JP4954401B2 - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP4954401B2
JP4954401B2 JP2001244237A JP2001244237A JP4954401B2 JP 4954401 B2 JP4954401 B2 JP 4954401B2 JP 2001244237 A JP2001244237 A JP 2001244237A JP 2001244237 A JP2001244237 A JP 2001244237A JP 4954401 B2 JP4954401 B2 JP 4954401B2
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Japan
Prior art keywords
gate electrode
region
film
resist pattern
semiconductor layer
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JP2001244237A
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English (en)
Japanese (ja)
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JP2002151523A5 (OSRAM
JP2002151523A (ja
Inventor
英人 大沼
一郎 上原
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2001244237A priority Critical patent/JP4954401B2/ja
Publication of JP2002151523A publication Critical patent/JP2002151523A/ja
Publication of JP2002151523A5 publication Critical patent/JP2002151523A5/ja
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Thin Film Transistor (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2001244237A 2000-08-11 2001-08-10 半導体装置の製造方法 Expired - Lifetime JP4954401B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001244237A JP4954401B2 (ja) 2000-08-11 2001-08-10 半導体装置の製造方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2000-244860 2000-08-11
JP2000244860 2000-08-11
JP2000244860 2000-08-11
JP2000267851 2000-09-04
JP2000-267851 2000-09-04
JP2000267851 2000-09-04
JP2001244237A JP4954401B2 (ja) 2000-08-11 2001-08-10 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011263276A Division JP5371156B2 (ja) 2000-08-11 2011-12-01 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2002151523A JP2002151523A (ja) 2002-05-24
JP2002151523A5 JP2002151523A5 (OSRAM) 2008-09-18
JP4954401B2 true JP4954401B2 (ja) 2012-06-13

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Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100878240B1 (ko) * 2002-09-16 2009-01-13 삼성전자주식회사 다결정용 마스크 및 이를 이용한 박막 트랜지스터의 제조방법
JP2005077955A (ja) * 2003-09-02 2005-03-24 Sanyo Electric Co Ltd エッチング方法およびそれを用いた回路装置の製造方法
TWI366218B (en) 2004-06-01 2012-06-11 Semiconductor Energy Lab Method for manufacturing semiconductor device
JP4954498B2 (ja) * 2004-06-01 2012-06-13 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100631019B1 (ko) 2004-06-30 2006-10-04 엘지.필립스 엘시디 주식회사 박막 트랜지스터 및 그 제조방법
JP4321486B2 (ja) 2004-07-12 2009-08-26 セイコーエプソン株式会社 半導体装置及び半導体装置の製造方法
JP2006133785A (ja) * 2004-11-08 2006-05-25 Lg Micron Ltd ハーフトーンマスク及びその製造方法並びにこれにより製造された平板ディスプレイ
TWI368327B (en) * 2005-01-17 2012-07-11 Samsung Electronics Co Ltd Optical mask and manufacturing method of thin film transistor array panel using the optical mask
US7579220B2 (en) 2005-05-20 2009-08-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device manufacturing method
JP4679437B2 (ja) * 2005-06-02 2011-04-27 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7608490B2 (en) 2005-06-02 2009-10-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5046565B2 (ja) * 2005-06-10 2012-10-10 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7588970B2 (en) 2005-06-10 2009-09-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
US7807516B2 (en) 2005-06-30 2010-10-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method of the same
JP5137342B2 (ja) * 2005-06-30 2013-02-06 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4708099B2 (ja) * 2005-07-04 2011-06-22 シャープ株式会社 トランジスタ製造用マスクおよびこれを用いてトランジスタを製造する方法
US7875483B2 (en) 2005-08-10 2011-01-25 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of microelectromechanical system
JP5127181B2 (ja) * 2005-08-10 2013-01-23 株式会社半導体エネルギー研究所 微小電気機械式装置の作製方法
JP5110821B2 (ja) * 2005-08-12 2012-12-26 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7914971B2 (en) * 2005-08-12 2011-03-29 Semiconductor Energy Laboratory Co., Ltd. Light exposure mask and method for manufacturing semiconductor device using the same
US7524593B2 (en) 2005-08-12 2009-04-28 Semiconductor Energy Laboratory Co., Ltd. Exposure mask
JP4850616B2 (ja) * 2005-08-12 2012-01-11 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR101267499B1 (ko) * 2005-08-18 2013-05-31 삼성디스플레이 주식회사 박막 트랜지스터 기판의 제조 방법 및 그에 의해 제조된박막 트랜지스터
US7601566B2 (en) 2005-10-18 2009-10-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5416881B2 (ja) * 2005-10-18 2014-02-12 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100796609B1 (ko) * 2006-08-17 2008-01-22 삼성에스디아이 주식회사 Ｃｍｏｓ 박막 트랜지스터의 제조방법
JP5005302B2 (ja) * 2006-09-19 2012-08-22 株式会社ジャパンディスプレイイースト 表示装置の製造方法
WO2008140136A1 (en) * 2007-05-11 2008-11-20 Lg Micron Ltd. A half tone mask having multi-half permeation part and a method of manufacturing the same
CN101382728B (zh) * 2007-09-07 2010-07-28 北京京东方光电科技有限公司 灰阶掩膜版结构
CN101387825B (zh) * 2007-09-10 2011-04-06 北京京东方光电科技有限公司 补偿型灰阶掩膜版结构
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP4930324B2 (ja) 2007-10-29 2012-05-16 セイコーエプソン株式会社 薄膜トランジスタの製造方法
JP5377940B2 (ja) * 2007-12-03 2013-12-25 株式会社半導体エネルギー研究所 半導体装置
KR100908236B1 (ko) 2008-04-24 2009-07-20 삼성모바일디스플레이주식회사 유기 발광 디스플레이 장치 및 그 제조방법
JP2011197553A (ja) * 2010-03-23 2011-10-06 Toshiba Corp 露光用マスク、不純物層を有する半導体装置の製造方法および固体撮像装置
JP7570255B2 (ja) * 2021-03-04 2024-10-21 株式会社エスケーエレクトロニクス 多階調フォトマスクの製造方法及び多階調フォトマスク

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02156624A (ja) * 1988-12-09 1990-06-15 Mitsubishi Electric Corp 半導体装置の製造方法
JP4536187B2 (ja) * 1998-11-17 2010-09-01 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
US6255130B1 (en) * 1998-11-19 2001-07-03 Samsung Electronics Co., Ltd. Thin film transistor array panel and a method for manufacturing the same

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