ES2569920T3 - Método de producción de una imagen en relieve - Google Patents

Método de producción de una imagen en relieve Download PDF

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Publication number
ES2569920T3
ES2569920T3 ES05734358.4T ES05734358T ES2569920T3 ES 2569920 T3 ES2569920 T3 ES 2569920T3 ES 05734358 T ES05734358 T ES 05734358T ES 2569920 T3 ES2569920 T3 ES 2569920T3
Authority
ES
Spain
Prior art keywords
image
forming
forming images
material capable
mask image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES05734358.4T
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English (en)
Spanish (es)
Inventor
M. Ali
David Brown
Elsie Fohrenkamm
Michael Heller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of ES2569920T3 publication Critical patent/ES2569920T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145Infrared

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
ES05734358.4T 2004-04-10 2005-04-06 Método de producción de una imagen en relieve Expired - Lifetime ES2569920T3 (es)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US56116204P 2004-04-10 2004-04-10
US561162P 2004-04-10
US63046004P 2004-11-23 2004-11-23
US630460P 2004-11-23
US81018 2005-03-15
US11/081,018 US8142987B2 (en) 2004-04-10 2005-03-15 Method of producing a relief image for printing
PCT/US2005/011793 WO2005101130A1 (en) 2004-04-10 2005-04-06 Method of producing a relief image

Publications (1)

Publication Number Publication Date
ES2569920T3 true ES2569920T3 (es) 2016-05-13

Family

ID=34965335

Family Applications (1)

Application Number Title Priority Date Filing Date
ES05734358.4T Expired - Lifetime ES2569920T3 (es) 2004-04-10 2005-04-06 Método de producción de una imagen en relieve

Country Status (6)

Country Link
US (3) US8142987B2 (enExample)
EP (1) EP1735664B1 (enExample)
JP (1) JP5155654B2 (enExample)
CN (2) CN102944972B (enExample)
ES (1) ES2569920T3 (enExample)
WO (1) WO2005101130A1 (enExample)

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JP5155654B2 (ja) 2013-03-06
WO2005101130A1 (en) 2005-10-27
CN1942827B (zh) 2012-11-07
EP1735664B1 (en) 2016-03-16
US20120135354A1 (en) 2012-05-31
JP2007534012A (ja) 2007-11-22
US20050227182A1 (en) 2005-10-13
CN102944972B (zh) 2016-06-08
US8142987B2 (en) 2012-03-27
CN1942827A (zh) 2007-04-04
US8409790B2 (en) 2013-04-02
EP1735664A1 (en) 2006-12-27
US8530117B2 (en) 2013-09-10
US20120127443A1 (en) 2012-05-24

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