JP5088667B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP5088667B2
JP5088667B2 JP2007055181A JP2007055181A JP5088667B2 JP 5088667 B2 JP5088667 B2 JP 5088667B2 JP 2007055181 A JP2007055181 A JP 2007055181A JP 2007055181 A JP2007055181 A JP 2007055181A JP 5088667 B2 JP5088667 B2 JP 5088667B2
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Prior art keywords
plasma
electrode
gas
processing apparatus
opening
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Expired - Fee Related
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JP2007055181A
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Japanese (ja)
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JP2008218254A5 (enExample
JP2008218254A (ja
Inventor
伸一 植田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2007055181A priority Critical patent/JP5088667B2/ja
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Publication of JP2008218254A5 publication Critical patent/JP2008218254A5/ja
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Publication of JP5088667B2 publication Critical patent/JP5088667B2/ja
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  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2007055181A 2007-03-06 2007-03-06 プラズマ処理装置 Expired - Fee Related JP5088667B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007055181A JP5088667B2 (ja) 2007-03-06 2007-03-06 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007055181A JP5088667B2 (ja) 2007-03-06 2007-03-06 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2008218254A JP2008218254A (ja) 2008-09-18
JP2008218254A5 JP2008218254A5 (enExample) 2010-04-22
JP5088667B2 true JP5088667B2 (ja) 2012-12-05

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Family Applications (1)

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JP2007055181A Expired - Fee Related JP5088667B2 (ja) 2007-03-06 2007-03-06 プラズマ処理装置

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JP (1) JP5088667B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012079429A (ja) * 2010-09-30 2012-04-19 Ngk Insulators Ltd プラズマ処理装置
EP2960358A1 (en) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Plasma source and surface treatment method
EP3214204B1 (en) * 2014-10-29 2024-11-27 TMEIC Corporation Gas jetting device
JP6844937B2 (ja) * 2019-02-13 2021-03-17 東芝三菱電機産業システム株式会社 活性ガス生成装置
CN119571293B (zh) * 2024-12-17 2025-07-29 佛山市屹博电子科技有限公司 一种等离子体射流喷头及等离子体增强化学气相沉积设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6228084A (ja) * 1985-07-30 1987-02-06 Akira Kanekawa プラズマ・ジエツト・ト−チ
WO1998040533A1 (fr) * 1997-03-13 1998-09-17 Komatsu Ltd. Dispositif et procede de traitement de surface
US5893985A (en) * 1997-03-14 1999-04-13 The Lincoln Electric Company Plasma arc torch
JPH11354290A (ja) * 1998-06-08 1999-12-24 Ishikawajima Harima Heavy Ind Co Ltd 微粉炭着火用プラズマトーチ
JP2005285520A (ja) * 2004-03-29 2005-10-13 Hiroshi Takigawa プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置

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Publication number Publication date
JP2008218254A (ja) 2008-09-18

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