JP5278129B2 - 電気光学装置及び電子機器 - Google Patents
電気光学装置及び電子機器 Download PDFInfo
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- JP5278129B2 JP5278129B2 JP2009098120A JP2009098120A JP5278129B2 JP 5278129 B2 JP5278129 B2 JP 5278129B2 JP 2009098120 A JP2009098120 A JP 2009098120A JP 2009098120 A JP2009098120 A JP 2009098120A JP 5278129 B2 JP5278129 B2 JP 5278129B2
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- 238000003860 storage Methods 0.000 claims description 7
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- 239000000463 material Substances 0.000 abstract description 11
- 239000010410 layer Substances 0.000 description 99
- 239000010408 film Substances 0.000 description 85
- 239000004973 liquid crystal related substance Substances 0.000 description 60
- 230000004048 modification Effects 0.000 description 13
- 238000012986 modification Methods 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 10
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
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- 239000003566 sealing material Substances 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
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- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000382 optic material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
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- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009098120A JP5278129B2 (ja) | 2009-04-14 | 2009-04-14 | 電気光学装置及び電子機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009098120A JP5278129B2 (ja) | 2009-04-14 | 2009-04-14 | 電気光学装置及び電子機器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010250005A JP2010250005A (ja) | 2010-11-04 |
| JP2010250005A5 JP2010250005A5 (https=) | 2012-05-31 |
| JP5278129B2 true JP5278129B2 (ja) | 2013-09-04 |
Family
ID=43312413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009098120A Active JP5278129B2 (ja) | 2009-04-14 | 2009-04-14 | 電気光学装置及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5278129B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5808944B2 (ja) | 2011-05-11 | 2015-11-10 | ピクストロニクス，インコーポレイテッド | 表示装置及び表示装置の製造方法 |
| KR102086805B1 (ko) * | 2013-11-19 | 2020-03-09 | 엘지디스플레이 주식회사 | 유기전계발광표시장치 |
| KR102558900B1 (ko) | 2015-10-23 | 2023-07-25 | 엘지디스플레이 주식회사 | 표시장치와 이의 제조방법 |
| JP2018004793A (ja) | 2016-06-29 | 2018-01-11 | セイコーエプソン株式会社 | 電子機器および電気光学装置 |
| WO2022082737A1 (zh) * | 2020-10-23 | 2022-04-28 | 京东方科技集团股份有限公司 | 显示基板及其制作方法、显示装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10104595A (ja) * | 1996-09-30 | 1998-04-24 | Matsushita Electric Ind Co Ltd | 表示装置およびその製造方法 |
| JP3956630B2 (ja) * | 2000-03-13 | 2007-08-08 | セイコーエプソン株式会社 | 電気光学装置及び投射型表示装置 |
| JP4434644B2 (ja) * | 2003-07-18 | 2010-03-17 | 東芝モバイルディスプレイ株式会社 | 薄膜トランジスタの製造方法と、この薄膜トランジスタを備える表示装置の製造方法 |
| JP2005148387A (ja) * | 2003-11-14 | 2005-06-09 | Seiko Epson Corp | 電気光学装置の製造方法及び電気光学装置、並びにこれを備えた電子機器 |
| JP5066940B2 (ja) * | 2007-02-28 | 2012-11-07 | カシオ計算機株式会社 | 液晶表示装置 |
| JP5262973B2 (ja) * | 2009-05-11 | 2013-08-14 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
-
2009
- 2009-04-14 JP JP2009098120A patent/JP5278129B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010250005A (ja) | 2010-11-04 |
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