JP5024973B2 - Ｘ線トポグラフィ装置 - Google Patents

Ｘ線トポグラフィ装置 Download PDF

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Publication number
JP5024973B2
JP5024973B2 JP2010000932A JP2010000932A JP5024973B2 JP 5024973 B2 JP5024973 B2 JP 5024973B2 JP 2010000932 A JP2010000932 A JP 2010000932A JP 2010000932 A JP2010000932 A JP 2010000932A JP 5024973 B2 JP5024973 B2 JP 5024973B2
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JP
Japan
Prior art keywords
ray
sample
planar
rays
ray detector
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Expired - Fee Related
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JP2010000932A
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English (en)
Japanese (ja)
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JP2011141148A (ja
JP2011141148A5 (enExample
Inventor
哲夫 菊池
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Rigaku Corp
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Rigaku Corp
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Application filed by Rigaku Corp filed Critical Rigaku Corp
Priority to JP2010000932A priority Critical patent/JP5024973B2/ja
Priority to US12/983,359 priority patent/US8503611B2/en
Publication of JP2011141148A publication Critical patent/JP2011141148A/ja
Publication of JP2011141148A5 publication Critical patent/JP2011141148A5/ja
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Publication of JP5024973B2 publication Critical patent/JP5024973B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

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  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Measurement Of Radiation (AREA)
JP2010000932A 2010-01-06 2010-01-06 Ｘ線トポグラフィ装置 Expired - Fee Related JP5024973B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010000932A JP5024973B2 (ja) 2010-01-06 2010-01-06 Ｘ線トポグラフィ装置
US12/983,359 US8503611B2 (en) 2010-01-06 2011-01-03 X-ray topography apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010000932A JP5024973B2 (ja) 2010-01-06 2010-01-06 Ｘ線トポグラフィ装置

Publications (3)

Publication Number Publication Date
JP2011141148A JP2011141148A (ja) 2011-07-21
JP2011141148A5 JP2011141148A5 (enExample) 2012-02-16
JP5024973B2 true JP5024973B2 (ja) 2012-09-12

Family

ID=44224693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010000932A Expired - Fee Related JP5024973B2 (ja) 2010-01-06 2010-01-06 Ｘ線トポグラフィ装置

Country Status (2)

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US (1) US8503611B2 (enExample)
JP (1) JP5024973B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5569510B2 (ja) * 2011-11-29 2014-08-13 パルステック工業株式会社 Ｘ線回折測定装置
WO2013118386A1 (ja) 2012-02-06 2013-08-15 株式会社日立ハイテクノロジーズ Ｘ線検査装置、検査方法およびｘ線検出器
JP5920593B2 (ja) * 2013-04-15 2016-05-18 パルステック工業株式会社 Ｘ線回折測定システム
CN103411985A (zh) * 2013-08-27 2013-11-27 北京化工大学 一种弱x光3d成像方法
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
US9726624B2 (en) 2014-06-18 2017-08-08 Bruker Jv Israel Ltd. Using multiple sources/detectors for high-throughput X-ray topography measurement
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
KR102450776B1 (ko) * 2017-10-27 2022-10-05 삼성전자주식회사 레이저 가공 방법, 기판 다이싱 방법 및 이를 수행하기 위한 기판 가공 장치
JP2023140749A (ja) * 2022-03-23 2023-10-05 株式会社リガク 損傷測定方法、装置、プログラムおよびｘ線回折装置
CN119310116A (zh) * 2024-12-16 2025-01-14 上海航天设备制造总厂有限公司 火箭箱底法兰焊缝的数字成像检测方法及系统

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2807000B2 (ja) * 1989-11-27 1998-09-30 株式会社マックサイエンス Ｘ線回折装置
JPH05289190A (ja) 1992-02-21 1993-11-05 Xerox Corp プロセス方向における解像度の増したイメージ・バー・プリンタ
JPH05264475A (ja) * 1992-03-17 1993-10-12 Fine Ceramics Center 工業用コンピュータ断層撮影装置
JPH10313383A (ja) 1997-05-13 1998-11-24 Canon Inc 画像読み取り装置
JPH1114564A (ja) * 1997-06-18 1999-01-22 Rigaku Corp Ｘ線トポグラフィック装置
JP3976292B2 (ja) 1999-04-30 2007-09-12 株式会社リガク Ｘ線トポグラフィ装置
JP3759524B2 (ja) 2003-10-17 2006-03-29 株式会社リガク Ｘ線分析装置
JP2006071321A (ja) 2004-08-31 2006-03-16 Rigaku Corp Ｘ線検出装置及びｘ線分析装置
DE102004049921A1 (de) * 2004-10-14 2006-04-20 Technische Universität Clausthal Vorrichtung und Verfahren zur Registrierung von Röntgenbeugungsdiagrammen kristalliner Materialien
US7943906B2 (en) * 2006-06-30 2011-05-17 Uchicago Argonne, Llc High spatial resolution X-ray and gamma ray imaging system using diffraction crystals

Also Published As

Publication number Publication date
JP2011141148A (ja) 2011-07-21
US8503611B2 (en) 2013-08-06
US20110164729A1 (en) 2011-07-07

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