JP5325301B2 - マイクロミラーを駆動する方法及びデバイス - Google Patents

マイクロミラーを駆動する方法及びデバイス Download PDF

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JP5325301B2
JP5325301B2 JP2011530409A JP2011530409A JP5325301B2 JP 5325301 B2 JP5325301 B2 JP 5325301B2 JP 2011530409 A JP2011530409 A JP 2011530409A JP 2011530409 A JP2011530409 A JP 2011530409A JP 5325301 B2 JP5325301 B2 JP 5325301B2
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Prior art keywords
tilt
micromirror
control
actuators
actuator
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JP2012505533A5 (enExample
JP2012505533A (ja
Inventor
ホルン ヤン
ケンプター クリスティアン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Micromachines (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
JP2011530409A 2008-10-08 2009-10-06 マイクロミラーを駆動する方法及びデバイス Active JP5325301B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10369108P 2008-10-08 2008-10-08
DE102008050446.7 2008-10-08
US61/103,691 2008-10-08
DE102008050446A DE102008050446B4 (de) 2008-10-08 2008-10-08 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
PCT/EP2009/007175 WO2010040506A1 (en) 2008-10-08 2009-10-06 Methods and devices for driving micromirrors

Publications (3)

Publication Number Publication Date
JP2012505533A JP2012505533A (ja) 2012-03-01
JP2012505533A5 JP2012505533A5 (enExample) 2012-04-12
JP5325301B2 true JP5325301B2 (ja) 2013-10-23

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JP2011530409A Active JP5325301B2 (ja) 2008-10-08 2009-10-06 マイクロミラーを駆動する方法及びデバイス

Country Status (8)

Country Link
US (2) US8345224B2 (enExample)
EP (2) EP3193203B1 (enExample)
JP (1) JP5325301B2 (enExample)
KR (1) KR101233900B1 (enExample)
CN (2) CN104267495B (enExample)
DE (1) DE102008050446B4 (enExample)
TW (1) TWI502282B (enExample)
WO (1) WO2010040506A1 (enExample)

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TWI587002B (zh) 2011-06-13 2017-06-11 尼康股份有限公司 照明方法
WO2013061858A1 (ja) 2011-10-24 2013-05-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
JP5918858B2 (ja) 2011-11-15 2016-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光変調器及び照明系
DE102013201506A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
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JPWO2013164997A1 (ja) 2012-05-02 2015-12-24 株式会社ニコン 瞳輝度分布の評価方法および改善方法、照明光学系およびその調整方法、露光装置、露光方法、並びにデバイス製造方法
DE102012011202A1 (de) * 2012-06-06 2013-09-12 Carl Zeiss Smt Gmbh Projektor und Verfahren zum Erzeugen eines Bildes
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CN110347082B (zh) * 2019-07-12 2021-07-27 中国科学院上海微系统与信息技术研究所 一种驱动电路、驱动方法及微反射镜阵列
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CN114660880A (zh) * 2022-04-11 2022-06-24 长沙沃默科技有限公司 一种反射式投影成像装置及其设计方法
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Also Published As

Publication number Publication date
KR101233900B1 (ko) 2013-02-15
DE102008050446A1 (de) 2010-04-15
CN104267495A (zh) 2015-01-07
TW201019051A (en) 2010-05-16
CN102177460A (zh) 2011-09-07
KR20110067156A (ko) 2011-06-21
US20130088698A1 (en) 2013-04-11
US20110188017A1 (en) 2011-08-04
TWI502282B (zh) 2015-10-01
JP2012505533A (ja) 2012-03-01
EP2340456A1 (en) 2011-07-06
CN104267495B (zh) 2016-12-07
DE102008050446B4 (de) 2011-07-28
US8345224B2 (en) 2013-01-01
WO2010040506A1 (en) 2010-04-15
EP3193203B1 (en) 2018-08-29
EP3193203A1 (en) 2017-07-19
EP2340456B1 (en) 2017-04-05
US10061202B2 (en) 2018-08-28

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