JP2008530786A5 - - Google Patents

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Publication number
JP2008530786A5
JP2008530786A5 JP2007554344A JP2007554344A JP2008530786A5 JP 2008530786 A5 JP2008530786 A5 JP 2008530786A5 JP 2007554344 A JP2007554344 A JP 2007554344A JP 2007554344 A JP2007554344 A JP 2007554344A JP 2008530786 A5 JP2008530786 A5 JP 2008530786A5
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JP
Japan
Prior art keywords
mirror
prism
facets
mask
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007554344A
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English (en)
Japanese (ja)
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JP4820377B2 (ja
JP2008530786A (ja
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Publication date
Priority claimed from US11/348,185 external-priority patent/US7331676B2/en
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Publication of JP2008530786A publication Critical patent/JP2008530786A/ja
Publication of JP2008530786A5 publication Critical patent/JP2008530786A5/ja
Application granted granted Critical
Publication of JP4820377B2 publication Critical patent/JP4820377B2/ja
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JP2007554344A 2005-02-09 2006-02-07 シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置 Active JP4820377B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US65119305P 2005-02-09 2005-02-09
US60/651,193 2005-02-09
US11/348,185 2006-02-06
US11/348,185 US7331676B2 (en) 2005-02-09 2006-02-06 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective
PCT/US2006/004458 WO2006086486A2 (en) 2005-02-09 2006-02-07 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective

Publications (3)

Publication Number Publication Date
JP2008530786A JP2008530786A (ja) 2008-08-07
JP2008530786A5 true JP2008530786A5 (enExample) 2009-04-02
JP4820377B2 JP4820377B2 (ja) 2011-11-24

Family

ID=36779047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007554344A Active JP4820377B2 (ja) 2005-02-09 2006-02-07 シュワルツシルト対物鏡を使用してフォトマスクの縮写像を投影する装置

Country Status (3)

Country Link
US (1) US7331676B2 (enExample)
JP (1) JP4820377B2 (enExample)
WO (1) WO2006086486A2 (enExample)

Families Citing this family (9)

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US20040156455A1 (en) * 2003-08-29 2004-08-12 Hoke Charles D. External cavity laser in which diffractive focusing is confined to a peripheral portion of a diffractive focusing element
US7817246B2 (en) * 2006-06-21 2010-10-19 Asml Netherlands B.V. Optical apparatus
JP5425060B2 (ja) 2007-06-22 2014-02-26 アークル インコーポレイテッド ピロリジノン、ピロリジン−２，５−ジオン、ピロリジンおよびチオスクシンイミド誘導体、癌の治療のための組成物および方法
DE102008038591B3 (de) * 2008-08-21 2010-07-22 Laser-Laboratorium Göttingen e.V. Vorrichtung zur Erzeugung eines periodischen Beleuchtungsmusters und Verfahren zu deren Betrieb
US7961306B2 (en) * 2009-03-30 2011-06-14 Tokyo Electron Limited Optimizing sensitivity of optical metrology measurements
US8030631B2 (en) * 2009-03-30 2011-10-04 Tokyo Electron Limited Apparatus for controlling angle of incidence of multiple illumination beams
US8030632B2 (en) * 2009-03-30 2011-10-04 Tokyo Electron Limted Controlling angle of incidence of multiple-beam optical metrology tools
WO2011089592A1 (en) * 2010-01-20 2011-07-28 Moshe Finarov A method of laser processing
KR102483322B1 (ko) 2015-09-30 2022-12-30 삼성디스플레이 주식회사 편광 모듈 및 이를 포함하는 레이저 조사 장치

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US4988858A (en) * 1986-11-12 1991-01-29 The Boeing Company Catoptric multispectral band imaging and detecting device
US5019715A (en) * 1990-03-02 1991-05-28 Spectra-Tech, Inc. Optical system and method for sample analyzation
US5136413A (en) * 1990-11-05 1992-08-04 Litel Instruments Imaging and illumination system with aspherization and aberration correction by phase steps
JPH0513301A (ja) * 1991-06-28 1993-01-22 Mitsubishi Electric Corp 投影露光装置
JP3296346B2 (ja) * 1992-03-05 2002-06-24 株式会社ニコン 露光装置及び半導体素子の製造方法
JPH0695003A (ja) * 1992-08-28 1994-04-08 Tandem Scanning Corp 立体タンデム型走査反射光共焦点顕微鏡
JPH0694613A (ja) * 1992-09-11 1994-04-08 Satoshi Kawada 赤外顕微測定装置
JP3077422B2 (ja) * 1992-11-05 2000-08-14 株式会社ニコン Ｘ線露光装置
JPH06204123A (ja) * 1992-12-29 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH07142369A (ja) * 1993-11-15 1995-06-02 Nec Corp 露光装置
JPH07220990A (ja) 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
JP2684994B2 (ja) * 1994-08-11 1997-12-03 日本電気株式会社 微細パターン形成方法
JPH08160200A (ja) * 1994-12-01 1996-06-21 Olympus Optical Co Ltd 照明光学系
DE19533314C2 (de) 1995-09-08 1998-05-20 Microlas Lasersystem Gmbh Abbildungsoptik zum verkleinernden Abbilden eines Lichtstrahls
JPH1020196A (ja) * 1996-07-08 1998-01-23 Canon Inc 変倍光学系及びそれを用いた撮像装置
US5975703A (en) * 1996-09-30 1999-11-02 Digital Optics International Image projection system
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DE19935404A1 (de) * 1999-07-30 2001-02-01 Zeiss Carl Fa Beleuchtungssystem mit mehreren Lichtquellen
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JP2001236673A (ja) * 2000-02-17 2001-08-31 Minolta Co Ltd 光ヘッド及び光記録・再生装置
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US20060138349A1 (en) * 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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