JP5156752B2 - チャンバーコンポーネントを洗浄する方法及び装置 - Google Patents

チャンバーコンポーネントを洗浄する方法及び装置 Download PDF

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Publication number
JP5156752B2
JP5156752B2 JP2009535302A JP2009535302A JP5156752B2 JP 5156752 B2 JP5156752 B2 JP 5156752B2 JP 2009535302 A JP2009535302 A JP 2009535302A JP 2009535302 A JP2009535302 A JP 2009535302A JP 5156752 B2 JP5156752 B2 JP 5156752B2
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JP
Japan
Prior art keywords
orifice
cleaning solution
component
fluid
cleaning
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Expired - Fee Related
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JP2009535302A
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Japanese (ja)
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JP2010508145A (ja
JP2010508145A5 (OSRAM
Inventor
フェリックス ラビノビッチ，
トーマス エコルス，
ジャネット マレスキー，
ニン チェン，
サマンサ， エス．， エイチ． タン，
Original Assignee
クアンタム グローバル テクノロジーズ リミテッド ライアビリティ カンパニー
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Publication of JP2010508145A publication Critical patent/JP2010508145A/ja
Publication of JP2010508145A5 publication Critical patent/JP2010508145A5/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2009535302A 2006-11-01 2007-10-31 チャンバーコンポーネントを洗浄する方法及び装置 Expired - Fee Related JP5156752B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US86390606P 2006-11-01 2006-11-01
US60/863,906 2006-11-01
PCT/US2007/022978 WO2008057351A2 (en) 2006-11-01 2007-10-31 Methods and apparatus for cleaning chamber components

Publications (3)

Publication Number Publication Date
JP2010508145A JP2010508145A (ja) 2010-03-18
JP2010508145A5 JP2010508145A5 (OSRAM) 2010-12-09
JP5156752B2 true JP5156752B2 (ja) 2013-03-06

Family

ID=39365035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009535302A Expired - Fee Related JP5156752B2 (ja) 2006-11-01 2007-10-31 チャンバーコンポーネントを洗浄する方法及び装置

Country Status (5)

Country Link
US (1) US7789969B2 (OSRAM)
JP (1) JP5156752B2 (OSRAM)
KR (1) KR101432161B1 (OSRAM)
TW (1) TWI381888B (OSRAM)
WO (1) WO2008057351A2 (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
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KR101432161B1 (ko) 2006-11-01 2014-08-20 퀀텀 글로벌 테크놀로지스, 엘엘씨 챔버 부품을 세정하기 위한 방법 및 장치
US8097089B2 (en) * 2007-12-19 2012-01-17 Quantum Global Technologies LLC Methods for cleaning process kits and chambers, and for ruthenium recovery
US8075701B2 (en) * 2008-06-30 2011-12-13 Lam Research Corporation Processes for reconditioning multi-component electrodes
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US9999907B2 (en) 2016-04-01 2018-06-19 Applied Materials, Inc. Cleaning process that precipitates yttrium oxy-flouride
US11776822B2 (en) * 2018-05-29 2023-10-03 Applied Materials, Inc. Wet cleaning of electrostatic chuck

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Also Published As

Publication number Publication date
US20080099054A1 (en) 2008-05-01
WO2008057351A3 (en) 2008-10-16
JP2010508145A (ja) 2010-03-18
KR101432161B1 (ko) 2014-08-20
KR20090091153A (ko) 2009-08-26
US7789969B2 (en) 2010-09-07
TWI381888B (zh) 2013-01-11
TW200833430A (en) 2008-08-16
WO2008057351A2 (en) 2008-05-15

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