JP5124507B2 - 電子線装置および電子線装置用試料保持装置 - Google Patents

電子線装置および電子線装置用試料保持装置 Download PDF

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Publication number
JP5124507B2
JP5124507B2 JP2009032124A JP2009032124A JP5124507B2 JP 5124507 B2 JP5124507 B2 JP 5124507B2 JP 2009032124 A JP2009032124 A JP 2009032124A JP 2009032124 A JP2009032124 A JP 2009032124A JP 5124507 B2 JP5124507 B2 JP 5124507B2
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Japan
Prior art keywords
sample
electron beam
beam apparatus
diaphragm
gas
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JP2009032124A
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English (en)
Japanese (ja)
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JP2010192126A (ja
JP2010192126A5 (enExample
Inventor
紀恵 矢口
康平 長久保
武夫 上野
明 渡部
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2009032124A priority Critical patent/JP5124507B2/ja
Priority to EP10741027.6A priority patent/EP2398036B1/en
Priority to US13/201,820 priority patent/US8604429B2/en
Priority to PCT/JP2010/000282 priority patent/WO2010092747A1/ja
Publication of JP2010192126A publication Critical patent/JP2010192126A/ja
Publication of JP2010192126A5 publication Critical patent/JP2010192126A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H01J2237/2004—Biological samples

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2009032124A 2009-02-16 2009-02-16 電子線装置および電子線装置用試料保持装置 Active JP5124507B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009032124A JP5124507B2 (ja) 2009-02-16 2009-02-16 電子線装置および電子線装置用試料保持装置
EP10741027.6A EP2398036B1 (en) 2009-02-16 2010-01-20 Electron beam device and sample holding device for electron beam device
US13/201,820 US8604429B2 (en) 2009-02-16 2010-01-20 Electron beam device and sample holding device for electron beam device
PCT/JP2010/000282 WO2010092747A1 (ja) 2009-02-16 2010-01-20 電子線装置および電子線装置用試料保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009032124A JP5124507B2 (ja) 2009-02-16 2009-02-16 電子線装置および電子線装置用試料保持装置

Publications (3)

Publication Number Publication Date
JP2010192126A JP2010192126A (ja) 2010-09-02
JP2010192126A5 JP2010192126A5 (enExample) 2011-05-12
JP5124507B2 true JP5124507B2 (ja) 2013-01-23

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JP2009032124A Active JP5124507B2 (ja) 2009-02-16 2009-02-16 電子線装置および電子線装置用試料保持装置

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Country Link
US (1) US8604429B2 (enExample)
EP (1) EP2398036B1 (enExample)
JP (1) JP5124507B2 (enExample)
WO (1) WO2010092747A1 (enExample)

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EP2481073A4 (en) * 2009-09-24 2014-10-15 Protochips Inc METHODS OF USING TEMPERATURE REGULATION DEVICES IN ELECTRON MICROSCOPY
JP5260575B2 (ja) 2010-02-24 2013-08-14 株式会社日立ハイテクノロジーズ 電子顕微鏡、および試料ホルダ
JP6014036B2 (ja) * 2010-08-02 2016-10-25 プロトチップス，インコーポレイテッド ２つの半導体デバイスでガスまたは液体セルを形成するための電子顕微鏡サンプルホルダ
JP5699023B2 (ja) 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112012001306B4 (de) 2011-04-28 2022-03-24 Hitachi High-Tech Corporation Probenhaltevorrichtung, Elektronenmikroskop und Probenhalterung
JP5576825B2 (ja) * 2011-05-13 2014-08-20 日本電子株式会社 電子線装置及び電子顕微鏡用ガス反応試料ホルダ
JP5824262B2 (ja) * 2011-07-08 2015-11-25 日本電子株式会社 試料観察方法および圧力測定用ホルダ
EP2555221B1 (en) * 2011-08-03 2013-07-24 Fei Company Method of studying a sample in an ETEM
JP6169334B2 (ja) * 2012-07-27 2017-07-26 株式会社日立ハイテクノロジーズ 電子顕微鏡および電子顕微鏡用試料保持装置
US9437393B2 (en) 2012-11-16 2016-09-06 Protochips, Inc. Method for forming an electrical connection to an sample support in an electron microscope holder
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement
JP6117070B2 (ja) 2013-09-26 2017-04-19 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP6364167B2 (ja) * 2013-09-30 2018-07-25 株式会社日立ハイテクノロジーズ 環境制御型荷電粒子観察システム
JP6373568B2 (ja) * 2013-10-07 2018-08-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
US9466459B2 (en) 2014-06-03 2016-10-11 Protochips, Inc. Method for optimizing fluid flow across a sample within an electron microscope sample holder
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
DE112015006731B4 (de) 2015-08-21 2022-07-28 Hitachi High-Tech Corporation Betrachtungsunterstützungseinheit für ladungsteilchenmikroskop sowie ladungsteilchenmikroskop und dieses nutzendes probenbetrachtungsverfahren
JP6774761B2 (ja) * 2016-02-05 2020-10-28 日本電子株式会社 試料ホルダー
WO2018207309A1 (ja) * 2017-05-11 2018-11-15 株式会社日立ハイテクノロジーズ 試料ホルダ、電子顕微鏡
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡
JP7585153B2 (ja) * 2021-07-13 2024-11-18 株式会社日立製作所 試料ホルダー及び電子顕微鏡
JP7769098B2 (ja) * 2022-03-15 2025-11-12 株式会社日立製作所 試料保持具、電子線装置、試料保持具の製造方法

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JPS4724960U (enExample) * 1971-04-14 1972-11-20
JPS51267A (en) 1974-06-19 1976-01-05 Hitachi Ltd Denshikenbikyotono shiryohojisochi
FR2629915B1 (fr) 1988-04-08 1992-10-23 Lefel Marie France Procede de detection de traces de stupefiants et produits pour la mise en oeuvre de ce procede
JPH0222559U (enExample) * 1988-07-29 1990-02-15
US5326971A (en) * 1993-05-17 1994-07-05 Motorola, Inc. Transmission electron microscope environmental specimen holder
JPH09129168A (ja) * 1995-11-01 1997-05-16 Jeol Ltd 隔膜型ガス雰囲気試料室を有する試料ホルダ
JP3610245B2 (ja) * 1998-10-27 2005-01-12 日本電子株式会社 ガス雰囲気試料ホルダ
JP2000208083A (ja) 1999-01-20 2000-07-28 Jeol Ltd 電子顕微鏡の試料冷却装置
JP2001305028A (ja) 2000-04-25 2001-10-31 Nippon Steel Corp 固相反応試料の透過電子顕微鏡観察用試料作製方法および荷電粒子ビーム装置
IL156027A0 (en) 2000-12-01 2003-12-23 El Mul Technologies Ltd Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
JP2003115273A (ja) * 2001-10-03 2003-04-18 Jeol Ltd 試料ホルダー及び電子顕微鏡
JP2003187735A (ja) * 2001-12-18 2003-07-04 Jeol Ltd 試料ホルダ
JP2005190864A (ja) 2003-12-26 2005-07-14 Hitachi High-Technologies Corp 電子線装置及び電子線装置用試料ホルダー
JP4723414B2 (ja) * 2006-04-27 2011-07-13 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
JP4850654B2 (ja) * 2006-10-23 2012-01-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置および荷電粒子線装置用試料保持装置
JP4991390B2 (ja) * 2007-05-21 2012-08-01 株式会社日立ハイテクノロジーズ マイクロサンプル加熱用試料台
JP5139772B2 (ja) 2007-11-07 2013-02-06 日本電子株式会社 隔膜型ガス雰囲気試料ホルダ
JP2010230417A (ja) * 2009-03-26 2010-10-14 Jeol Ltd 試料の検査装置及び検査方法
JP5260575B2 (ja) * 2010-02-24 2013-08-14 株式会社日立ハイテクノロジーズ 電子顕微鏡、および試料ホルダ
US9207196B2 (en) * 2010-11-17 2015-12-08 Vanderbilt University Transmission electron microscopy for imaging live cells

Also Published As

Publication number Publication date
EP2398036A1 (en) 2011-12-21
EP2398036B1 (en) 2014-10-01
JP2010192126A (ja) 2010-09-02
US8604429B2 (en) 2013-12-10
US20110303845A1 (en) 2011-12-15
EP2398036A4 (en) 2013-01-09
WO2010092747A1 (ja) 2010-08-19

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