JP4820377B2 - シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置 - Google Patents

シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置 Download PDF

Info

Publication number
JP4820377B2
JP4820377B2 JP2007554344A JP2007554344A JP4820377B2 JP 4820377 B2 JP4820377 B2 JP 4820377B2 JP 2007554344 A JP2007554344 A JP 2007554344A JP 2007554344 A JP2007554344 A JP 2007554344A JP 4820377 B2 JP4820377 B2 JP 4820377B2
Authority
JP
Japan
Prior art keywords
mirror
prism
facets
mask
objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007554344A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008530786A5 (enExample
JP2008530786A (ja
Inventor
フェルバー、ヨエルク
シュミット、へニング
Original Assignee
コヒーレント・インク
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コヒーレント・インク filed Critical コヒーレント・インク
Publication of JP2008530786A publication Critical patent/JP2008530786A/ja
Publication of JP2008530786A5 publication Critical patent/JP2008530786A5/ja
Application granted granted Critical
Publication of JP4820377B2 publication Critical patent/JP4820377B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007554344A 2005-02-09 2006-02-07 シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置 Active JP4820377B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US65119305P 2005-02-09 2005-02-09
US60/651,193 2005-02-09
US11/348,185 2006-02-06
US11/348,185 US7331676B2 (en) 2005-02-09 2006-02-06 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective
PCT/US2006/004458 WO2006086486A2 (en) 2005-02-09 2006-02-07 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective

Publications (3)

Publication Number Publication Date
JP2008530786A JP2008530786A (ja) 2008-08-07
JP2008530786A5 JP2008530786A5 (enExample) 2009-04-02
JP4820377B2 true JP4820377B2 (ja) 2011-11-24

Family

ID=36779047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007554344A Active JP4820377B2 (ja) 2005-02-09 2006-02-07 シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置

Country Status (3)

Country Link
US (1) US7331676B2 (enExample)
JP (1) JP4820377B2 (enExample)
WO (1) WO2006086486A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040156455A1 (en) * 2003-08-29 2004-08-12 Hoke Charles D. External cavity laser in which diffractive focusing is confined to a peripheral portion of a diffractive focusing element
US7817246B2 (en) * 2006-06-21 2010-10-19 Asml Netherlands B.V. Optical apparatus
JP5425060B2 (ja) 2007-06-22 2014-02-26 アークル インコーポレイテッド ピロリジノン、ピロリジン−２，５−ジオン、ピロリジンおよびチオスクシンイミド誘導体、癌の治療のための組成物および方法
DE102008038591B3 (de) * 2008-08-21 2010-07-22 Laser-Laboratorium Göttingen e.V. Vorrichtung zur Erzeugung eines periodischen Beleuchtungsmusters und Verfahren zu deren Betrieb
US7961306B2 (en) * 2009-03-30 2011-06-14 Tokyo Electron Limited Optimizing sensitivity of optical metrology measurements
US8030631B2 (en) * 2009-03-30 2011-10-04 Tokyo Electron Limited Apparatus for controlling angle of incidence of multiple illumination beams
US8030632B2 (en) * 2009-03-30 2011-10-04 Tokyo Electron Limted Controlling angle of incidence of multiple-beam optical metrology tools
WO2011089592A1 (en) * 2010-01-20 2011-07-28 Moshe Finarov A method of laser processing
KR102483322B1 (ko) 2015-09-30 2022-12-30 삼성디스플레이 주식회사 편광 모듈 및 이를 포함하는 레이저 조사 장치

Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198007A (ja) * 1989-06-29 1991-08-29 Boeing Co:The カトプトリック光学装置
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps
JPH0513301A (ja) * 1991-06-28 1993-01-22 Mitsubishi Electric Corp 投影露光装置
JPH0695003A (ja) * 1992-08-28 1994-04-08 Tandem Scanning Corp 立体タンデム型走査反射光共焦点顕微鏡
JPH0694613A (ja) * 1992-09-11 1994-04-08 Satoshi Kawada 赤外顕微測定装置
JPH06151281A (ja) * 1992-11-05 1994-05-31 Nikon Corp Ｘ線露光装置
JPH06175031A (ja) * 1990-03-02 1994-06-24 Spectra Tech Inc 光学式試料分析装置及び光学式試料分析方法
JPH06204123A (ja) * 1992-12-29 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH07142369A (ja) * 1993-11-15 1995-06-02 Nec Corp 露光装置
JPH0854738A (ja) * 1994-08-11 1996-02-27 Nec Corp 微細パターン形成方法
JPH08160200A (ja) * 1994-12-01 1996-06-21 Olympus Optical Co Ltd 照明光学系
DE19533314A1 (de) * 1995-09-08 1997-03-13 Microlas Lasersystem Gmbh Abbildungsoptik zum verkleinernden Abbilden eines Lichtstrahls
JPH1020196A (ja) * 1996-07-08 1998-01-23 Canon Inc 変倍光学系及びそれを用いた撮像装置
WO1999025009A1 (en) * 1997-11-10 1999-05-20 Nikon Corporation Exposure apparatus
JP2000150371A (ja) * 1992-03-05 2000-05-30 Nikon Corp 露光装置及び半導体素子の製造方法
JP2001236673A (ja) * 2000-02-17 2001-08-31 Minolta Co Ltd 光ヘッド及び光記録・再生装置
JP2001332489A (ja) * 2000-03-13 2001-11-30 Nikon Corp 照明光学系、投影露光装置、及びデバイス製造方法
JP2003163153A (ja) * 2001-11-27 2003-06-06 Canon Inc 露光方法及び装置、並びにデバイス製造方法及びデバイス
JP2003163152A (ja) * 2001-11-27 2003-06-06 Canon Inc 露光方法及び装置、並びにデバイス製造方法及びデバイス
JP2006186365A (ja) * 2004-12-27 2006-07-13 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07220990A (ja) 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
US5975703A (en) * 1996-09-30 1999-11-02 Digital Optics International Image projection system
DE19935404A1 (de) * 1999-07-30 2001-02-01 Zeiss Carl Fa Beleuchtungssystem mit mehreren Lichtquellen
DE19838518A1 (de) * 1998-08-25 2000-03-02 Bosch Gmbh Robert Anordnung
US6423925B1 (en) * 2000-02-17 2002-07-23 Universal Laser Systems, Inc. Apparatus and method for combining multiple laser beams in laser material processing systems
US6313433B1 (en) * 2000-04-03 2001-11-06 Universal Laser Systems, Inc Laser material processing system with multiple laser sources apparatus and method
US6771683B2 (en) * 2000-10-26 2004-08-03 Coherent, Inc. Intra-cavity beam homogenizer resonator

Patent Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198007A (ja) * 1989-06-29 1991-08-29 Boeing Co:The カトプトリック光学装置
JPH06175031A (ja) * 1990-03-02 1994-06-24 Spectra Tech Inc 光学式試料分析装置及び光学式試料分析方法
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps
JPH0513301A (ja) * 1991-06-28 1993-01-22 Mitsubishi Electric Corp 投影露光装置
JP2000150371A (ja) * 1992-03-05 2000-05-30 Nikon Corp 露光装置及び半導体素子の製造方法
JPH0695003A (ja) * 1992-08-28 1994-04-08 Tandem Scanning Corp 立体タンデム型走査反射光共焦点顕微鏡
JPH0694613A (ja) * 1992-09-11 1994-04-08 Satoshi Kawada 赤外顕微測定装置
JPH06151281A (ja) * 1992-11-05 1994-05-31 Nikon Corp Ｘ線露光装置
JPH06204123A (ja) * 1992-12-29 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH07142369A (ja) * 1993-11-15 1995-06-02 Nec Corp 露光装置
JPH0854738A (ja) * 1994-08-11 1996-02-27 Nec Corp 微細パターン形成方法
JPH08160200A (ja) * 1994-12-01 1996-06-21 Olympus Optical Co Ltd 照明光学系
DE19533314A1 (de) * 1995-09-08 1997-03-13 Microlas Lasersystem Gmbh Abbildungsoptik zum verkleinernden Abbilden eines Lichtstrahls
JPH1020196A (ja) * 1996-07-08 1998-01-23 Canon Inc 変倍光学系及びそれを用いた撮像装置
WO1999025009A1 (en) * 1997-11-10 1999-05-20 Nikon Corporation Exposure apparatus
JP2001236673A (ja) * 2000-02-17 2001-08-31 Minolta Co Ltd 光ヘッド及び光記録・再生装置
JP2001332489A (ja) * 2000-03-13 2001-11-30 Nikon Corp 照明光学系、投影露光装置、及びデバイス製造方法
JP2003163153A (ja) * 2001-11-27 2003-06-06 Canon Inc 露光方法及び装置、並びにデバイス製造方法及びデバイス
JP2003163152A (ja) * 2001-11-27 2003-06-06 Canon Inc 露光方法及び装置、並びにデバイス製造方法及びデバイス
JP2006186365A (ja) * 2004-12-27 2006-07-13 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Also Published As

Publication number Publication date
WO2006086486A3 (en) 2006-12-21
US20060175557A1 (en) 2006-08-10
JP2008530786A (ja) 2008-08-07
US7331676B2 (en) 2008-02-19
WO2006086486A2 (en) 2006-08-17

Similar Documents

Publication Publication Date Title
US11759886B2 (en) Laser line illumination
JP4653129B2 (ja) ライトバルブ均等照射装置
US10578881B2 (en) Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit
US7210820B2 (en) Methods and apparatuses for homogenizing light
JP4808893B2 (ja) 画像投影装置及び集光システム
TWI714524B (zh) 用於投影微影的照明光學單元、光瞳琢面反射鏡、光學系統、照明系統、投影曝光裝置、用以產生一微結構組件之方法以及微結構組件
JP5059049B2 (ja) 分割器及び光束の変形方法及び照明装置
US9588434B2 (en) Catoptric illumination system for microlithography tool
JP2004510340A (ja) 特にマイクロリソグラフィ用の照明光学系
JP4820377B2 (ja) シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置
KR102344281B1 (ko) 콜렉터
US5218660A (en) Illumination device
TWI866257B (zh) 用於光罩檢查系統的照明光學單元、光學系統及光罩檢查系統
JP4510399B2 (ja) 反射光学系、及びそれを用いた投影装置
JPS63114186A (ja) 照明装置
JP2005504357A (ja) 可干渉性のビームの干渉性を低下させる装置
JP5038362B2 (ja) 反射光学系、及びそれを用いた投影装置
JPH04250455A (ja) 円弧照明装置
KR100644586B1 (ko) 프로젝터용 균일광 조명장치
KR100188953B1 (ko) 액정프로젝트의 조명장치
JP2016186659A (ja) 投射光学系および画像表示装置
JP6037185B2 (ja) 投射光学系および画像表示装置
JPH04252012A (ja) 円弧照明装置
WO2016078964A1 (en) Illumination optical unit for illuminating an illumination field and projection exposure apparatus comprising such an illumination optical unit

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090129

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090129

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110817

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110830

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110902

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140909

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4820377

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250