JP5043167B2 - 反射型光電式エンコーダ用スケール及び光電式エンコーダ - Google Patents
反射型光電式エンコーダ用スケール及び光電式エンコーダ Download PDFInfo
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- JP5043167B2 JP5043167B2 JP2010212589A JP2010212589A JP5043167B2 JP 5043167 B2 JP5043167 B2 JP 5043167B2 JP 2010212589 A JP2010212589 A JP 2010212589A JP 2010212589 A JP2010212589 A JP 2010212589A JP 5043167 B2 JP5043167 B2 JP 5043167B2
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- 229910052751 metal Inorganic materials 0.000 claims description 129
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- 229910052804 chromium Inorganic materials 0.000 description 43
- 239000011651 chromium Substances 0.000 description 43
- 238000005530 etching Methods 0.000 description 35
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 31
- 229910052721 tungsten Inorganic materials 0.000 description 31
- 239000010937 tungsten Substances 0.000 description 31
- 238000012545 processing Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 20
- 238000005259 measurement Methods 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000004088 simulation Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241000668842 Lepidosaphes gloverii Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
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- 150000002500 ions Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
- G01D5/34707—Scales; Discs, e.g. fixation, fabrication, compensation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Optical Transform (AREA)
Description
第1実施形態は、第1の金属層(タングステン)上に所定のピッチで複数の第2の金属層(クロム)が配列形成された反射型の光学格子を、光電式エンコーダのスケールに配置した点を主な特徴にしている。まず、第1実施形態に係る光電式エンコーダ1の構成について説明する。図1は、エンコーダ1の概略構成を示す図である。エンコーダ1は、光源部3と、ここで発生した光が照射される光学格子を含むスケール5と、この光学格子で反射された光を受光する受光部7と、により構成される。
第2実施形態は、第1の金属層(クロム)上にピッチを設けて複数の第2の金属層(タングステン)を形成し、複数の第2の金属層上にそれぞれ第3の金属層(クロム)を形成した反射型の光学格子を、光電式エンコーダのスケールに配置した点を主な特徴にしている。第2実施形態については、第1実施形態と相違する点を中心に説明する。第2実施形態を説明する図において第1実施形態で説明した図の符号で示すものと同一のものについては、同一符号を付すことにより説明を省略する。
図13に示すスケールと異なり、位相格子103の側面107に反射膜が付されていないスケールは、必ずしも安定した回折効率が得られなかった。
回折光光量Bの回折効率=1000/2000=50%
回折光光量Cの回折効率=800/2000=40%
回折光光量Aの相対回折効率=60/60=1
回折光光量Bの相対回折効率=50/60=0.83
回折光光量Cの相対回折効率=40/60=0.67
さて、図10に基づく結果を考察する。側壁角度θが80度や90度の場合でも、相対回折効率は高く、かつ変動が小さい。しかし、側壁角度θを90度に加工するには、ドライエッチング工程において、次のことが必要となる。(1)エッチング時間を長くしたり、エッチングイオンエネルギーを増加させたりして、オーバーエッチングを多くする。(2)エッチングマスクの耐プラズマ性を向上させる。したがって、側壁角度θを90度に加工するのは、比較的難しい。
Claims (3)
- 基板上に一様な反射膜を備え、その上に前記反射膜よりも反射率が低い材質からなる位相格子を備え、この位相格子の上端に前記反射膜と同じ材質からなる反射膜を備え、前記位相格子の側壁角度が80度より大きく、且つ、90度未満であることを特徴とする反射型光電式エンコーダ用スケール。
- 前記位相格子は、前記反射膜より加工選択比が高い金属からなる
ことを特徴とする請求項1記載の反射型光電式エンコーダ用スケール。 - 請求項1又は2に記載のスケールを備えたことを特徴とする反射型光電式エンコーダ。
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JP2010212589A JP5043167B2 (ja) | 2004-01-26 | 2010-09-22 | 反射型光電式エンコーダ用スケール及び光電式エンコーダ |
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JP2004017567 | 2004-01-26 | ||
JP2004017567 | 2004-01-26 | ||
JP2004091344 | 2004-03-26 | ||
JP2004091344 | 2004-03-26 | ||
JP2010212589A JP5043167B2 (ja) | 2004-01-26 | 2010-09-22 | 反射型光電式エンコーダ用スケール及び光電式エンコーダ |
Related Parent Applications (1)
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JP2005013052A Division JP4913345B2 (ja) | 2004-01-26 | 2005-01-20 | 反射型光電式エンコーダ用スケール、スケールの製造方法及び光電式エンコーダ |
Publications (2)
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JP2010281839A JP2010281839A (ja) | 2010-12-16 |
JP5043167B2 true JP5043167B2 (ja) | 2012-10-10 |
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JP2010212589A Active JP5043167B2 (ja) | 2004-01-26 | 2010-09-22 | 反射型光電式エンコーダ用スケール及び光電式エンコーダ |
Country Status (5)
Country | Link |
---|---|
US (1) | US7129475B2 (ja) |
EP (1) | EP1557701B1 (ja) |
JP (1) | JP5043167B2 (ja) |
CN (1) | CN100397045C (ja) |
DE (1) | DE602005000684T2 (ja) |
Families Citing this family (26)
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JP2006178312A (ja) * | 2004-12-24 | 2006-07-06 | Canon Inc | 表面反射型位相格子 |
JP4828612B2 (ja) * | 2007-06-01 | 2011-11-30 | 株式会社ミツトヨ | 反射型エンコーダ、そのスケール、及び、スケールの製造方法 |
JP4971047B2 (ja) | 2007-06-19 | 2012-07-11 | 株式会社ミツトヨ | 表面反射型エンコーダ用スケール及びそれを用いた表面反射型エンコーダ |
GB0720408D0 (en) * | 2007-10-18 | 2007-11-28 | Renishaw Plc | Metrological scale and method of manufacture |
JP2010181181A (ja) * | 2009-02-03 | 2010-08-19 | Canon Inc | スケール、それを有する変位検出装置、及びそれを有する撮像装置 |
FR2945159B1 (fr) * | 2009-04-29 | 2016-04-01 | Horiba Jobin Yvon Sas | Reseau de diffraction metallique en reflexion a haute tenue au flux en regime femtoseconde, systeme comprenant un tel reseau et procede d'amelioration du seuil d'endommagement d'un reseau de diffraction metallique |
DE102010063253A1 (de) * | 2010-12-16 | 2012-06-21 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
CN103906997B (zh) * | 2011-10-31 | 2016-12-07 | 日本精工株式会社 | 光学传感器、光学传感器的制造方法、光学式编码器、扭矩检测装置以及电动动力转向装置 |
JP5846686B2 (ja) * | 2011-11-22 | 2016-01-20 | 株式会社ミツトヨ | 光電式エンコーダのスケールの製造方法 |
CN104094087B (zh) * | 2011-12-28 | 2016-07-20 | 株式会社尼康 | 编码器、编码器用标尺制造方法、编码器制造方法及驱动装置 |
US20130221212A1 (en) * | 2012-02-24 | 2013-08-29 | Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. | Coding Members With Embedded Metal Layers For Encoders |
CN103176231B (zh) * | 2013-03-04 | 2016-04-27 | 中国科学院长春光学精密机械与物理研究所 | 单层膜反射式平面金属光栅及其制作方法 |
JP6425875B2 (ja) * | 2013-06-14 | 2018-11-21 | 株式会社ミツトヨ | 光電式測定器用スケール、エンコーダ及びスケールの形成方法 |
WO2015147756A1 (en) * | 2014-03-27 | 2015-10-01 | Heptagon Micro Optics Pte. Ltd. | Optical encoder system |
CN103954600B (zh) * | 2014-05-12 | 2017-01-25 | 国家纳米科学中心 | 一种荧光纳米标尺部件及其制作方法 |
DE102015201230A1 (de) | 2015-01-26 | 2016-07-28 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
CN107430217B (zh) * | 2015-03-05 | 2021-01-15 | 奇跃公司 | 虚拟和增强现实系统和组件的改进制造 |
JP7060370B2 (ja) | 2017-12-18 | 2022-04-26 | 株式会社ミツトヨ | スケールおよびその製造方法 |
JP2019120500A (ja) * | 2017-12-28 | 2019-07-22 | 株式会社ミツトヨ | スケールおよびその製造方法 |
JP7140495B2 (ja) | 2017-12-28 | 2022-09-21 | 株式会社ミツトヨ | スケールおよびその製造方法 |
CN110411485A (zh) * | 2018-04-27 | 2019-11-05 | 广东工业大学 | 基于掩膜滤除光干扰的透射式绝对旋转编码器及测量方法 |
US10761334B2 (en) * | 2018-07-13 | 2020-09-01 | Varian Semiconductor Equipment Associates, Inc. | System and method for optimally forming gratings of diffracted optical elements |
US10795173B2 (en) | 2018-07-13 | 2020-10-06 | Varian Semiconductor Equipment Associates, Inc. | System and method for optimally forming gratings of diffracted optical elements |
US11119405B2 (en) | 2018-10-12 | 2021-09-14 | Applied Materials, Inc. | Techniques for forming angled structures |
US11226556B2 (en) | 2019-04-11 | 2022-01-18 | Applied Materials, Inc. | Patterning of multi-depth optical devices |
JP2021192010A (ja) * | 2020-06-05 | 2021-12-16 | 株式会社ミツトヨ | スケールおよびその製造方法 |
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DE3412980A1 (de) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Auflichtphasengitter und verfahren zur herstellung eines auflichtphasengitters |
IN168444B (ja) * | 1986-08-15 | 1991-04-06 | Mitutoyo Mfg Co Ltd | |
US5004673A (en) * | 1987-04-20 | 1991-04-02 | Environmental Research Institute Of Michigan | Method of manufacturing surface relief patterns of variable cross-sectional geometry |
JPH02244002A (ja) * | 1989-03-17 | 1990-09-28 | Sekinosu Kk | 射出成形用光回折格子コアの作成方法 |
JPH0624747B2 (ja) * | 1990-10-15 | 1994-04-06 | セキノス株式会社 | 微細加工を施した射出成形用コアの作成方法 |
JPH07113905A (ja) * | 1993-10-15 | 1995-05-02 | Ricoh Co Ltd | 回折格子作製方法 |
DE59509940D1 (de) * | 1995-04-13 | 2002-01-24 | Heidenhain Gmbh Dr Johannes | Ma stab und Verfahren zur Herstellung eines Ma stabes sowie Positionsmesseinrichtung |
CN1146551A (zh) * | 1995-09-29 | 1997-04-02 | 天津大学 | 光栅位移测量装置 |
DE19652563A1 (de) | 1996-12-17 | 1998-06-18 | Heidenhain Gmbh Dr Johannes | Lichtelektrische Positionsmeßeinrichtung |
CN2395251Y (zh) * | 1999-06-17 | 2000-09-06 | 张学能 | 光栅位移传感器 |
DE10020575A1 (de) * | 2000-04-28 | 2001-10-31 | Heidenhain Gmbh Dr Johannes | Abtasteinheit für eine optische Positionsmesseinrichtung |
DE10025694C2 (de) * | 2000-05-24 | 2003-06-05 | Zeiss Carl | Verwendung eines Beugungsgitters |
DE10150099A1 (de) * | 2001-10-11 | 2003-04-17 | Heidenhain Gmbh Dr Johannes | Verfahren zur Herstellung eines Maßstabes, sowie derart hergestellter Maßstab und eine Positionsmesseinrichtung |
US6930053B2 (en) * | 2002-03-25 | 2005-08-16 | Sanyo Electric Co., Ltd. | Method of forming grating microstructures by anodic oxidation |
JP2004045672A (ja) * | 2002-07-11 | 2004-02-12 | Canon Inc | 偏光分離素子およびそれを用いた光学系 |
-
2005
- 2005-01-24 CN CNB2005100056807A patent/CN100397045C/zh not_active Expired - Fee Related
- 2005-01-26 EP EP05001563A patent/EP1557701B1/en not_active Expired - Fee Related
- 2005-01-26 DE DE602005000684T patent/DE602005000684T2/de active Active
- 2005-01-26 US US11/042,075 patent/US7129475B2/en not_active Expired - Fee Related
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2010
- 2010-09-22 JP JP2010212589A patent/JP5043167B2/ja active Active
Also Published As
Publication number | Publication date |
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US20050207013A1 (en) | 2005-09-22 |
CN100397045C (zh) | 2008-06-25 |
EP1557701B1 (en) | 2007-03-14 |
US7129475B2 (en) | 2006-10-31 |
CN1648611A (zh) | 2005-08-03 |
JP2010281839A (ja) | 2010-12-16 |
DE602005000684T2 (de) | 2007-06-28 |
DE602005000684D1 (de) | 2007-04-26 |
EP1557701A1 (en) | 2005-07-27 |
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