JP4972834B2 - シロキサン樹脂 - Google Patents

シロキサン樹脂 Download PDF

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Publication number
JP4972834B2
JP4972834B2 JP2001257112A JP2001257112A JP4972834B2 JP 4972834 B2 JP4972834 B2 JP 4972834B2 JP 2001257112 A JP2001257112 A JP 2001257112A JP 2001257112 A JP2001257112 A JP 2001257112A JP 4972834 B2 JP4972834 B2 JP 4972834B2
Authority
JP
Japan
Prior art keywords
film
acid
silica
butoxysilane
iso
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001257112A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003064306A5 (enExample
JP2003064306A (ja
Inventor
和宏 榎本
治彰 桜井
茂 野部
浩一 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd, Resonac Corp filed Critical Hitachi Chemical Co Ltd
Priority to JP2001257112A priority Critical patent/JP4972834B2/ja
Publication of JP2003064306A publication Critical patent/JP2003064306A/ja
Publication of JP2003064306A5 publication Critical patent/JP2003064306A5/ja
Application granted granted Critical
Publication of JP4972834B2 publication Critical patent/JP4972834B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Compounds (AREA)
  • Paints Or Removers (AREA)
JP2001257112A 2001-08-28 2001-08-28 シロキサン樹脂 Expired - Fee Related JP4972834B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001257112A JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001257112A JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Publications (3)

Publication Number Publication Date
JP2003064306A JP2003064306A (ja) 2003-03-05
JP2003064306A5 JP2003064306A5 (enExample) 2005-10-13
JP4972834B2 true JP4972834B2 (ja) 2012-07-11

Family

ID=19084824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001257112A Expired - Fee Related JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Country Status (1)

Country Link
JP (1) JP4972834B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7687590B2 (en) 2002-02-27 2010-03-30 Hitachi Chemical Company, Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
KR20040094732A (ko) * 2002-02-27 2004-11-10 히다치 가세고교 가부시끼가이샤 실리카계 피막형성용 조성물, 실리카계 피막 및 그제조방법 및 전자부품
US7682701B2 (en) 2002-02-27 2010-03-23 Hitachi Chemical Co., Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
TW200605220A (en) * 2004-06-21 2006-02-01 Hitachi Chemical Co Ltd Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US20060047034A1 (en) 2004-09-02 2006-03-02 Haruaki Sakurai Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film
US20080260956A1 (en) * 2004-12-21 2008-10-23 Haruaki Sakurai Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part
JP2006213908A (ja) * 2004-12-21 2006-08-17 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2009193911A (ja) * 2008-02-18 2009-08-27 Sony Corp 色素増感光電変換素子およびその製造方法ならびに色素増感光電変換素子モジュールおよびその製造方法ならびに電子機器ならびに多孔質シリカ膜の製造方法
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287119B2 (ja) * 1994-07-13 2002-05-27 住友化学工業株式会社 シリカ系絶縁膜形成用塗布液
JPH08245792A (ja) * 1995-03-10 1996-09-24 Mitsubishi Electric Corp シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法
JP3328545B2 (ja) * 1997-05-28 2002-09-24 東レ・ダウコーニング・シリコーン株式会社 半導体装置の製造方法
JP2978879B1 (ja) * 1998-05-26 1999-11-15 静岡日本電気株式会社 Ｌｓｉパッケージ用モールド材
US6592980B1 (en) * 1999-12-07 2003-07-15 Air Products And Chemicals, Inc. Mesoporous films having reduced dielectric constants
JP4195773B2 (ja) * 2000-04-10 2008-12-10 Ｊｓｒ株式会社 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜
US6576568B2 (en) * 2000-04-04 2003-06-10 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations

Also Published As

Publication number Publication date
JP2003064306A (ja) 2003-03-05

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