JP5132739B2 - 半導体素子 - Google Patents
半導体素子 Download PDFInfo
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- JP5132739B2 JP5132739B2 JP2010198632A JP2010198632A JP5132739B2 JP 5132739 B2 JP5132739 B2 JP 5132739B2 JP 2010198632 A JP2010198632 A JP 2010198632A JP 2010198632 A JP2010198632 A JP 2010198632A JP 5132739 B2 JP5132739 B2 JP 5132739B2
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- 239000004065 semiconductor Substances 0.000 title claims description 107
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 82
- 150000004767 nitrides Chemical class 0.000 claims description 61
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 54
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 35
- 239000010931 gold Substances 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 35
- 239000002184 metal Substances 0.000 claims description 35
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 22
- 239000013078 crystal Substances 0.000 claims description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 11
- 229910052737 gold Inorganic materials 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- 229910002601 GaN Inorganic materials 0.000 description 53
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 28
- 239000010936 titanium Substances 0.000 description 21
- 239000000758 substrate Substances 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 13
- 230000004888 barrier function Effects 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 13
- 230000000630 rising effect Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- 239000012298 atmosphere Substances 0.000 description 11
- 238000000151 deposition Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- OLBVUFHMDRJKTK-UHFFFAOYSA-N [N].[O] Chemical compound [N].[O] OLBVUFHMDRJKTK-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000005253 cladding Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 2
- 235000017491 Bambusa tulda Nutrition 0.000 description 2
- 241001330002 Bambuseae Species 0.000 description 2
- 206010021143 Hypoxia Diseases 0.000 description 2
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 2
- 239000011425 bamboo Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
- H01S5/04257—Electrodes, e.g. characterised by the structure characterised by the configuration having positive and negative electrodes on the same side of the substrate
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3054—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping
- H01S5/3063—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping using Mg
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Biophysics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Description
本実施の形態の半導体素子は、p型窒化物半導体層と、このp型窒化物半導体層上に形成され、膜厚が3nm以下で多結晶質のニッケル酸化物層と、ニッケル酸化物層上に形成される金属層と、を有する。
本実施の形態の半導体素子は、レーザダイオード(LD)ではなく、発光ダイオード(LED)である点で、第1の実施の形態と異なる。また、NiO膜上の金属層が、Ag(銀)膜、Ti(チタン)膜、Pt(白金)膜、Au(金)膜の積層構造である点で第1の実施の形態と異なっている。NiO膜を設けることによる作用および効果については基本的に第1の実施の形態と同様である。したがって、第1の実施の形態と重複する内容については、一部記載を省略する。
第1の実施の形態で説明したと同様の半導体レーザダイオードを作成した。
Ni膜の膜厚を5nmとすること以外は実施例1と同様の製造方法により、レーザダイオードを製造した。
Ni膜形成後の熱処理を省略すること。NiO膜上に、膜厚100nmのAu膜、膜厚100nmのTi膜、膜厚50nmのPt膜、膜厚500nmのAu膜を蒸着した後、常圧、酸素20%の酸素窒素混合雰囲気中、550℃10分の熱処理を行い、Ni膜を酸化すること以外は、実施例1と同様の製造方法により、レーザダイオードを製造した。
第2の実施の形態で説明したと同様の半導体発光ダイオードを作成した。
反射電極のAg膜をAl(アルミニウム)膜とすること以外は、実施例2と同様の製造方法で半導体発光ダイオードを作成した。
NiO膜をp型GaNとAg膜との間に形成しないこと以外は、実施例2と同様の製造方法で半導体発光ダイオードを作成した。
12 n型窒化物半導体層
14 活性層
16 p型窒化物半導体層
18 リッジストライプ
20 絶縁膜
24 n側電極
26 p側電極
30 NiO膜(ニッケル酸化物層)
32 金属層
40 透過性基板
42 n型窒化物半導体層
44 活性層
46 p型窒化物半導体層
54 n側電極
56 p側電極
62 金属層
Claims (5)
- p型窒化物半導体層と、
前記p型窒化物半導体層上に形成され、膜厚が3nm以下で多結晶質のニッケル酸化物層と、
前記ニッケル酸化物層上に形成される金属層と、
を有することを特徴とする半導体素子。 - 前記ニッケル酸化物層の結晶粒径が、前記ニッケル酸化物層の膜厚よりも大きいことを特徴とする請求項1記載の半導体素子。
- 前記金属層が、前記ニッケル酸化物層に接する銀(Ag)膜を有することを特徴とする請求項1または請求項2記載の半導体素子。
- 前記金属層が、前記ニッケル酸化物層に接するニッケル(Ni)膜と、前記ニッケル膜上に形成される金(Au)膜を有することを特徴とする請求項1または請求項2記載の半導体素子。
- 前記p型窒化物半導体層が、p型ガリウムナイトライド(GaN)であることを特徴とする請求項1ないし請求項4いずれか一項記載の半導体素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010198632A JP5132739B2 (ja) | 2010-09-06 | 2010-09-06 | 半導体素子 |
US13/035,069 US8456010B2 (en) | 2010-09-06 | 2011-02-25 | Semiconductor device |
US13/871,302 US8754528B2 (en) | 2010-09-06 | 2013-04-26 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010198632A JP5132739B2 (ja) | 2010-09-06 | 2010-09-06 | 半導体素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012059745A JP2012059745A (ja) | 2012-03-22 |
JP5132739B2 true JP5132739B2 (ja) | 2013-01-30 |
Family
ID=45770017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010198632A Expired - Fee Related JP5132739B2 (ja) | 2010-09-06 | 2010-09-06 | 半導体素子 |
Country Status (2)
Country | Link |
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US (2) | US8456010B2 (ja) |
JP (1) | JP5132739B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5197186B2 (ja) | 2008-06-30 | 2013-05-15 | 株式会社東芝 | 半導体発光装置 |
KR101791175B1 (ko) * | 2011-06-30 | 2017-10-27 | 엘지이노텍 주식회사 | 발광소자 및 이를 포함하는 발광소자 패키지 |
EP2674992A1 (en) * | 2012-06-15 | 2013-12-18 | Imec | Led and method for making led |
JP2014053593A (ja) * | 2012-08-09 | 2014-03-20 | Sharp Corp | 半導体発光素子およびその製造方法 |
JP2015119067A (ja) * | 2013-12-19 | 2015-06-25 | ソニー株式会社 | 固体撮像装置、光検出器、および電子機器 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3620926B2 (ja) * | 1995-06-16 | 2005-02-16 | 豊田合成株式会社 | p伝導形3族窒化物半導体の電極及び電極形成方法及び素子 |
US5889295A (en) * | 1996-02-26 | 1999-03-30 | Kabushiki Kaisha Toshiba | Semiconductor device |
US6287947B1 (en) | 1999-06-08 | 2001-09-11 | Lumileds Lighting, U.S. Llc | Method of forming transparent contacts to a p-type GaN layer |
KR100624411B1 (ko) * | 2003-08-25 | 2006-09-18 | 삼성전자주식회사 | 질화물계 발광소자 및 그 제조방법 |
JP4475942B2 (ja) * | 2003-12-26 | 2010-06-09 | 三洋電機株式会社 | 表示装置及びその製造方法 |
TW200529464A (en) * | 2004-02-27 | 2005-09-01 | Super Nova Optoelectronics Corp | Gallium nitride based light-emitting diode structure and manufacturing method thereof |
US7722966B1 (en) * | 2005-05-11 | 2010-05-25 | Alliance For Sustainable Energy, Llc | Nano-composite materials |
JP2006324296A (ja) | 2005-05-17 | 2006-11-30 | Shurai Kagi Kofun Yugenkoshi | 分散電流を具え発光面積利用率を高めた発光ダイオード |
ES2672791T3 (es) * | 2007-06-25 | 2018-06-18 | Massachusetts Institute Of Technology | Dispositivo fotovoltaico que incluye nanocristales semiconductores |
CN100541843C (zh) | 2007-09-12 | 2009-09-16 | 普光科技(广州)有限公司 | 一种氮化镓基发光二极管p型层透明导电膜及其制作方法 |
JP5488458B2 (ja) * | 2008-04-07 | 2014-05-14 | 日本電気株式会社 | 抵抗変化素子及びその製造方法 |
JP5197186B2 (ja) | 2008-06-30 | 2013-05-15 | 株式会社東芝 | 半導体発光装置 |
EP2452372B1 (en) * | 2009-07-07 | 2018-12-26 | University of Florida Research Foundation, Inc. | Stable and all solution processable quantum dot light-emitting diodes |
US8187976B2 (en) * | 2009-08-26 | 2012-05-29 | Indian Institute Of Technology Madras | Stable P-type semiconducting behaviour in Li and Ni codoped ZnO |
WO2011030534A1 (ja) * | 2009-09-14 | 2011-03-17 | パナソニック株式会社 | 表示パネル装置および表示パネル装置の製造方法 |
-
2010
- 2010-09-06 JP JP2010198632A patent/JP5132739B2/ja not_active Expired - Fee Related
-
2011
- 2011-02-25 US US13/035,069 patent/US8456010B2/en not_active Expired - Fee Related
-
2013
- 2013-04-26 US US13/871,302 patent/US8754528B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20120056153A1 (en) | 2012-03-08 |
US20130234155A1 (en) | 2013-09-12 |
US8456010B2 (en) | 2013-06-04 |
JP2012059745A (ja) | 2012-03-22 |
US8754528B2 (en) | 2014-06-17 |
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