JP5153316B2 - 半導体パッケージ用放熱板およびそのめっき方法 - Google Patents
半導体パッケージ用放熱板およびそのめっき方法 Download PDFInfo
- Publication number
- JP5153316B2 JP5153316B2 JP2007330988A JP2007330988A JP5153316B2 JP 5153316 B2 JP5153316 B2 JP 5153316B2 JP 2007330988 A JP2007330988 A JP 2007330988A JP 2007330988 A JP2007330988 A JP 2007330988A JP 5153316 B2 JP5153316 B2 JP 5153316B2
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- JP
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- Prior art keywords
- recess
- heat sink
- plating
- semiconductor package
- inner bottom
- Prior art date
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- 238000007747 plating Methods 0.000 title claims description 103
- 239000004065 semiconductor Substances 0.000 title claims description 54
- 238000000034 method Methods 0.000 title claims description 25
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 46
- 239000010931 gold Substances 0.000 claims description 46
- 229910052737 gold Inorganic materials 0.000 claims description 46
- 229920001971 elastomer Polymers 0.000 claims description 39
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 230000017525 heat dissipation Effects 0.000 claims description 6
- 230000000873 masking effect Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3675—Cooling facilitated by shape of device characterised by the shape of the housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05568—Disposition the whole external layer protruding from the surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05573—Single external layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007330988A JP5153316B2 (ja) | 2007-12-21 | 2007-12-21 | 半導体パッケージ用放熱板およびそのめっき方法 |
KR1020080129029A KR20090068140A (ko) | 2007-12-21 | 2008-12-18 | 반도체 패키지용 방열판 및 그 도금 방법 |
US12/339,725 US20090183855A1 (en) | 2007-12-21 | 2008-12-19 | Heat radiating plate for semiconductor package and plating method thereof |
CN2008101864797A CN101465329B (zh) | 2007-12-21 | 2008-12-19 | 半导体封装用的散热板以及该散热板的电镀方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007330988A JP5153316B2 (ja) | 2007-12-21 | 2007-12-21 | 半導体パッケージ用放熱板およびそのめっき方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009152494A JP2009152494A (ja) | 2009-07-09 |
JP2009152494A5 JP2009152494A5 (enrdf_load_stackoverflow) | 2011-01-13 |
JP5153316B2 true JP5153316B2 (ja) | 2013-02-27 |
Family
ID=40805811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007330988A Active JP5153316B2 (ja) | 2007-12-21 | 2007-12-21 | 半導体パッケージ用放熱板およびそのめっき方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090183855A1 (enrdf_load_stackoverflow) |
JP (1) | JP5153316B2 (enrdf_load_stackoverflow) |
KR (1) | KR20090068140A (enrdf_load_stackoverflow) |
CN (1) | CN101465329B (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102893390A (zh) * | 2010-05-21 | 2013-01-23 | 诺基亚西门子通信公司 | 用于将热沉热耦合到部件的方法和设备 |
CN102299127B (zh) * | 2011-07-13 | 2013-12-11 | 台达电子企业管理(上海)有限公司 | 用于封装元件的双向散热器及其组装方法 |
JP6395947B2 (ja) * | 2015-10-05 | 2018-09-26 | 三菱電機株式会社 | 電子制御装置 |
CN110648987B (zh) * | 2019-10-11 | 2022-09-06 | 宁波施捷电子有限公司 | 一种界面导热材料层及其用途 |
CN114823573B (zh) * | 2022-06-24 | 2022-09-09 | 威海市泓淋电力技术股份有限公司 | 一种散热型封装结构及其形成方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH065699B2 (ja) * | 1987-09-16 | 1994-01-19 | 日本電気株式会社 | 半導体装置 |
US5485037A (en) * | 1993-04-12 | 1996-01-16 | Amkor Electronics, Inc. | Semiconductor device having a thermal dissipator and electromagnetic shielding |
US6461891B1 (en) * | 1999-09-13 | 2002-10-08 | Intel Corporation | Method of constructing an electronic assembly having an indium thermal couple and an electronic assembly having an indium thermal couple |
US6624522B2 (en) * | 2000-04-04 | 2003-09-23 | International Rectifier Corporation | Chip scale surface mounted device and process of manufacture |
JP2001308215A (ja) * | 2000-04-24 | 2001-11-02 | Ngk Spark Plug Co Ltd | 半導体装置 |
US6282096B1 (en) * | 2000-04-28 | 2001-08-28 | Siliconware Precision Industries Co., Ltd. | Integration of heat conducting apparatus and chip carrier in IC package |
JP4421118B2 (ja) * | 2001-01-05 | 2010-02-24 | 富士通マイクロエレクトロニクス株式会社 | 半導体装置製造方法 |
JP3841768B2 (ja) * | 2003-05-22 | 2006-11-01 | 新光電気工業株式会社 | パッケージ部品及び半導体パッケージ |
JP3809168B2 (ja) * | 2004-02-03 | 2006-08-16 | 株式会社東芝 | 半導体モジュール |
JP4874325B2 (ja) * | 2006-02-24 | 2012-02-15 | 富士通株式会社 | 半導体装置 |
JP5113346B2 (ja) * | 2006-05-22 | 2013-01-09 | 日立電線株式会社 | 電子装置用基板およびその製造方法、ならびに電子装置およびその製造方法 |
-
2007
- 2007-12-21 JP JP2007330988A patent/JP5153316B2/ja active Active
-
2008
- 2008-12-18 KR KR1020080129029A patent/KR20090068140A/ko not_active Withdrawn
- 2008-12-19 CN CN2008101864797A patent/CN101465329B/zh active Active
- 2008-12-19 US US12/339,725 patent/US20090183855A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN101465329A (zh) | 2009-06-24 |
JP2009152494A (ja) | 2009-07-09 |
KR20090068140A (ko) | 2009-06-25 |
US20090183855A1 (en) | 2009-07-23 |
CN101465329B (zh) | 2013-05-22 |
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