JP5121196B2 - 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法 - Google Patents

金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法 Download PDF

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JP5121196B2
JP5121196B2 JP2006251575A JP2006251575A JP5121196B2 JP 5121196 B2 JP5121196 B2 JP 5121196B2 JP 2006251575 A JP2006251575 A JP 2006251575A JP 2006251575 A JP2006251575 A JP 2006251575A JP 5121196 B2 JP5121196 B2 JP 5121196B2
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thin film
raw material
metal alkoxide
compound
alkoxide compound
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Japanese (ja)
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JP2008069135A5 (https=
JP2008069135A (ja
Inventor
仙二 和田
徹司 阿部
淳 桜井
貴志 東野
竜作 藤本
雅子 清水
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Adeka Corp
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Adeka Corp
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Priority to JP2006251575A priority Critical patent/JP5121196B2/ja
Priority to TW096128292A priority patent/TWI383990B/zh
Priority to KR1020070086619A priority patent/KR101437663B1/ko
Priority to DE102007042943A priority patent/DE102007042943A1/de
Priority to US11/854,109 priority patent/US8003814B2/en
Priority to CN2007101527093A priority patent/CN101143873B/zh
Publication of JP2008069135A publication Critical patent/JP2008069135A/ja
Publication of JP2008069135A5 publication Critical patent/JP2008069135A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/28—Titanium compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2006251575A 2006-09-15 2006-09-15 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法 Active JP5121196B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006251575A JP5121196B2 (ja) 2006-09-15 2006-09-15 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法
TW096128292A TWI383990B (zh) 2006-09-15 2007-08-01 Metal alkoxides, film forming materials and films
KR1020070086619A KR101437663B1 (ko) 2006-09-15 2007-08-28 금속 알콕시드 화합물, 박막 형성용 원료 및 박막의제조방법
DE102007042943A DE102007042943A1 (de) 2006-09-15 2007-09-10 Metallalkoxidverbindung, Material zum Bilden eines dünnen Films, und Verfahren zum Herstellen eines dünnen Films
US11/854,109 US8003814B2 (en) 2006-09-15 2007-09-12 Metal alkoxide compound, material for forming thin film, and method for producing thin film
CN2007101527093A CN101143873B (zh) 2006-09-15 2007-09-14 金属醇盐化合物、薄膜形成用原料及薄膜制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006251575A JP5121196B2 (ja) 2006-09-15 2006-09-15 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法

Publications (3)

Publication Number Publication Date
JP2008069135A JP2008069135A (ja) 2008-03-27
JP2008069135A5 JP2008069135A5 (https=) 2009-10-15
JP5121196B2 true JP5121196B2 (ja) 2013-01-16

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JP2006251575A Active JP5121196B2 (ja) 2006-09-15 2006-09-15 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法

Country Status (6)

Country Link
US (1) US8003814B2 (https=)
JP (1) JP5121196B2 (https=)
KR (1) KR101437663B1 (https=)
CN (1) CN101143873B (https=)
DE (1) DE102007042943A1 (https=)
TW (1) TWI383990B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010219292A (ja) * 2009-03-17 2010-09-30 Tokyo Electron Ltd 成膜方法
US8697486B2 (en) * 2009-04-15 2014-04-15 Micro Technology, Inc. Methods of forming phase change materials and methods of forming phase change memory circuitry
DE102009028802B3 (de) * 2009-08-21 2011-03-24 Evonik Degussa Gmbh Verfahren zur Herstellung Metalloxid-haltiger Schichten, nach dem Verfahren herstellbare Metalloxid-haltige Schicht und deren Verwendung
US20130011579A1 (en) 2010-11-30 2013-01-10 Air Products And Chemicals, Inc. Metal-Enolate Precursors For Depositing Metal-Containing Films
JP5923351B2 (ja) * 2012-03-16 2016-05-24 株式会社Adeka 銅膜形成用組成物及び該組成物を用いた銅膜の製造方法
KR102251989B1 (ko) 2014-03-10 2021-05-14 삼성전자주식회사 유기 금속 전구체 및 이를 이용한 박막 형성 방법
CN116529416A (zh) * 2020-11-19 2023-08-01 株式会社Adeka 薄膜的制造方法
CN117004923A (zh) * 2022-04-29 2023-11-07 拓荆科技股份有限公司 半导体处理装置
CN117026207A (zh) * 2022-05-10 2023-11-10 株式会社Egtm 铝前驱体及其制造方法、薄层及存储装置制造方法
JP2025102051A (ja) * 2023-12-26 2025-07-08 信越化学工業株式会社 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1954268A (en) * 1930-08-05 1934-04-10 Ternstedt Mfg Co Weather strip window sash channel
US2684972A (en) * 1952-02-21 1954-07-27 Du Pont Production of inorganic esters
GB860353A (en) * 1957-06-20 1961-02-01 Du Pont Improvements in polymerisation of ethylene
JPS60258132A (ja) * 1984-06-04 1985-12-20 Hokko Chem Ind Co Ltd 金属アルコキシドの改良製造法
JPH01172390A (ja) * 1987-12-28 1989-07-07 Hokko Chem Ind Co Ltd 金属アルコキシドの製造方法
JPH01179239A (ja) * 1987-12-29 1989-07-17 Matsushita Electric Ind Co Ltd 光磁気記録媒体の製造方法
JPH05239650A (ja) 1992-02-27 1993-09-17 Kojundo Chem Lab Co Ltd シリコン酸化膜の製造法
JPH0660406A (ja) 1992-08-06 1994-03-04 Matsushita Electric Ind Co Ltd 対物レンズ駆動装置
KR0156980B1 (ko) 1995-06-23 1998-12-01 신현주 질화금속 박막증착용 화합물 및 그를 이용한 증착방법
JP4868639B2 (ja) 2000-06-12 2012-02-01 株式会社Ａｄｅｋａ 化学気相成長用原料及びこれを用いた薄膜の製造方法
JP4693970B2 (ja) 2000-09-14 2011-06-01 株式会社トリケミカル研究所 ゲート酸化膜形成方法
JP3409290B2 (ja) 2000-09-18 2003-05-26 株式会社トリケミカル研究所 ゲート酸化膜形成材料
CN1898192A (zh) * 2003-12-25 2007-01-17 株式会社艾迪科 金属化合物、薄膜形成用原料及薄膜的制造方法
DE112005000134T5 (de) * 2004-02-18 2007-02-15 Adeka Corp. Alkoxidverbindung, Material für die Bildung eines dünnen Films und Verfahren für die Bildung eines dünnen Films
JP2005340405A (ja) * 2004-05-26 2005-12-08 Asahi Denka Kogyo Kk 化学気相成長用原料及び薄膜の製造方法
JP2006182709A (ja) 2004-12-28 2006-07-13 Adeka Corp 薄膜形成用原料、薄膜の製造方法及び金属化合物

Also Published As

Publication number Publication date
TWI383990B (zh) 2013-02-01
CN101143873B (zh) 2012-07-25
US20080187662A1 (en) 2008-08-07
DE102007042943A1 (de) 2008-03-27
KR20080025301A (ko) 2008-03-20
CN101143873A (zh) 2008-03-19
JP2008069135A (ja) 2008-03-27
US8003814B2 (en) 2011-08-23
TW200833701A (en) 2008-08-16
KR101437663B1 (ko) 2014-09-04

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