JP5055141B2 - 評価方法、調整方法、露光装置、およびプログラム - Google Patents

評価方法、調整方法、露光装置、およびプログラム Download PDF

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Publication number
JP5055141B2
JP5055141B2 JP2008003641A JP2008003641A JP5055141B2 JP 5055141 B2 JP5055141 B2 JP 5055141B2 JP 2008003641 A JP2008003641 A JP 2008003641A JP 2008003641 A JP2008003641 A JP 2008003641A JP 5055141 B2 JP5055141 B2 JP 5055141B2
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Japan
Prior art keywords
optical system
projection optical
polarization state
imaging performance
value
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Expired - Fee Related
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JP2008003641A
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English (en)
Japanese (ja)
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JP2009170466A5 (enExample
JP2009170466A (ja
Inventor
禎 荒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008003641A priority Critical patent/JP5055141B2/ja
Priority to KR1020090002096A priority patent/KR101031715B1/ko
Priority to TW098100652A priority patent/TWI412898B/zh
Priority to US12/351,019 priority patent/US8520190B2/en
Publication of JP2009170466A publication Critical patent/JP2009170466A/ja
Publication of JP2009170466A5 publication Critical patent/JP2009170466A5/ja
Application granted granted Critical
Publication of JP5055141B2 publication Critical patent/JP5055141B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008003641A 2008-01-10 2008-01-10 評価方法、調整方法、露光装置、およびプログラム Expired - Fee Related JP5055141B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008003641A JP5055141B2 (ja) 2008-01-10 2008-01-10 評価方法、調整方法、露光装置、およびプログラム
KR1020090002096A KR101031715B1 (ko) 2008-01-10 2009-01-09 평가 방법, 제어 방법 및 메모리 매체
TW098100652A TWI412898B (zh) 2008-01-10 2009-01-09 評估方法，控制方法，曝光設備，及記憶體媒體
US12/351,019 US8520190B2 (en) 2008-01-10 2009-01-09 Evaluation method, control method, exposure apparatus, and memory medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008003641A JP5055141B2 (ja) 2008-01-10 2008-01-10 評価方法、調整方法、露光装置、およびプログラム

Publications (3)

Publication Number Publication Date
JP2009170466A JP2009170466A (ja) 2009-07-30
JP2009170466A5 JP2009170466A5 (enExample) 2011-02-10
JP5055141B2 true JP5055141B2 (ja) 2012-10-24

Family

ID=40850354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008003641A Expired - Fee Related JP5055141B2 (ja) 2008-01-10 2008-01-10 評価方法、調整方法、露光装置、およびプログラム

Country Status (4)

Country Link
US (1) US8520190B2 (enExample)
JP (1) JP5055141B2 (enExample)
KR (1) KR101031715B1 (enExample)
TW (1) TWI412898B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5539148B2 (ja) * 2010-10-19 2014-07-02 キヤノン株式会社 レジストパターンの算出方法及び算出プログラム
JP2012255843A (ja) * 2011-06-07 2012-12-27 Konica Minolta Business Technologies Inc 画像形成装置、画像形成システムおよび画像形成プログラム
KR101831320B1 (ko) 2013-11-20 2018-02-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치
JP6606800B2 (ja) * 2015-04-23 2019-11-20 株式会社トーメーコーポレーション 偏光情報を利用した光干渉断層計
EP3278720B1 (en) * 2016-08-05 2019-05-29 Tomey Corporation Optical coherence tomographic device
JP7547185B2 (ja) * 2020-12-10 2024-09-09 キヤノン株式会社 情報処理装置、露光装置、及び物品の製造方法。

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11176733A (ja) * 1997-12-15 1999-07-02 Nikon Corp 露光方法および装置
US6870668B2 (en) * 2000-10-10 2005-03-22 Nikon Corporation Method for evaluating image formation performance
JP4436029B2 (ja) * 2001-02-13 2010-03-24 株式会社ニコン 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム
JP4352458B2 (ja) * 2002-03-01 2009-10-28 株式会社ニコン 投影光学系の調整方法、予測方法、評価方法、調整方法、露光方法及び露光装置、露光装置の製造方法、プログラム並びにデバイス製造方法
JP3805323B2 (ja) 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
JP2006237109A (ja) * 2005-02-23 2006-09-07 Nikon Corp 光学系の評価方法、光学系、露光装置、および露光方法
JP4701030B2 (ja) 2005-07-22 2011-06-15 キヤノン株式会社 露光装置、露光パラメータを設定する設定方法、露光方法、デバイス製造方法及びプログラム
JP4793683B2 (ja) 2006-01-23 2011-10-12 株式会社ニコン 算出方法、調整方法及び露光方法、並びに像形成状態調整システム及び露光装置
JP2007198896A (ja) * 2006-01-26 2007-08-09 Canon Inc 計測方法
EP1818658A1 (en) 2006-02-08 2007-08-15 Carl Zeiss SMT AG Method for approximating the influence of an optical system on the state of polarisation of optical radiation
US8126669B2 (en) * 2008-06-09 2012-02-28 Carl Zeiss Smt Gmbh Optimization and matching of optical systems by use of orientation Zernike polynomials

Also Published As

Publication number Publication date
US20090180093A1 (en) 2009-07-16
TW200942981A (en) 2009-10-16
KR101031715B1 (ko) 2011-04-29
TWI412898B (zh) 2013-10-21
KR20090077726A (ko) 2009-07-15
US8520190B2 (en) 2013-08-27
JP2009170466A (ja) 2009-07-30

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