JP5295283B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5295283B2
JP5295283B2 JP2011024428A JP2011024428A JP5295283B2 JP 5295283 B2 JP5295283 B2 JP 5295283B2 JP 2011024428 A JP2011024428 A JP 2011024428A JP 2011024428 A JP2011024428 A JP 2011024428A JP 5295283 B2 JP5295283 B2 JP 5295283B2
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mask
space
exposure apparatus
pressure
deflection
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Japanese (ja)
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JP2011128646A (ja
JP2011128646A5 (enrdf_load_stackoverflow
Inventor
晶広 ▲高▼橋
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011024428A 2011-02-07 2011-02-07 露光装置及びデバイス製造方法 Expired - Fee Related JP5295283B2 (ja)

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JP2011024428A JP5295283B2 (ja) 2011-02-07 2011-02-07 露光装置及びデバイス製造方法

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JP2011024428A JP5295283B2 (ja) 2011-02-07 2011-02-07 露光装置及びデバイス製造方法

Related Parent Applications (1)

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JP2004322575A Division JP5006513B2 (ja) 2004-11-05 2004-11-05 露光装置及びデバイス製造方法

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JP2011128646A JP2011128646A (ja) 2011-06-30
JP2011128646A5 JP2011128646A5 (enrdf_load_stackoverflow) 2011-09-08
JP5295283B2 true JP5295283B2 (ja) 2013-09-18

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5847474B2 (ja) 2011-07-22 2016-01-20 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法
US10088756B2 (en) 2014-07-08 2018-10-02 Asml Netherlands B.V. Lithographic apparatus and method
CN113741151A (zh) * 2020-05-29 2021-12-03 上海微电子装备（集团）股份有限公司 一种掩膜板整形装置及掩膜板整形方法、光刻机

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2787082B2 (ja) * 1988-11-24 1998-08-13 株式会社ニコン 投影式露光装置および投影式露光方法ならびに素子製造方法
JPH02176752A (ja) * 1988-12-28 1990-07-09 Toppan Printing Co Ltd 露光用マスク及びその撓み防止治具
JPH0731539Y2 (ja) * 1989-02-15 1995-07-19 富士通株式会社 基板処理装置
JPH0318011A (ja) * 1989-06-14 1991-01-25 Matsushita Electron Corp 縮小投影露光装置
JPH0729791A (ja) * 1993-07-08 1995-01-31 Toshiba Corp 露光装置
JPH0882919A (ja) * 1994-09-12 1996-03-26 Hitachi Ltd ホトマスクおよびそれを用いた露光装置
JP2002033258A (ja) * 2000-07-17 2002-01-31 Nikon Corp 露光装置、マスク装置及びパターン保護装置、並びにデバイス製造方法
JP2002158153A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置およびペリクル空間内ガス置換方法
JP2002372777A (ja) * 2001-06-18 2002-12-26 Canon Inc ガス置換方法および露光装置
JP4340046B2 (ja) * 2002-07-25 2009-10-07 株式会社日立ハイテクノロジーズ 露光装置のマスク板固定方法およびマスク板支持装置

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