JP5199376B2 - アルミニウム基板から規則性多孔質構造を製造する方法 - Google Patents

アルミニウム基板から規則性多孔質構造を製造する方法 Download PDF

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Publication number
JP5199376B2
JP5199376B2 JP2010530531A JP2010530531A JP5199376B2 JP 5199376 B2 JP5199376 B2 JP 5199376B2 JP 2010530531 A JP2010530531 A JP 2010530531A JP 2010530531 A JP2010530531 A JP 2010530531A JP 5199376 B2 JP5199376 B2 JP 5199376B2
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porous structure
thickness
polishing
anodization
layer
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Japanese (ja)
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JP2011500969A (ja
Inventor
ローラン アリュロー,
コズ, フランソワ ル
ルネ ベ,
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Universite Toulouse III Paul Sabatier
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Universite Toulouse III Paul Sabatier
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Porous Artificial Stone Or Porous Ceramic Products (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP2010530531A 2007-10-26 2008-10-23 アルミニウム基板から規則性多孔質構造を製造する方法 Expired - Fee Related JP5199376B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0707540A FR2922899B1 (fr) 2007-10-26 2007-10-26 Procede de fabrication d'une structure poreuse ordonnee a partir d'un substrat d'aluminium
FR0707540 2007-10-26
PCT/FR2008/051921 WO2009056744A2 (fr) 2007-10-26 2008-10-23 Procédé de fabrication d'une structure poreuse ordonnée à partir d'un substrat d'aluminium

Publications (2)

Publication Number Publication Date
JP2011500969A JP2011500969A (ja) 2011-01-06
JP5199376B2 true JP5199376B2 (ja) 2013-05-15

Family

ID=39474061

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JP2010530531A Expired - Fee Related JP5199376B2 (ja) 2007-10-26 2008-10-23 アルミニウム基板から規則性多孔質構造を製造する方法

Country Status (7)

Country Link
US (1) US20100258445A1 (de)
EP (1) EP2207915B1 (de)
JP (1) JP5199376B2 (de)
AT (1) ATE522640T1 (de)
ES (1) ES2372790T3 (de)
FR (1) FR2922899B1 (de)
WO (1) WO2009056744A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003250C2 (en) * 2009-07-20 2011-01-24 Metal Membranes Com B V Method for producing a membrane and such membrane.
EP2433659A3 (de) * 2010-08-13 2014-09-03 Biotronik AG Implantat und Verfahren zur Herstellung desselben
TWI442014B (zh) * 2010-11-24 2014-06-21 Ind Tech Res Inst 散熱元件及散熱元件的處理方法
KR101701314B1 (ko) * 2015-07-02 2017-02-02 고려대학교 산학협력단 양극산화된 금속산화물 나노다공성 템플레이트 제작방법
KR102443973B1 (ko) * 2017-12-11 2022-09-16 (주)코미코 내부식성 및 절연특성이 우수한 양극산화된 알루미늄 또는 알루미늄 합금 부재의 제조방법 및 표면처리된 반도체 장치
JP6584604B1 (ja) * 2018-07-31 2019-10-02 株式会社Uacj アルミニウム部材及びその製造方法
US11230786B2 (en) * 2019-06-17 2022-01-25 Nanopec, Inc. Nano-porous anodic aluminum oxide membrane for healthcare and biotechnology
WO2022235722A1 (en) * 2021-05-04 2022-11-10 Nanopec, Inc. Controlled pore ceramics chips for high throughput solid state oligonucleotide synthesis
CN114369402B (zh) * 2021-12-18 2022-10-11 佛山市顺德区固得丽涂料有限公司 一种铝合金涂层材料

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4225399A (en) * 1979-04-25 1980-09-30 Setsuo Tomita High speed aluminum anodizing
JPS5671821A (en) * 1979-11-14 1981-06-15 Hitachi Ltd Substrate for magnetic disc and its manufacture
DE3421442A1 (de) * 1983-06-10 1984-12-13 Nippon Light Metal Co. Ltd., Tokio/Tokyo Verfahren zur herstellung eines magnetischen aufzeichnungsmediums
JPS60177198A (ja) * 1984-02-22 1985-09-11 Nippon Sheet Glass Co Ltd 薄膜状Al↓2O↓3多孔質体の製造方法
JPS60231921A (ja) * 1984-05-01 1985-11-18 Kobe Steel Ltd 磁気デイスク用基盤の表面処理方法
JPS61101946A (ja) * 1984-10-23 1986-05-20 Kao Corp メツシユの製造方法
JPS62149029A (ja) * 1985-09-04 1987-07-03 Furukawa Alum Co Ltd アルマイト磁気デイスク基板とその製造方法
JPS63166993A (ja) * 1986-12-27 1988-07-11 Nippon Light Metal Co Ltd 磁気デイスク用基板の製造方法
JP2645022B2 (ja) * 1987-08-21 1997-08-25 株式会社東芝 加入者回路
US5240590A (en) * 1989-07-19 1993-08-31 Seagate Technology, Inc. Process for forming a bearing surface for aluminum alloy
US5691256A (en) * 1995-12-28 1997-11-25 Yamamura Glass Co., Ltd. Glass composition for magnetic disk substrates and magnetic disk substrate
JP3559920B2 (ja) * 1996-07-29 2004-09-02 東京エレクトロン株式会社 プラズマ処理装置
US6359288B1 (en) * 1997-04-24 2002-03-19 Massachusetts Institute Of Technology Nanowire arrays
US6804081B2 (en) * 2001-05-11 2004-10-12 Canon Kabushiki Kaisha Structure having pores and its manufacturing method
US6709929B2 (en) * 2001-06-25 2004-03-23 North Carolina State University Methods of forming nano-scale electronic and optoelectronic devices using non-photolithographically defined nano-channel templates
US20050159087A1 (en) * 2002-10-31 2005-07-21 Hans-Joachim Bartz Method for the creation of highly lustrous surfaceson aluminum workpieces
US20040221959A1 (en) * 2003-05-09 2004-11-11 Applied Materials, Inc. Anodized substrate support
JP4603402B2 (ja) * 2005-03-31 2010-12-22 富士フイルム株式会社 微細構造体およびその製造方法
US20060234396A1 (en) * 2005-04-18 2006-10-19 Fuji Photo Film Co., Ltd. Method for producing structure
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JP4768478B2 (ja) * 2006-03-17 2011-09-07 富士フイルム株式会社 微細構造体の製造方法および微細構造体
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Also Published As

Publication number Publication date
ATE522640T1 (de) 2011-09-15
EP2207915A2 (de) 2010-07-21
EP2207915B1 (de) 2011-08-31
FR2922899B1 (fr) 2010-11-26
ES2372790T3 (es) 2012-01-26
JP2011500969A (ja) 2011-01-06
WO2009056744A3 (fr) 2009-07-30
US20100258445A1 (en) 2010-10-14
FR2922899A1 (fr) 2009-05-01
WO2009056744A2 (fr) 2009-05-07

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