JP5039912B2 - ヘテロ集積型歪みシリコンn型MOSFET及びp型MOSFET及びその製造方法 - Google Patents
ヘテロ集積型歪みシリコンn型MOSFET及びp型MOSFET及びその製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title description 11
- 229910052710 silicon Inorganic materials 0.000 title description 2
- 239000010703 silicon Substances 0.000 title description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 140
- 239000004065 semiconductor Substances 0.000 claims description 97
- 238000000034 method Methods 0.000 claims description 83
- 229910045601 alloy Inorganic materials 0.000 claims description 81
- 239000000956 alloy Substances 0.000 claims description 81
- 239000000758 substrate Substances 0.000 claims description 80
- 238000000137 annealing Methods 0.000 claims description 36
- 230000007547 defect Effects 0.000 claims description 31
- 238000005468 ion implantation Methods 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 13
- 229910052734 helium Inorganic materials 0.000 claims description 10
- 238000001289 rapid thermal chemical vapour deposition Methods 0.000 claims description 8
- 238000000038 ultrahigh vacuum chemical vapour deposition Methods 0.000 claims description 6
- 230000005669 field effect Effects 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- 229910003811 SiGeC Inorganic materials 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 238000001451 molecular beam epitaxy Methods 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052805 deuterium Inorganic materials 0.000 claims description 2
- 238000000407 epitaxy Methods 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 238000000869 ion-assisted deposition Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 230000002040 relaxant effect Effects 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 description 21
- 238000002513 implantation Methods 0.000 description 17
- 238000000059 patterning Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 239000001307 helium Substances 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Description
Si含有基板の表面内部に少なくとも1つの損傷領域を形成するステップと、
該Si含有基板の該表面の少なくとも一部分の上に歪みSiGe合金を形成するステップと、
欠陥に起因する歪み緩和によって該歪みSiGe合金を実質的に緩和させるように、約700℃以上の温度でアニールするステップと、
実質的に緩和した該歪みSiGe合金の上に歪み半導体キャップを形成するステップと、
を含む。
内部に板状欠陥及び転位ループが存在するSi含有基板と、
該Si含有基板の一部分の上に配置され、該板状欠陥及び該転位ループの上に配置される実質的に緩和したSiGeの少なくとも1つの領域と、
前記実質的に緩和したSiGeの上に配置される歪み半導体の少なくとも1つの領域と、
を備える。
12:Si含有基板
14:損傷領域
16:歪みSiGe合金層
18:実質的に緩和したSiGe合金層
20:板状欠陥
22:転位ループ
24:歪み半導体キャップ
52:半導体キャップ
54:歪み領域
56:非歪み領域
Claims (28)
- 半導体構造体を形成する方法であって、
Si基板の表面の内部に少なくとも1つの損傷領域を形成するステップと、
前記Si基板の前記損傷領域上部の前記表面の少なくとも一部分の上に歪みSiGe合金を形成するステップと、
700℃以上の温度でアニールして、前記損傷領域内から前記歪みSiGe合金の下面に至る板状欠陥及び転位ループを形成させ、欠陥に起因する歪み緩和によって前記歪みSiGe合金を緩和させるステップと、
緩和した前記歪みSiGe合金の上に歪み半導体キャップを形成するステップと、を含む方法。 - 前記少なくとも1つの損傷領域は、He、H、D、B、及びNから構成される群から選択された少なくとも1つの原子をイオン注入することによって形成される、請求項1に記載の方法。
- 前記少なくとも1つの原子は、5×1015から2×1016cm−2のイオン注入量で注入される、請求項2に記載の方法。
- 前記少なくとも1つの損傷領域は、前記Si基板の前記表面の下の90nmから300nmの範囲に形成される、請求項1に記載の方法。
- 前記歪みSiGe合金はエピタキシャル成長工程によって形成される、請求項1に記載の方法。
- 前記エピタキシャル成長工程は、超高真空化学気相堆積(UHVCVD)、急速加熱化学気相堆積(RTCVD)、化学気相堆積(CVD)、分子線エピタキシ(MBE)、イオン補助堆積、及び化学線エピタキシから構成される群から選択される、請求項5に記載の方法。
- 前記歪みSiGe合金は前記Si基板の表面全体の上に存在する、請求項1に記載の方法。
- 前記アニールは、非酸化性環境内において行われる、請求項1に記載の方法。
- 前記歪みSiGe合金は選択的に成長させられる、請求項1に記載の方法。
- 前記歪みSiGe合金の組成は、疑似格子整合のSi1−xGexであり、Geのモル分率であるxは、一定で、かつ、0.01から1未満である、請求項1に記載の方法。
- 前記歪みSiGe合金の組成は、疑似格子整合の勾配の付いたSi1−xGexであり、xは、前記Si含有基板の前記表面における0から、SiGe合金の上部領域における0.01から1未満の値まで増加する、請求項1に記載の方法。
- 前記歪み半導体キャップは、Si、SiGe、Ge、SiC、又はSiGeCのうちの1つを含む、請求項1に記載の方法。
- 前記少なくとも1つの損傷領域を形成するステップは、少なくとも1つの不連続かつ分離した損傷領域を前記Si基板に形成するためのマスク・イオン注入工程を含み、前記歪みSiGe合金は、該Si基板の表面全体にわたって形成される、請求項1に記載の方法。
- 前記アニールするステップの際に、前記歪みSiGe合金の前記少なくとも1つの不連続かつ分離した損傷領域の上に位置する部分が緩和され、該歪みSiGe合金の該少なくとも1つの不連続かつ分離した損傷領域の上に位置しない他の部分が変化しない、請求項13に記載の方法。
- 前記歪み半導体キャップを形成する際に、前記緩和したSiGeの上に歪み半導体が配置され、前記歪みSiGe合金の上に非歪み半導体キャップ材料が配置される、請求項14に記載の方法。
- 前記非歪み半導体キャップ材料が除去される、請求項15に記載の方法。
- 前記少なくとも1つの損傷領域を形成するステップは、少なくとも1つの不連続かつ分離した損傷領域を前記Si基板に形成するためのマスク・イオン注入工程を含み、前記歪みSiGe合金は、該Si基板の前記少なくとも1つの不連続かつ分離した損傷領域を含む部分の上に選択的に形成される、請求項1に記載の方法。
- すくなくとも1つの金属酸化物半導体電界効果トランジスタを前記構造体の上に形成するステップをさらに含む、請求項1に記載の方法。
- 内部に板状欠陥及び転位ループを有するSi基板と、
前記Si基板の一部分の上に配置され、前記板状欠陥及び前記転位ループの上に配置される緩和したSiGeの少なくとも1つの領域と、
前記緩和したSiGeの上に配置される歪み半導体の少なくとも1つの領域と、
少なくとも1つの金属酸化物半導体電界効果トランジスタ(MOSFET)とを備え、
前記MOSFETは、p型MOSFET及びn型MOSFETからなり、前記p型MOSFETは、前記歪み半導体に接する非歪み半導体の上に配置され、前記n型MOSFETは、前記歪み半導体の上に配置される、半導体構造体。 - 前記歪み半導体は、Si、SiGe、Ge、SiC、SiGeC、又はそれらの多層構造を含む、請求項19に記載の半導体構造体。
- 前記SiGe合金の組成はSi1−xGexであり、Geのモル分率であるxは、一定で、かつ0.01から1未満である、請求項19に記載の半導体構造体。
- 前記歪み半導体は、二軸引っ張り歪みSiからなる、請求項19に記載の半導体構造体。
- 前記SiGe合金の組成は勾配の付いたSi1−xGexであり、xは、前記Si基板の前記表面における0から、SiGe合金の上部領域における0.01から1未満の値まで増加する、請求項19に記載の半導体構造体。
- 前記n型MOSFETは、二軸引っ張り歪みを有する前記歪み半導体の上に配置される、請求項19に記載の半導体構造体。
- 前記歪み半導体は、1%より小さい二軸引っ張り歪みを有する、請求項19に記載の半導体構造体。
- 半導体構造体を形成する方法であって、
Si基板の表面の内部に少なくとも1つの不連続かつ分離した損傷領域を形成するステップと、
前記Si基板の前記少なくとも1つの不連続かつ分離した損傷領域上部の前記表面の少なくとも一部分の上に歪みSiGe合金を形成するステップと、
700℃以上の温度でアニールして、前記損傷領域内から前記歪みSiGe合金の下面に至る板状欠陥及び転位ループを形成させることにより、前記歪みSiGe合金の前記少なくとも1つの不連続かつ分離した損傷領域の上に位置する部分が緩和され、該歪みSiGe合金の該少なくとも1つの不連続かつ分離した損傷領域の上に位置しない他の部分が緩和されないステップと、
緩和した前記歪みSiGe合金の上に歪み半導体キャップを形成し、緩和されない前記歪みSiGe合金の上に非歪み半導体キャップを形成するステップと、を含む方法。 - 前記非歪み半導体キャップを除去するステップをさらに含む、請求項26に記載の方法。
- 半導体構造体を形成する方法であって、
Si基板の表面の内部に少なくとも1つの不連続かつ分離した損傷領域を形成するステップと、
前記Si基板の前記少なくとも1つの不連続かつ分離した損傷領域上部の前記表面の部分の上に選択的に歪みSiGe合金を形成するステップと、
700℃以上の温度でアニールして、前記損傷領域内から前記歪みSiGe合金の下面に至る板状欠陥及び転位ループを形成させ、欠陥に起因する歪み緩和によって前記歪みSiGe合金を緩和させるステップと、
緩和した前記歪みSiGe合金の上に歪み半導体キャップを形成するステップと、を含む方法。
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