JP4864617B2 - 洗浄液及びノズルプレート洗浄方法 - Google Patents
洗浄液及びノズルプレート洗浄方法 Download PDFInfo
- Publication number
- JP4864617B2 JP4864617B2 JP2006255512A JP2006255512A JP4864617B2 JP 4864617 B2 JP4864617 B2 JP 4864617B2 JP 2006255512 A JP2006255512 A JP 2006255512A JP 2006255512 A JP2006255512 A JP 2006255512A JP 4864617 B2 JP4864617 B2 JP 4864617B2
- Authority
- JP
- Japan
- Prior art keywords
- nozzle plate
- cleaning
- ink
- solution
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims description 82
- 239000007788 liquid Substances 0.000 title claims description 27
- 238000000034 method Methods 0.000 title claims description 17
- 239000000243 solution Substances 0.000 claims description 28
- 229920000642 polymer Polymers 0.000 claims description 23
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 17
- 239000001023 inorganic pigment Substances 0.000 claims description 14
- 229910044991 metal oxide Inorganic materials 0.000 claims description 14
- 150000004706 metal oxides Chemical class 0.000 claims description 14
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 12
- 238000005406 washing Methods 0.000 claims description 11
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 claims description 6
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 4
- 239000005871 repellent Substances 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 16
- 230000007246 mechanism Effects 0.000 description 8
- 239000003513 alkali Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000001139 pH measurement Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- -1 trimethylammonium hydride Chemical compound 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/12—Carbonates bicarbonates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/165—Prevention or detection of nozzle clogging, e.g. cleaning, capping or moistening for nozzles
- B41J2/16517—Cleaning of print head nozzles
- B41J2/16552—Cleaning of print head nozzles using cleaning fluids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Ink Jet (AREA)
Description
Claims (9)
- pH8〜pH12のTMAH(トリメチルアンモニウムハイドライド)溶液に、TMAH炭酸塩が添加されていることを特徴とする洗浄液。
- インクは、無機顔料と金属酸化物との少なくとも一方がポリマーに混合され、ポリマー溶解溶液を用いて前記インクが付着したノズルプレートを洗浄する第1ステップと、
ポリエチレングリコールモノメチルエーテルアセテートとシクロヘキサンとを含む前記ポリマー溶解溶液による前記第1ステップの洗浄の後に、pH8〜pH12の弱アルカリ性の洗浄液を使用して前記ノズルプレートを洗浄する第2ステップと、
を備えることを特徴とするノズルプレート洗浄方法。 - 前記弱アルカリ性の洗浄液に、炭酸塩が添加されていることを特徴とする請求項2記載のノズルプレート洗浄方法。
- 前記第1ステップの後に、ポリマーを溶解されたインクの無機顔料と金属酸化物との両方又は一方がノズルプレートの表面に残っていることを特徴とする請求項2記載のノズルプレート洗浄方法。
- 前記第1ステップは、超音波洗浄によって行われることを特徴とする請求項2記載のノズルプレート洗浄方法。
- 前記第2ステップは、超音波洗浄によって行われることを特徴とする請求項2記載のノズルプレート洗浄方法。
- 前記無機顔料と前記金属酸化物との両方又は一方は、前記第2ステップにおいて前記ノズルプレートから除去されることを特徴とする請求項2記載のノズルプレート洗浄方法。
- 前記弱アルカリ性の洗浄液は、前記ノズルプレートの表面を覆っているフッ素系樹脂からなる撥インク膜を傷めることなく前記無機顔料と前記金属酸化物との両方又は一方を除去することを特徴とする請求項2記載のノズルプレートの洗浄方法。
- 前記第2ステップにおいて使用される前記弱アルカリ性の洗浄液は、pH8〜pH12の前記弱アルカリ溶液に5ppm〜1%の炭酸塩を添加したものであることを特徴とする請求項2記載のノズルプレートの洗浄方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006255512A JP4864617B2 (ja) | 2006-09-21 | 2006-09-21 | 洗浄液及びノズルプレート洗浄方法 |
US11/856,364 US7632359B2 (en) | 2006-09-21 | 2007-09-17 | Cleaning liquid and nozzle plate cleaning method |
KR1020070095596A KR100954639B1 (ko) | 2006-09-21 | 2007-09-20 | 세정액 및 노즐 플레이트 세정 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006255512A JP4864617B2 (ja) | 2006-09-21 | 2006-09-21 | 洗浄液及びノズルプレート洗浄方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008073942A JP2008073942A (ja) | 2008-04-03 |
JP2008073942A5 JP2008073942A5 (ja) | 2009-10-22 |
JP4864617B2 true JP4864617B2 (ja) | 2012-02-01 |
Family
ID=39346501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006255512A Expired - Fee Related JP4864617B2 (ja) | 2006-09-21 | 2006-09-21 | 洗浄液及びノズルプレート洗浄方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7632359B2 (ja) |
JP (1) | JP4864617B2 (ja) |
KR (1) | KR100954639B1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102109444B1 (ko) * | 2018-07-20 | 2020-05-29 | (주)일루미네이드 | 막힘 방지 기능을 갖는 3d 프린터 노즐 |
KR102629621B1 (ko) | 2018-12-26 | 2024-01-25 | 동우 화인켐 주식회사 | 포토레지스트 노즐 세정액 조성물 |
KR20200114761A (ko) | 2019-03-29 | 2020-10-07 | 동우 화인켐 주식회사 | 세정액 조성물 |
KR20200114756A (ko) | 2019-03-29 | 2020-10-07 | 동우 화인켐 주식회사 | 세정액 조성물 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3802127C1 (ja) | 1988-01-26 | 1988-12-01 | Kaiser, H.-G. | |
JPH1085652A (ja) * | 1996-09-18 | 1998-04-07 | Dainippon Printing Co Ltd | 基板回転装置 |
US5888308A (en) * | 1997-02-28 | 1999-03-30 | International Business Machines Corporation | Process for removing residue from screening masks with alkaline solution |
JP3942721B2 (ja) * | 1998-02-27 | 2007-07-11 | 日本工業洗浄株式会社 | 重質炭化水素系スラッジが付着した機器の洗浄方法および洗浄用配管構造 |
JP2000008083A (ja) * | 1998-06-18 | 2000-01-11 | Japan Organo Co Ltd | ガス溶解水製造装置 |
US6286929B1 (en) * | 1998-12-29 | 2001-09-11 | Eastman Kodak Company | Self-cleaning ink jet printer with oscillating septum and ultrasonics and method of assembling the printer |
JP3597100B2 (ja) * | 1999-02-10 | 2004-12-02 | 松下電器産業株式会社 | 有機薄膜の製造方法、この有機薄膜を用いた液晶表示装置及びその製造方法 |
US6517188B1 (en) * | 2000-06-22 | 2003-02-11 | Eastman Kodak Company | Ink jet print head cleaning |
US6596677B1 (en) * | 2000-09-25 | 2003-07-22 | Huntsman Petrochemical Corporation | Propylene carbonate based cleaning compositions |
US6599370B2 (en) * | 2000-10-16 | 2003-07-29 | Mallinckrodt Inc. | Stabilized alkaline compositions for cleaning microelectronic substrates |
JP2002270566A (ja) * | 2001-03-06 | 2002-09-20 | Toshiba Corp | 洗浄液および半導体装置の製造方法 |
JP2002361190A (ja) * | 2001-06-04 | 2002-12-17 | Canon Inc | パスボックス、記録ヘッドの洗浄方法、洗浄方法および洗浄装置 |
US6869161B2 (en) * | 2002-06-28 | 2005-03-22 | Agfa-Gevaert | Method for cleaning a nozzle plate |
US6648464B1 (en) * | 2002-09-06 | 2003-11-18 | Hewlett-Packard Development Company, L.P. | Systems and methods for servicing ink-jet pens containing reactive inks |
US7182424B2 (en) * | 2003-01-22 | 2007-02-27 | Seiko Epson Corporation | Ink jet recording process for detecting dot omission of clear ink and apparatus for conducting the process |
JP2005103895A (ja) * | 2003-09-30 | 2005-04-21 | Konica Minolta Holdings Inc | インクジェット記録装置 |
US7044580B2 (en) | 2003-11-18 | 2006-05-16 | Toshiba Tec Kabushiki Kaisha | Ink jet recording head maintenance apparatus and ink jet recording apparatus |
-
2006
- 2006-09-21 JP JP2006255512A patent/JP4864617B2/ja not_active Expired - Fee Related
-
2007
- 2007-09-17 US US11/856,364 patent/US7632359B2/en not_active Expired - Fee Related
- 2007-09-20 KR KR1020070095596A patent/KR100954639B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR100954639B1 (ko) | 2010-04-27 |
JP2008073942A (ja) | 2008-04-03 |
US20080207478A1 (en) | 2008-08-28 |
KR20080027160A (ko) | 2008-03-26 |
US7632359B2 (en) | 2009-12-15 |
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