JP5214442B2 - ２次元小角ｘ線散乱カメラ - Google Patents

２次元小角ｘ線散乱カメラ Download PDF

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JP5214442B2
JP5214442B2 JP2008514618A JP2008514618A JP5214442B2 JP 5214442 B2 JP5214442 B2 JP 5214442B2 JP 2008514618 A JP2008514618 A JP 2008514618A JP 2008514618 A JP2008514618 A JP 2008514618A JP 5214442 B2 JP5214442 B2 JP 5214442B2
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Prior art keywords
dimensional
collimation
pair
ray scattering
sample
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Japanese (ja)
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JP2008542751A5 (https=
JP2008542751A (ja
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ジャン、リーカイ
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オスミック、インコーポレイテッド
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/04—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using variable diaphragms, shutters, choppers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2008514618A 2005-05-31 2006-01-04 ２次元小角ｘ線散乱カメラ Expired - Lifetime JP5214442B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/142,862 US7139366B1 (en) 2005-05-31 2005-05-31 Two-dimensional small angle x-ray scattering camera
US11/142,862 2005-05-31
PCT/US2006/000290 WO2006130182A1 (en) 2005-05-31 2006-01-04 Two-dimensional small angle x-ray scattering camera

Publications (3)

Publication Number Publication Date
JP2008542751A JP2008542751A (ja) 2008-11-27
JP2008542751A5 JP2008542751A5 (https=) 2009-04-30
JP5214442B2 true JP5214442B2 (ja) 2013-06-19

Family

ID=36143216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008514618A Expired - Lifetime JP5214442B2 (ja) 2005-05-31 2006-01-04 ２次元小角ｘ線散乱カメラ

Country Status (5)

Country Link
US (3) US7139366B1 (https=)
EP (1) EP1886125B1 (https=)
JP (1) JP5214442B2 (https=)
CA (1) CA2610555C (https=)
WO (1) WO2006130182A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10317677A1 (de) * 2003-04-17 2004-11-18 Bruker Axs Gmbh Primärstrahlfänger
US7139366B1 (en) * 2005-05-31 2006-11-21 Osmic, Inc. Two-dimensional small angle x-ray scattering camera
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
JP5237186B2 (ja) 2009-04-30 2013-07-17 株式会社リガク Ｘ線散乱測定装置およびｘ線散乱測定方法
JP2013219601A (ja) * 2012-04-10 2013-10-24 Canon Inc シリアルデータ送信システム
WO2013185000A1 (en) 2012-06-08 2013-12-12 Rigaku Innovative Technologies, Inc. X-ray beam system offering 1d and 2d beams
JP6322627B2 (ja) * 2012-06-08 2018-05-09 リガク イノベイティブ テクノロジーズ インコーポレイテッド デュアルモード小角散乱カメラ
US9024268B2 (en) * 2013-03-15 2015-05-05 Bruker Axs, Inc. One-dimensional x-ray detector with curved readout strips
US9575017B2 (en) * 2014-02-24 2017-02-21 Rigaku Innovative Technologies, Inc. High performance Kratky assembly
EP3364421B1 (en) * 2017-02-17 2019-04-03 Rigaku Corporation X-ray optical device
US11181489B2 (en) * 2018-07-31 2021-11-23 Lam Research Corporation Determining tilt angle in patterned arrays of high aspect-ratio structures by small-angle x-ray scattering
US12436115B2 (en) * 2022-02-25 2025-10-07 Proto Patents Ltd. Transmission X-ray diffraction apparatus and related method

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JP4054402B2 (ja) 1997-04-25 2008-02-27 株式会社東芝 Ｘ線断層撮影装置
JPS5816553U (ja) * 1981-07-24 1983-02-01 理学電機株式会社 Ｘ線小角散乱測定装置用試料加熱装置
DE3406905A1 (de) 1984-02-25 1985-09-05 Philips Patentverwaltung Gmbh, 2000 Hamburg Roentgengeraet
GB8411731D0 (en) 1984-05-09 1984-06-13 Unilever Plc Oral compositions
DE3785763T2 (de) 1986-08-15 1993-10-21 Commw Scient Ind Res Org Instrumente zur konditionierung von röntgen- oder neutronenstrahlen.
EP0311177B1 (de) 1987-10-05 1993-12-15 Philips Patentverwaltung GmbH Anordnung zur Untersuchung eines Körpers mit einer Strahlenquelle
US5028352A (en) 1989-07-11 1991-07-02 University Of New Mexico Low density/low surface area silica-alumina composition
EP0753140A1 (en) * 1995-01-27 1997-01-15 Koninklijke Philips Electronics N.V. Method for ge-xrf x-ray analysis of materials, and apparatus for carrying out the method
JP3468623B2 (ja) * 1995-08-08 2003-11-17 理学電機株式会社 Ｘ線回折装置の光学系切換装置
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JP3529065B2 (ja) * 1995-08-14 2004-05-24 理学電機株式会社 Ｘ線小角散乱装置
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JP3710023B2 (ja) * 1997-08-27 2005-10-26 株式会社リガク クラツキ型スリット装置
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US6621888B2 (en) * 1998-06-18 2003-09-16 American Science And Engineering, Inc. X-ray inspection by coherent-scattering from variably disposed scatterers identified as suspect objects
EP1120086A4 (en) 1998-09-17 2003-05-21 Quanta Vision Inc DEVICE FOR REDUCED ANGLE MAMMOGRAPHY AND VARIANTS
DE19955848A1 (de) * 1998-11-17 2000-05-18 Ifg Inst Fuer Geraetebau Gmbh Verfahren zur röntgenologischen Abbildung von Untersuchungsobjekten mit geringen Dichteunterschieden sowie röntgenoptische Systeme
NL1015740C1 (nl) * 1999-07-23 2000-09-27 Koninkl Philips Electronics Nv Stralingsanalysetoestel voorzien van een regelbare collimator.
US6330301B1 (en) 1999-12-17 2001-12-11 Osmic, Inc. Optical scheme for high flux low-background two-dimensional small angle x-ray scattering
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US6453006B1 (en) * 2000-03-16 2002-09-17 Therma-Wave, Inc. Calibration and alignment of X-ray reflectometric systems
JP3759421B2 (ja) * 2000-04-10 2006-03-22 株式会社リガク 小角散乱測定用のｘ線光学装置と多層膜ミラー
JP4514982B2 (ja) * 2001-04-11 2010-07-28 株式会社リガク 小角散乱測定装置
JP3762665B2 (ja) * 2001-07-03 2006-04-05 株式会社リガク Ｘ線分析装置およびｘ線供給装置
US6956928B2 (en) 2003-05-05 2005-10-18 Bruker Axs, Inc. Vertical small angle x-ray scattering system
US7139366B1 (en) 2005-05-31 2006-11-21 Osmic, Inc. Two-dimensional small angle x-ray scattering camera

Also Published As

Publication number Publication date
US7139366B1 (en) 2006-11-21
CA2610555C (en) 2014-03-18
US7734011B2 (en) 2010-06-08
EP1886125A1 (en) 2008-02-13
EP1886125B1 (en) 2013-08-21
CA2610555A1 (en) 2006-12-07
WO2006130182A1 (en) 2006-12-07
US8094780B2 (en) 2012-01-10
JP2008542751A (ja) 2008-11-27
US20080069302A1 (en) 2008-03-20
US20100284516A1 (en) 2010-11-11
US20060269045A1 (en) 2006-11-30

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