JP5311615B2 - 化学修飾ポリオール脱水素酵素およびその製造方法 - Google Patents
化学修飾ポリオール脱水素酵素およびその製造方法 Download PDFInfo
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- JP5311615B2 JP5311615B2 JP2008041183A JP2008041183A JP5311615B2 JP 5311615 B2 JP5311615 B2 JP 5311615B2 JP 2008041183 A JP2008041183 A JP 2008041183A JP 2008041183 A JP2008041183 A JP 2008041183A JP 5311615 B2 JP5311615 B2 JP 5311615B2
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- polyol
- chemically modified
- enzyme
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- dehydrogenase
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- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- NRHMKIHPTBHXPF-TUJRSCDTSA-M sodium cholate Chemical compound [Na+].C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC([O-])=O)C)[C@@]2(C)[C@@H](O)C1 NRHMKIHPTBHXPF-TUJRSCDTSA-M 0.000 description 1
- BEOOHQFXGBMRKU-UHFFFAOYSA-N sodium cyanoborohydride Chemical compound [Na+].[B-]C#N BEOOHQFXGBMRKU-UHFFFAOYSA-N 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 229960005322 streptomycin Drugs 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003626 triacylglycerols Chemical class 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- UFTFJSFQGQCHQW-UHFFFAOYSA-N triformin Chemical compound O=COCC(OC=O)COC=O UFTFJSFQGQCHQW-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000005199 ultracentrifugation Methods 0.000 description 1
- 229940088594 vitamin Drugs 0.000 description 1
- 229930003231 vitamin Natural products 0.000 description 1
- 235000013343 vitamin Nutrition 0.000 description 1
- 239000011782 vitamin Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Images
Landscapes
- Enzymes And Modification Thereof (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
Description
PQQ依存性PDHの酵素活性は、50μM DCIP、0.2mM 5−メチルフェナジニウムメチルスルファート(PMS)、450mM グリセロールを含んだ0.1% トライトンX−100を含む10mM リン酸緩衝液pH 7.0中に、酵素溶液を加え、酵素と基質との反応をDCIPの600nmの吸光度変化によって追跡し、その吸光度の減少速度を酵素の反応速度とした。ここで、1分間に1μmolのDCIPが還元される酵素活性を1単位(U)とした。なお、DCIPのpH 7.0におけるミリモル吸光係数は16.3mM−1とした。
ソルビトール 2g/100mL、酵母エキス 0.3g/100mL、肉エキス 0.3g/100mL、コーンスティープリカー 0.3g/100mL、ポリペプトン 1g/100mL、尿素 0.1g/100mL、KH2PO4 0.1g/100mL、MgSO4・7H2O 0.02g/100mL、CaCl2・2H2O 0.1g/100mL、pH 7.0からなる培地100mLを調製し、500mL容の坂口フラスコに該培地80mLを移し、121℃、20分間オートクレーブ処理した。
実施例1で得た修飾PDHの熱安定性を検討するため、10分間、ウォーターバスにより各温度でインキュベートした後、残存する酵素活性を測定した。結果を図1に示す(架橋PDH)。また、実施例1で使用したグルコノバクター・オキシダンス(Gluconobacter oxydans)NBRC3291を用いて同様に残存する酵素活性を測定した結果(未架橋PDH)を併せて図1に示す。図1において、架橋処理により50℃での残存活性は0%から80%にまで向上した。
実施例1の架橋法の再現性を確認するため、同条件で5回同じ実験を行った。また、上記実験により得られた修飾PDHの熱安定性を、実施例2と同様にして評価した。結果を下記表1に示す。
特開2006−271257号公報の実施例1に記載の方法と同様にして、比較用修飾PDHを得た。当該比較例1の架橋法の再現性を確認するため、同条件で5回同じ実験を行った。また、これらの実験で得られた各比較用修飾PDHの熱安定性を、実施例2と同様にして評価した。結果を下記表1に示す。
50μM DCIP、0.2mM PMS、酵素溶液(0.3U)を含んだ0.1g/100mL トライトンX−100を含む10mMリン酸緩衝液(pH 7.0)中に、終濃度が100、200、300、400、500μLになるようにグリセロールを加えDCIPの600nmにおける吸光度の減少を測定した。結果を図2に示す。
実施例1で得た修飾PDH(比活性16.2U/mg蛋白)の金属イオンによる影響を以下のようにして検討した。なお、比較対照としては、実施例1で使用したグルコノバクター・オキシダンス由来PDH(比活性17.0U/mg蛋白、蛋白濃度:0.625mg/mL;以下、「未架橋PDH」と称する)を使用した。
Claims (5)
- 補欠分子族としてピロロキノリンキノンを含むポリオール脱水素酵素を、界面活性剤の存在下、グルタルアルデヒドで化学修飾する工程を有する化学修飾ポリオール脱水素酵素の製造方法であって、
前記ポリオール脱水素酵素の化学修飾は、終濃度が0.1〜0.7g/100mLのグルタルアルデヒドの存在下で、7.0〜9.5のpH、0〜25℃の条件で、10分〜3時間、行ない、
前記ポリオール脱水素酵素の化学修飾後の架橋反応液に、7.5〜9.5のpHで、終濃度で0.01〜5Mとなるようにアミノ基を有する停止剤を添加して、4〜40℃で5〜180分、反応させることにより、前記化学修飾を停止させることを特徴とする、化学修飾ポリオール脱水素酵素の製造方法。 - 前記ポリオール脱水素酵素の化学修飾は、終濃度が0.1〜0.5g/100mLのグルタルアルデヒドの存在下で、7.5〜9.0のpH、4〜25℃の条件で、10分〜2時間、行なわれる、請求項1に記載の製造方法。
- 前記化学修飾されるポリオール脱水素酵素は、グリセロールを基質とする、請求項1または2に記載の製造方法。
- 請求項1〜3のいずれかに記載の方法で得られる化学修飾ポリオール脱水素酵素を用いた、ポリオール測定試薬。
- 請求項1〜3のいずれかに記載の方法で得られる化学修飾ポリオール脱水素酵素をポリオールと反応させることを特徴とする、ポリオールの定量法。
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