JP5155654B2 - レリーフ画像の製造方法 - Google Patents

レリーフ画像の製造方法 Download PDF

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Publication number
JP5155654B2
JP5155654B2 JP2007507503A JP2007507503A JP5155654B2 JP 5155654 B2 JP5155654 B2 JP 5155654B2 JP 2007507503 A JP2007507503 A JP 2007507503A JP 2007507503 A JP2007507503 A JP 2007507503A JP 5155654 B2 JP5155654 B2 JP 5155654B2
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JP
Japan
Prior art keywords
image
mask image
imageable
carrier sheet
sheet
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Expired - Lifetime
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JP2007507503A
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English (en)
Japanese (ja)
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JP2007534012A (ja
JP2007534012A5 (enExample
Inventor
アリ，エム．
ブラウン，デイビッド
フォーレンカム，エルシー
ヘラー，マイケル
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イーストマン コダック カンパニー
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Publication of JP2007534012A5 publication Critical patent/JP2007534012A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
JP2007507503A 2004-04-10 2005-04-06 レリーフ画像の製造方法 Expired - Lifetime JP5155654B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US56116204P 2004-04-10 2004-04-10
US60/561,162 2004-04-10
US63046004P 2004-11-23 2004-11-23
US60/630,460 2004-11-23
US11/081,018 US8142987B2 (en) 2004-04-10 2005-03-15 Method of producing a relief image for printing
US11/081,018 2005-03-15
PCT/US2005/011793 WO2005101130A1 (en) 2004-04-10 2005-04-06 Method of producing a relief image

Publications (3)

Publication Number Publication Date
JP2007534012A JP2007534012A (ja) 2007-11-22
JP2007534012A5 JP2007534012A5 (enExample) 2008-04-17
JP5155654B2 true JP5155654B2 (ja) 2013-03-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007507503A Expired - Lifetime JP5155654B2 (ja) 2004-04-10 2005-04-06 レリーフ画像の製造方法

Country Status (6)

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US (3) US8142987B2 (enExample)
EP (1) EP1735664B1 (enExample)
JP (1) JP5155654B2 (enExample)
CN (2) CN102944972B (enExample)
ES (1) ES2569920T3 (enExample)
WO (1) WO2005101130A1 (enExample)

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WO2005101130A1 (en) 2005-10-27
ES2569920T3 (es) 2016-05-13
CN1942827B (zh) 2012-11-07
EP1735664B1 (en) 2016-03-16
US20120135354A1 (en) 2012-05-31
JP2007534012A (ja) 2007-11-22
US20050227182A1 (en) 2005-10-13
CN102944972B (zh) 2016-06-08
US8142987B2 (en) 2012-03-27
CN1942827A (zh) 2007-04-04
US8409790B2 (en) 2013-04-02
EP1735664A1 (en) 2006-12-27
US8530117B2 (en) 2013-09-10
US20120127443A1 (en) 2012-05-24

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