JP5265181B2 - 保護膜製造方法 - Google Patents

保護膜製造方法 Download PDF

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Publication number
JP5265181B2
JP5265181B2 JP2007315770A JP2007315770A JP5265181B2 JP 5265181 B2 JP5265181 B2 JP 5265181B2 JP 2007315770 A JP2007315770 A JP 2007315770A JP 2007315770 A JP2007315770 A JP 2007315770A JP 5265181 B2 JP5265181 B2 JP 5265181B2
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JP
Japan
Prior art keywords
oxide film
anodic oxide
temperature
film
water
Prior art date
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JP2007315770A
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English (en)
Japanese (ja)
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JP2009138229A (ja
JP2009138229A5 (https=
Inventor
さかえ 稲吉
文昭 石榑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2007315770A priority Critical patent/JP5265181B2/ja
Priority to PCT/JP2008/072024 priority patent/WO2009072546A1/ja
Priority to CN2008801191634A priority patent/CN101889108B/zh
Priority to KR1020107010913A priority patent/KR101222921B1/ko
Priority to TW097147427A priority patent/TWI481748B/zh
Publication of JP2009138229A publication Critical patent/JP2009138229A/ja
Publication of JP2009138229A5 publication Critical patent/JP2009138229A5/ja
Application granted granted Critical
Publication of JP5265181B2 publication Critical patent/JP5265181B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C25D11/246—Chemical after-treatment for sealing layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Treatment Of Metals (AREA)
JP2007315770A 2007-12-06 2007-12-06 保護膜製造方法 Active JP5265181B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007315770A JP5265181B2 (ja) 2007-12-06 2007-12-06 保護膜製造方法
PCT/JP2008/072024 WO2009072546A1 (ja) 2007-12-06 2008-12-04 保護膜製造方法
CN2008801191634A CN101889108B (zh) 2007-12-06 2008-12-04 保护膜制造方法
KR1020107010913A KR101222921B1 (ko) 2007-12-06 2008-12-04 보호막 제조방법
TW097147427A TWI481748B (zh) 2007-12-06 2008-12-05 保護膜之製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007315770A JP5265181B2 (ja) 2007-12-06 2007-12-06 保護膜製造方法

Publications (3)

Publication Number Publication Date
JP2009138229A JP2009138229A (ja) 2009-06-25
JP2009138229A5 JP2009138229A5 (https=) 2010-09-16
JP5265181B2 true JP5265181B2 (ja) 2013-08-14

Family

ID=40717723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007315770A Active JP5265181B2 (ja) 2007-12-06 2007-12-06 保護膜製造方法

Country Status (5)

Country Link
JP (1) JP5265181B2 (https=)
KR (1) KR101222921B1 (https=)
CN (1) CN101889108B (https=)
TW (1) TWI481748B (https=)
WO (1) WO2009072546A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5361627B2 (ja) * 2009-09-14 2013-12-04 株式会社アルバック 真空用バルブ筐体及び真空用バルブ
KR20110131136A (ko) * 2010-05-28 2011-12-06 성균관대학교산학협력단 수분 및/또는 산소 투과 방지를 위한 유연성 유/무기 복합 보호막, 그의 제조방법, 및 상기 유연성 유/무기 복합 보호막을 포함하는 전자소자
DE102012204636A1 (de) * 2012-03-22 2013-09-26 Nanogate Ag Behandlung einer anodisch oxidierten Oberfläche
CN102660763B (zh) * 2012-05-07 2014-09-03 复旦大学 一种高催化性质TiO2纳米管阵列薄膜的制备方法及应用
US9702053B2 (en) * 2012-06-29 2017-07-11 Apple Inc. Elimination of crazing in anodized layers
JP6562500B2 (ja) * 2015-03-31 2019-08-21 地方独立行政法人山口県産業技術センター 表面処理アルミニウム材とその製造方法
JPWO2017018462A1 (ja) * 2015-07-30 2018-06-28 富士フイルム株式会社 アルミニウム板
US11312107B2 (en) * 2018-09-27 2022-04-26 Apple Inc. Plugging anodic oxides for increased corrosion resistance
TWI844867B (zh) * 2022-06-13 2024-06-11 陳宣甫 應用於熔融爐之飛灰處理方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB965837A (en) * 1962-06-19 1964-08-06 Charles Calvin Cohn Treatment of aluminum oxide coatings
JPS5273140A (en) * 1975-12-15 1977-06-18 Matsushita Electric Industrial Co Ltd Production process for alumite products
ATE138T1 (de) * 1978-05-22 1981-08-15 Alcan Res & Dev Verfahren zum verdichten von anodisiertem aluminium und das so erhaltene produkt.
CN1003656B (zh) * 1986-07-09 1989-03-22 国家海洋局海洋技术研究所 阳极氧化铝的封闭方法
JP2614133B2 (ja) * 1990-04-20 1997-05-28 富士写真フイルム株式会社 印刷版用支持体の表面処理装置
JPH04141600A (ja) * 1990-10-01 1992-05-15 Showa Alum Corp アルミニウム製品の陽極酸化皮膜封孔処理法
JP2767727B2 (ja) * 1991-11-05 1998-06-18 富士写真フイルム株式会社 平版印刷版用支持体の封孔処理方法及び装置
AU749026B2 (en) * 1997-08-22 2002-06-13 Henkel Corporation Faster two-step sealing of anodized aluminum surfaces

Also Published As

Publication number Publication date
TW200938663A (en) 2009-09-16
JP2009138229A (ja) 2009-06-25
CN101889108A (zh) 2010-11-17
CN101889108B (zh) 2012-07-04
TWI481748B (zh) 2015-04-21
KR20100072084A (ko) 2010-06-29
WO2009072546A1 (ja) 2009-06-11
KR101222921B1 (ko) 2013-01-17

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