JP5026788B2 - マイクロリソグラフィの照明システム - Google Patents

マイクロリソグラフィの照明システム Download PDF

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Publication number
JP5026788B2
JP5026788B2 JP2006521398A JP2006521398A JP5026788B2 JP 5026788 B2 JP5026788 B2 JP 5026788B2 JP 2006521398 A JP2006521398 A JP 2006521398A JP 2006521398 A JP2006521398 A JP 2006521398A JP 5026788 B2 JP5026788 B2 JP 5026788B2
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Japan
Prior art keywords
field
illumination
honeycomb
light
pupil
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Expired - Fee Related
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JP2006521398A
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English (en)
Japanese (ja)
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JP2007500432A (ja
JP2007500432A5 (enExample
Inventor
ヴォルフガング・ジンガー
ヨアヒム・ヴィートゾッレク
ヨアヒム・ハインツ
ガブリエレ・ヴァイラウヒ
マンフレッド・マウル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2007500432A5 publication Critical patent/JP2007500432A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lighting Device Outwards From Vehicle And Optical Signal (AREA)
JP2006521398A 2003-07-30 2004-04-13 マイクロリソグラフィの照明システム Expired - Fee Related JP5026788B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10334722 2003-07-30
DE10334722.4 2003-07-30
PCT/EP2004/003854 WO2005015314A2 (en) 2003-07-30 2004-04-13 An illumination system for microlithography

Publications (3)

Publication Number Publication Date
JP2007500432A JP2007500432A (ja) 2007-01-11
JP2007500432A5 JP2007500432A5 (enExample) 2007-06-07
JP5026788B2 true JP5026788B2 (ja) 2012-09-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006521398A Expired - Fee Related JP5026788B2 (ja) 2003-07-30 2004-04-13 マイクロリソグラフィの照明システム

Country Status (7)

Country Link
US (1) US7911584B2 (enExample)
EP (1) EP1649324B1 (enExample)
JP (1) JP5026788B2 (enExample)
KR (1) KR101144458B1 (enExample)
AT (1) ATE502323T1 (enExample)
DE (1) DE602004031844D1 (enExample)
WO (1) WO2005015314A2 (enExample)

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WO2006136353A1 (en) * 2005-06-21 2006-12-28 Carl Zeiss Smt Ag A double-facetted illumination system with attenuator elements on the pupil facet mirror
JP2007150295A (ja) 2005-11-10 2007-06-14 Carl Zeiss Smt Ag ラスタ要素を有する光学装置、及びこの光学装置を有する照射システム
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102006020734A1 (de) 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
DE102006059024A1 (de) 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
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DE102007041004A1 (de) 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie
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DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
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WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102009014701A1 (de) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Optische Baugruppe
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KR101505256B1 (ko) * 2010-04-23 2015-03-30 칼 짜이스 에스엠티 게엠베하 리소그래픽 시스템의 광학 소자의 조작을 포함하는 리소그래픽 시스템의 작동 방법
EP2622609A1 (en) 2010-09-27 2013-08-07 Carl Zeiss SMT GmbH Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
DE102011085132A1 (de) 2010-11-24 2012-05-24 Carl Zeiss Smt Gmbh Optische Baugruppe für die Projektionslithografie
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
NL2008009A (en) * 2011-02-02 2012-08-06 Asml Netherlands Bv Illumination system, lithographic apparatus and method.
DE102011004326A1 (de) 2011-02-17 2012-08-23 Carl Zeiss Smt Gmbh Optische Baugruppe für eine Beleuchtungsoptik für die Projektionslithographie
JP2013072845A (ja) * 2011-09-29 2013-04-22 Nuflare Technology Inc パターン検査装置及びパターン検査方法
WO2013143594A1 (en) * 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
DE102012210174A1 (de) * 2012-06-18 2013-06-06 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102012218221A1 (de) * 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem
DE102014203187A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
DE102014217612A1 (de) 2014-09-03 2016-03-03 Carl Zeiss Smt Gmbh Beleuchtungoptik für die Projektonslithograpfie
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JP2019028392A (ja) * 2017-08-03 2019-02-21 セイコーエプソン株式会社 光源装置、照明装置及びプロジェクター
DE102021120952B3 (de) * 2021-08-11 2022-11-10 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop

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Also Published As

Publication number Publication date
WO2005015314A2 (en) 2005-02-17
US7911584B2 (en) 2011-03-22
DE602004031844D1 (de) 2011-04-28
JP2007500432A (ja) 2007-01-11
ATE502323T1 (de) 2011-04-15
KR20060039876A (ko) 2006-05-09
US20070058274A1 (en) 2007-03-15
EP1649324B1 (en) 2011-03-16
KR101144458B1 (ko) 2012-05-14
EP1649324A2 (en) 2006-04-26
WO2005015314A3 (en) 2005-11-24

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