JP2003064306A5 - - Google Patents

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Publication number
JP2003064306A5
JP2003064306A5 JP2001257112A JP2001257112A JP2003064306A5 JP 2003064306 A5 JP2003064306 A5 JP 2003064306A5 JP 2001257112 A JP2001257112 A JP 2001257112A JP 2001257112 A JP2001257112 A JP 2001257112A JP 2003064306 A5 JP2003064306 A5 JP 2003064306A5
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JP
Japan
Prior art keywords
group
different
same
siloxane
hydrolyzing
Prior art date
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Granted
Application number
JP2001257112A
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English (en)
Japanese (ja)
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JP2003064306A (ja
JP4972834B2 (ja
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Application filed filed Critical
Priority to JP2001257112A priority Critical patent/JP4972834B2/ja
Priority claimed from JP2001257112A external-priority patent/JP4972834B2/ja
Publication of JP2003064306A publication Critical patent/JP2003064306A/ja
Publication of JP2003064306A5 publication Critical patent/JP2003064306A5/ja
Application granted granted Critical
Publication of JP4972834B2 publication Critical patent/JP4972834B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001257112A 2001-08-28 2001-08-28 シロキサン樹脂 Expired - Fee Related JP4972834B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001257112A JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001257112A JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Publications (3)

Publication Number Publication Date
JP2003064306A JP2003064306A (ja) 2003-03-05
JP2003064306A5 true JP2003064306A5 (enExample) 2005-10-13
JP4972834B2 JP4972834B2 (ja) 2012-07-11

Family

ID=19084824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001257112A Expired - Fee Related JP4972834B2 (ja) 2001-08-28 2001-08-28 シロキサン樹脂

Country Status (1)

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JP (1) JP4972834B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1320073C (zh) * 2002-02-27 2007-06-06 日立化成工业株式会社 二氧化硅涂膜形成用组合物、二氧化硅涂膜及其制造方法、以及电子部件
US7682701B2 (en) 2002-02-27 2010-03-23 Hitachi Chemical Co., Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
US7687590B2 (en) 2002-02-27 2010-03-30 Hitachi Chemical Company, Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
TW200605220A (en) * 2004-06-21 2006-02-01 Hitachi Chemical Co Ltd Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US20060047034A1 (en) 2004-09-02 2006-03-02 Haruaki Sakurai Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film
WO2006068181A1 (ja) * 2004-12-21 2006-06-29 Hitachi Chemical Company, Ltd. 被膜、シリカ系被膜及びその形成方法、シリカ系被膜形成用組成物、並びに電子部品
JP2006213908A (ja) * 2004-12-21 2006-08-17 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2009193911A (ja) * 2008-02-18 2009-08-27 Sony Corp 色素増感光電変換素子およびその製造方法ならびに色素増感光電変換素子モジュールおよびその製造方法ならびに電子機器ならびに多孔質シリカ膜の製造方法
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287119B2 (ja) * 1994-07-13 2002-05-27 住友化学工業株式会社 シリカ系絶縁膜形成用塗布液
JPH08245792A (ja) * 1995-03-10 1996-09-24 Mitsubishi Electric Corp シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法
JP3328545B2 (ja) * 1997-05-28 2002-09-24 東レ・ダウコーニング・シリコーン株式会社 半導体装置の製造方法
JP2978879B1 (ja) * 1998-05-26 1999-11-15 静岡日本電気株式会社 Ｌｓｉパッケージ用モールド材
US6592980B1 (en) * 1999-12-07 2003-07-15 Air Products And Chemicals, Inc. Mesoporous films having reduced dielectric constants
JP4195773B2 (ja) * 2000-04-10 2008-12-10 Ｊｓｒ株式会社 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜
US6576568B2 (en) * 2000-04-04 2003-06-10 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations

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