TWI412898B - 評估方法，控制方法，曝光設備，及記憶體媒體 - Google Patents

評估方法，控制方法，曝光設備，及記憶體媒體 Download PDF

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Publication number
TWI412898B
TWI412898B TW098100652A TW98100652A TWI412898B TW I412898 B TWI412898 B TW I412898B TW 098100652 A TW098100652 A TW 098100652A TW 98100652 A TW98100652 A TW 98100652A TW I412898 B TWI412898 B TW I412898B
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TW
Taiwan
Prior art keywords
optical system
projection optical
value
polarization
change
Prior art date
Application number
TW098100652A
Other languages
English (en)
Chinese (zh)
Other versions
TW200942981A (en
Inventor
Tadashi Arai
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200942981A publication Critical patent/TW200942981A/zh
Application granted granted Critical
Publication of TWI412898B publication Critical patent/TWI412898B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW098100652A 2008-01-10 2009-01-09 評估方法，控制方法，曝光設備，及記憶體媒體 TWI412898B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008003641A JP5055141B2 (ja) 2008-01-10 2008-01-10 評価方法、調整方法、露光装置、およびプログラム

Publications (2)

Publication Number Publication Date
TW200942981A TW200942981A (en) 2009-10-16
TWI412898B true TWI412898B (zh) 2013-10-21

Family

ID=40850354

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098100652A TWI412898B (zh) 2008-01-10 2009-01-09 評估方法，控制方法，曝光設備，及記憶體媒體

Country Status (4)

Country Link
US (1) US8520190B2 (enExample)
JP (1) JP5055141B2 (enExample)
KR (1) KR101031715B1 (enExample)
TW (1) TWI412898B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5539148B2 (ja) * 2010-10-19 2014-07-02 キヤノン株式会社 レジストパターンの算出方法及び算出プログラム
JP2012255843A (ja) * 2011-06-07 2012-12-27 Konica Minolta Business Technologies Inc 画像形成装置、画像形成システムおよび画像形成プログラム
KR101831320B1 (ko) 2013-11-20 2018-02-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치
JP6606800B2 (ja) * 2015-04-23 2019-11-20 株式会社トーメーコーポレーション 偏光情報を利用した光干渉断層計
EP3278720B1 (en) * 2016-08-05 2019-05-29 Tomey Corporation Optical coherence tomographic device
JP7547185B2 (ja) * 2020-12-10 2024-09-09 キヤノン株式会社 情報処理装置、露光装置、及び物品の製造方法。

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050024612A1 (en) * 2002-03-01 2005-02-03 Nikon Corporation Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method
US20070046921A1 (en) * 2005-07-22 2007-03-01 Kazuhiro Takahashi Exposure apparatus and method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11176733A (ja) * 1997-12-15 1999-07-02 Nikon Corp 露光方法および装置
US6870668B2 (en) * 2000-10-10 2005-03-22 Nikon Corporation Method for evaluating image formation performance
JP4436029B2 (ja) * 2001-02-13 2010-03-24 株式会社ニコン 投影光学系の製造方法及び調整方法、露光装置及びその製造方法、デバイス製造方法、並びにコンピュータシステム
JP3805323B2 (ja) 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
JP2006237109A (ja) * 2005-02-23 2006-09-07 Nikon Corp 光学系の評価方法、光学系、露光装置、および露光方法
JP4793683B2 (ja) 2006-01-23 2011-10-12 株式会社ニコン 算出方法、調整方法及び露光方法、並びに像形成状態調整システム及び露光装置
JP2007198896A (ja) * 2006-01-26 2007-08-09 Canon Inc 計測方法
EP1818658A1 (en) 2006-02-08 2007-08-15 Carl Zeiss SMT AG Method for approximating the influence of an optical system on the state of polarisation of optical radiation
US8126669B2 (en) * 2008-06-09 2012-02-28 Carl Zeiss Smt Gmbh Optimization and matching of optical systems by use of orientation Zernike polynomials

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050024612A1 (en) * 2002-03-01 2005-02-03 Nikon Corporation Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method
US20070046921A1 (en) * 2005-07-22 2007-03-01 Kazuhiro Takahashi Exposure apparatus and method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
【Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations】 Journal of Micro/Nanolithography, MEMS, and MOEMS 5(03), 033001, (1 Jul 2006)。 *

Also Published As

Publication number Publication date
US20090180093A1 (en) 2009-07-16
TW200942981A (en) 2009-10-16
KR101031715B1 (ko) 2011-04-29
JP5055141B2 (ja) 2012-10-24
KR20090077726A (ko) 2009-07-15
US8520190B2 (en) 2013-08-27
JP2009170466A (ja) 2009-07-30

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