05 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5008763B2 (ja) 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法
JP5675382B2 (ja) * 2011-01-14 2015-02-25 キヤノン株式会社 シアリング干渉測定装置
JP5725874B2 (ja) * 2011-01-14 2015-05-27 キヤノン株式会社 シアリング干渉測定装置およびその校正方法
GB201107053D0 (en) 2011-04-27 2011-06-08 Univ Sheffield Improvements in providing image data
JP5885405B2 (ja) * 2011-06-13 2016-03-15 キヤノン株式会社 撮像装置、干渉縞解析プログラム及び干渉縞解析方法
GB201201140D0 (en) 2012-01-24 2012-03-07 Phase Focus Ltd Method and apparatus for determining object characteristics
GB201207800D0 (en) 2012-05-03 2012-06-13 Phase Focus Ltd Improvements in providing image data
US8918746B1 (en) * 2013-09-04 2014-12-23 Globalfoundries Inc. Cut mask aware contact enclosure rule for grating and cut patterning solution
EP3315948B1 (de) * 2016-10-26 2019-09-04 Heraeus Quarzglas GmbH & Co. KG Verfahren zur ermittlung des brechzahlprofils eines zylinderförmigen optischen gegenstandes
JP7277101B2 (ja) 2018-10-11 2023-05-18 キヤノン株式会社 収差推定方法、収差推定装置、プログラムおよび記憶媒体
JP7382629B2 (ja) * 2019-10-25 2023-11-17 大塚電子株式会社 光学測定装置および波長校正方法
US11788927B2 (en) 2021-02-26 2023-10-17 Heraeus Quartz North America Llc Evaluation of preforms with non-step-index refractive-index-profile (RIP)
CN113984222B (zh) * 2021-10-28 2024-06-14 中山光子科学中心 光栅压缩器波前畸变在线测量装置及测量方法
CN115266042B (zh) * 2022-08-15 2024-12-31 西安工业大学 一种多方位四波剪切干涉测量方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265534A (en) 1977-12-23 1981-05-05 Remijan Paul W Optical apparatus and method for producing the same
US4542989A (en) 1981-03-02 1985-09-24 Randwal Instrument Co., Inc. Apparatus for position encoding
US4541697A (en) 1981-03-03 1985-09-17 Randwal Instrument Co., Inc. Ophthalmic testing devices
JPS5845526A (ja) 1981-09-12 1983-03-16 Canon Inc タルボ干渉計
IT1155285B (it) 1982-02-10 1987-01-28 Cselt Centro Studi Lab Telecom Procedimento e apparecchiatura per la determinazione del profilo d'indice di rifrazione di fibre ottiche e preforme per fibre ottiche
JPS6170436A (ja) 1984-09-14 1986-04-11 Univ Kyoto 円柱内屈折率分布測定方法
US5151752A (en) 1988-06-16 1992-09-29 Asahi Kogaku Kogyo K.K. Method of measuring refractive indices of lens and sample liquid
JP2678463B2 (ja) 1988-06-16 1997-11-17 旭光学工業株式会社 屈折率測定方法
JP2678464B2 (ja) 1988-06-27 1997-11-17 旭光学工業株式会社 屈折率測定方法
US4934818A (en) 1989-03-24 1990-06-19 American Telephone And Telegraph Company Refractive index profiling technique
JPH03128411A (ja) 1989-10-13 1991-05-31 Hitachi Metals Ltd 光学的形状測定装置
JP2892075B2 (ja) 1990-01-31 1999-05-17 末三 中楯 屈折率分布、透過波面の測定方法およびこの方法に用いる測定装置
US5309214A (en) 1991-09-17 1994-05-03 Olympus Optical Co., Ltd. Method for measuring distributed dispersion of gradient-index optical elements and optical system to be used for carrying out the method
JP3264469B2 (ja) 1993-12-07 2002-03-11 富士写真フイルム株式会社 光散乱媒体の屈折率分布情報の計測装置
JP3287517B2 (ja) 1994-06-29 2002-06-04 富士写真光機株式会社 干渉縞による測定方法および装置
JPH08304229A (ja) 1995-05-09 1996-11-22 Ricoh Co Ltd 光学素子の屈折率分布の測定方法および装置
JP3699810B2 (ja) 1997-07-29 2005-09-28 株式会社リコー 屈折率分布の測定方法及び装置
US6765661B2 (en) 2001-03-09 2004-07-20 Novartis Ag Lens inspection
EP1359445A3 (en) * 2002-04-30 2003-12-10 Alcatel Inverse fourier transform method, phase characterisation method of optical components from transmission and group delay measurements as well as a system for performing the method
SE0302676D0 (sv) 2003-10-09 2003-10-09 Neural Ab Method and apparatus for holographic refractometry
JP2005159213A (ja) * 2003-11-28 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法
JP4319554B2 (ja) 2004-01-14 2009-08-26 株式会社リコー 屈折率分布の測定方法および測定装置
JP3762420B2 (ja) 2004-12-28 2006-04-05 株式会社リコー 屈折率分布の測定方法及び装置
JP4594114B2 (ja) 2005-01-19 2010-12-08 キヤノン株式会社 画像処理装置および屈折率分布測定装置
JP4731951B2 (ja) * 2005-02-28 2011-07-27 キヤノン株式会社 干渉縞の解析方法及び装置、測定装置、露光装置及びデバイス製造方法
DE102005039679A1 (de) 2005-08-22 2007-03-08 Galatea Ltd. Verfahren zum Bestimmen des Wertes eines Objekts
US7594729B2 (en) 2007-10-31 2009-09-29 Wf Systems, Llc Wavefront sensor
JP5008650B2 (ja) 2008-12-25 2012-08-22 キヤノン株式会社 屈折率分布計測方法及び屈折率分布計測装置
JP4968966B2 (ja) 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP5021054B2 (ja) 2010-05-25 2012-09-05 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP4895409B2 (ja) 2010-05-25 2012-03-14 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5008763B2 (ja) 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法

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JP2010223903A (ja) 2010-10-07
US8786863B2 (en) 2014-07-22
EP2233905A2 (en) 2010-09-29
US20100245842A1 (en) 2010-09-30
EP2233905A3 (en) 2016-05-25

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