JP4873460B2 - 探針位置制御装置 - Google Patents

探針位置制御装置 Download PDF

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Publication number
JP4873460B2
JP4873460B2 JP2006145881A JP2006145881A JP4873460B2 JP 4873460 B2 JP4873460 B2 JP 4873460B2 JP 2006145881 A JP2006145881 A JP 2006145881A JP 2006145881 A JP2006145881 A JP 2006145881A JP 4873460 B2 JP4873460 B2 JP 4873460B2
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JP
Japan
Prior art keywords
probe
sample
position control
sample surface
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006145881A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007315918A (ja
JP2007315918A5 (enExample
Inventor
真之 阿部
昌弘 大田
宜昭 杉本
健一 森田
範昭 大藪
清三 森田
クスタンセ オスカル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
University of Osaka NUC
Original Assignee
Shimadzu Corp
Osaka University NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Osaka University NUC filed Critical Shimadzu Corp
Priority to JP2006145881A priority Critical patent/JP4873460B2/ja
Priority to CN200710138848A priority patent/CN100578679C/zh
Priority to US11/802,624 priority patent/US7703314B2/en
Priority to KR1020070050792A priority patent/KR100909700B1/ko
Publication of JP2007315918A publication Critical patent/JP2007315918A/ja
Publication of JP2007315918A5 publication Critical patent/JP2007315918A5/ja
Application granted granted Critical
Publication of JP4873460B2 publication Critical patent/JP4873460B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/04—Display or data processing devices
    • G01Q30/06—Display or data processing devices for error compensation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/30—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/02—Probe holders
    • G01Q70/04—Probe holders with compensation for temperature or vibration induced errors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
JP2006145881A 2006-05-25 2006-05-25 探針位置制御装置 Expired - Fee Related JP4873460B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006145881A JP4873460B2 (ja) 2006-05-25 2006-05-25 探針位置制御装置
CN200710138848A CN100578679C (zh) 2006-05-25 2007-05-24 探针位置控制系统和方法
US11/802,624 US7703314B2 (en) 2006-05-25 2007-05-24 Probe position control system and method
KR1020070050792A KR100909700B1 (ko) 2006-05-25 2007-05-25 탐침위치 제어장치 및 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006145881A JP4873460B2 (ja) 2006-05-25 2006-05-25 探針位置制御装置

Publications (3)

Publication Number Publication Date
JP2007315918A JP2007315918A (ja) 2007-12-06
JP2007315918A5 JP2007315918A5 (enExample) 2009-07-30
JP4873460B2 true JP4873460B2 (ja) 2012-02-08

Family

ID=38748276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006145881A Expired - Fee Related JP4873460B2 (ja) 2006-05-25 2006-05-25 探針位置制御装置

Country Status (4)

Country Link
US (1) US7703314B2 (enExample)
JP (1) JP4873460B2 (enExample)
KR (1) KR100909700B1 (enExample)
CN (1) CN100578679C (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007072621A1 (ja) * 2005-12-19 2007-06-28 National University Corporation Kanazawa University 走査型プローブ顕微鏡
US7712354B2 (en) * 2006-06-06 2010-05-11 Jeol Ltd. Method and apparatus for controlling Z-position of probe
JP4960724B2 (ja) * 2007-02-23 2012-06-27 パナソニック株式会社 赤外線センサおよびその製造方法
JP5424404B2 (ja) * 2008-02-12 2014-02-26 国立大学法人秋田大学 表面状態計測装置及び該装置を用いた表面状態計測方法
US20110074476A1 (en) * 2008-05-27 2011-03-31 Flavio Heer Apparatus for lock-in amplifying an input signal and method for generating a reference signal for a lock-in amplifier
US20100100991A1 (en) * 2008-10-20 2010-04-22 Nanochip, Inc. Charge-Amp Based Piezoelectric Charge Microscopy (CPCM) Reading of Ferroelectric Bit Charge Signal
KR101990916B1 (ko) * 2009-12-01 2019-06-19 브루커 나노, 인코퍼레이션. 스캐닝 프로브 현미경을 작동하는 방법 및 장치
WO2011116389A2 (en) * 2010-03-19 2011-09-22 Bruker Nano, Inc. Low drift scanning probe microscope
FR2959823B1 (fr) * 2010-05-07 2013-05-17 Centre Nat Rech Scient Microscope a force atomique fonctionnant en mode circulaire, dispositif permettant sa mise en oeuvre et procede de mesure
CN102346202A (zh) * 2010-07-29 2012-02-08 鸿富锦精密工业（深圳）有限公司 机械手
JP5592841B2 (ja) * 2011-06-16 2014-09-17 株式会社日立製作所 磁気力顕微鏡及びそれを用いた磁場観察方法
KR101417209B1 (ko) * 2011-07-07 2014-07-11 한양대학교 산학협력단 주사 탐침 현미경을 이용하여 획득된 데이터 값들에 존재하는 왜곡의 제거 장치 및 방법
US8490211B1 (en) 2012-06-28 2013-07-16 Western Digital Technologies, Inc. Methods for referencing related magnetic head microscopy scans to reduce processing requirements for high resolution imaging
US8989511B1 (en) 2012-06-28 2015-03-24 Western Digital Technologies, Inc. Methods for correcting for thermal drift in microscopy images
JP6185701B2 (ja) * 2012-10-15 2017-08-23 株式会社ミツトヨ 形状測定装置
US8860505B2 (en) 2013-02-04 2014-10-14 Zurich Instruments Ag Lock-in amplifier with phase-synchronous processing
US9075080B2 (en) 2013-03-15 2015-07-07 Bruker Nano, Inc. Method and apparatus for adaptive tracking using a scanning probe microscope
JP6274949B2 (ja) * 2014-04-04 2018-02-07 オリンパス株式会社 光ファイバスキャナ、照明装置および観察装置
KR101710337B1 (ko) * 2015-06-02 2017-02-28 파크시스템스 주식회사 조정 가능한 스캔 속도를 가지는 측정 장치 및 측정 방법
CN107850620B (zh) * 2015-06-25 2020-11-17 布鲁克纳米公司 用于扫描探针显微镜的样本容器保持器
KR101607606B1 (ko) * 2015-08-17 2016-03-31 한국표준과학연구원 원자간력 현미경의 측정 방법
JP6848640B2 (ja) * 2017-04-17 2021-03-24 株式会社島津製作所 走査型プローブ顕微鏡
CN107967693B (zh) * 2017-12-01 2021-07-09 北京奇虎科技有限公司 视频关键点处理方法、装置、计算设备及计算机存储介质
KR102216627B1 (ko) * 2019-09-17 2021-02-17 안동대학교 산학협력단 주사 탐침 현미경
DE102019131421A1 (de) * 2019-11-21 2021-05-27 Bruker Nano Gmbh Messvorrichtung für ein Rastersondenmikroskop und Verfahren zum rastersondenmikroskopischen Untersuchen einer Messprobe mit einem Rastersondenmikroskop
JP7625971B2 (ja) * 2021-05-27 2025-02-04 株式会社島津製作所 走査型プローブ顕微鏡および制御方法
WO2025216036A1 (ja) * 2024-04-08 2025-10-16 株式会社島津製作所 走査型プローブ顕微鏡およびその制御方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6169281B1 (en) * 1998-07-29 2001-01-02 International Business Machines Corporation Apparatus and method for determining side wall profiles using a scanning probe microscope having a probe dithered in lateral directions
JP4576520B2 (ja) 2000-07-18 2010-11-10 国立大学法人北陸先端科学技術大学院大学 試料表面の電子エネルギ準位の測定方法
US7013717B1 (en) 2001-12-06 2006-03-21 Veeco Instruments Inc. Manual control with force-feedback for probe microscopy-based force spectroscopy
US7473887B2 (en) * 2002-07-04 2009-01-06 University Of Bristol Of Senate House Resonant scanning probe microscope
JP4872074B2 (ja) 2005-04-08 2012-02-08 国立大学法人大阪大学 原子位置固定装置、原子位置固定方法、原子操作方法及び原子間力測定方法

Also Published As

Publication number Publication date
US20070272005A1 (en) 2007-11-29
KR20070114033A (ko) 2007-11-29
US7703314B2 (en) 2010-04-27
CN101083151A (zh) 2007-12-05
JP2007315918A (ja) 2007-12-06
CN100578679C (zh) 2010-01-06
KR100909700B1 (ko) 2009-07-29

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