JP4776792B2 - 発光装置および電気器具 - Google Patents

発光装置および電気器具 Download PDF

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Publication number
JP4776792B2
JP4776792B2 JP2001053361A JP2001053361A JP4776792B2 JP 4776792 B2 JP4776792 B2 JP 4776792B2 JP 2001053361 A JP2001053361 A JP 2001053361A JP 2001053361 A JP2001053361 A JP 2001053361A JP 4776792 B2 JP4776792 B2 JP 4776792B2
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region
electrode
insulating film
tft
gate
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JP2001318628A5 (enExample
JP2001318628A (ja
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舜平 山崎
潤 小山
和隆 犬飼
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)
JP2001053361A 2000-02-28 2001-02-28 発光装置および電気器具 Expired - Lifetime JP4776792B2 (ja)

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JP2001053361A JP4776792B2 (ja) 2000-02-28 2001-02-28 発光装置および電気器具

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JP2000-50584 2000-02-28
JP2000050584 2000-02-28
JP2000050584 2000-02-28
JP2001053361A JP4776792B2 (ja) 2000-02-28 2001-02-28 発光装置および電気器具

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JP2001318628A JP2001318628A (ja) 2001-11-16
JP2001318628A5 JP2001318628A5 (enExample) 2008-04-10
JP4776792B2 true JP4776792B2 (ja) 2011-09-21

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Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100637433B1 (ko) 2004-05-24 2006-10-20 삼성에스디아이 주식회사 발광 표시 장치
US7483001B2 (en) * 2001-11-21 2009-01-27 Seiko Epson Corporation Active matrix substrate, electro-optical device, and electronic device
JP3939666B2 (ja) * 2002-01-18 2007-07-04 株式会社半導体エネルギー研究所 発光装置及び電子機器
JP4490403B2 (ja) * 2002-01-18 2010-06-23 株式会社半導体エネルギー研究所 発光装置
CN101673508B (zh) * 2002-01-18 2013-01-09 株式会社半导体能源研究所 发光器件
JP3706107B2 (ja) * 2002-01-18 2005-10-12 株式会社半導体エネルギー研究所 発光装置及び電子機器
JP3818261B2 (ja) * 2002-01-24 2006-09-06 セイコーエプソン株式会社 発光装置及び電子機器
JP2003255858A (ja) * 2002-02-28 2003-09-10 Sanyo Electric Co Ltd 表示装置
US7230592B2 (en) 2002-03-04 2007-06-12 Hitachi, Ltd. Organic electroluminescent light emitting display device
JP3989761B2 (ja) * 2002-04-09 2007-10-10 株式会社半導体エネルギー研究所 半導体表示装置
US7038239B2 (en) 2002-04-09 2006-05-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor element and display device using the same
JP4463493B2 (ja) 2002-04-15 2010-05-19 株式会社半導体エネルギー研究所 表示装置及びその作製方法
JP3989763B2 (ja) 2002-04-15 2007-10-10 株式会社半導体エネルギー研究所 半導体表示装置
JP2003330388A (ja) * 2002-05-15 2003-11-19 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
US7256421B2 (en) 2002-05-17 2007-08-14 Semiconductor Energy Laboratory, Co., Ltd. Display device having a structure for preventing the deterioration of a light emitting device
JP4640690B2 (ja) 2002-07-24 2011-03-02 日本電気株式会社 アクティブマトリクス有機el表示装置の製造方法
KR100768972B1 (ko) 2002-11-25 2007-10-22 도시바 마쯔시따 디스플레이 테크놀로지 컴퍼니, 리미티드 유기 el 표시 패널
US8937580B2 (en) * 2003-08-08 2015-01-20 Semiconductor Energy Laboratory Co., Ltd. Driving method of light emitting device and light emitting device
JP4287337B2 (ja) * 2003-11-24 2009-07-01 三星モバイルディスプレイ株式會社 有機電界発光表示装置及びその製造方法
KR100684825B1 (ko) * 2003-11-24 2007-02-20 삼성에스디아이 주식회사 유기 전계발광 표시 장치 및 그 제조 방법
KR100612392B1 (ko) 2004-10-13 2006-08-16 삼성에스디아이 주식회사 발광 표시 장치 및 발광 표시 패널
KR100688801B1 (ko) 2004-11-22 2007-03-02 삼성에스디아이 주식회사 델타 화소회로 및 발광 표시장치
KR100688802B1 (ko) 2004-11-22 2007-03-02 삼성에스디아이 주식회사 화소 및 발광 표시장치
JP5177962B2 (ja) * 2005-05-20 2013-04-10 株式会社半導体エネルギー研究所 半導体装置
US7705346B2 (en) * 2005-06-06 2010-04-27 Xerox Corporation Barrier layer for an organic electronic device
KR101324756B1 (ko) 2005-10-18 2013-11-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치 및 그의 구동방법
JP4661557B2 (ja) * 2005-11-30 2011-03-30 セイコーエプソン株式会社 発光装置および電子機器
KR101433680B1 (ko) * 2005-12-02 2014-08-25 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 디스플레이 장치, 및 전자 장치
JP5250960B2 (ja) * 2006-01-24 2013-07-31 セイコーエプソン株式会社 発光装置および電子機器
KR20070092455A (ko) 2006-03-10 2007-09-13 삼성전자주식회사 표시 장치 및 그 제조 방법
JP5026019B2 (ja) * 2006-08-08 2012-09-12 三菱電機株式会社 薄膜トランジスタ基板、薄膜トランジスタの製造方法、及び表示装置
US20100224878A1 (en) 2009-03-05 2010-09-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP6122275B2 (ja) * 2011-11-11 2017-04-26 株式会社半導体エネルギー研究所 表示装置
JP6056175B2 (ja) * 2012-04-03 2017-01-11 セイコーエプソン株式会社 電気光学装置及び電子機器
US9905585B2 (en) * 2012-12-25 2018-02-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising capacitor
KR102479472B1 (ko) * 2013-04-15 2022-12-19 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 장치
JP5979272B2 (ja) * 2015-04-07 2016-08-24 セイコーエプソン株式会社 発光装置および電子機器
JP6702492B2 (ja) * 2019-09-02 2020-06-03 セイコーエプソン株式会社 電気光学装置及び電子機器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313729A (ja) * 1991-04-09 1992-11-05 Mitsubishi Electric Corp 液晶表示装置
US5550066A (en) * 1994-12-14 1996-08-27 Eastman Kodak Company Method of fabricating a TFT-EL pixel
JP3383535B2 (ja) * 1995-12-14 2003-03-04 株式会社半導体エネルギー研究所 半導体装置
JPH1027913A (ja) * 1996-07-09 1998-01-27 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JPH11231805A (ja) * 1998-02-10 1999-08-27 Sanyo Electric Co Ltd 表示装置
DE69925216T2 (de) * 1998-03-12 2005-10-06 Seiko Epson Corp. Aktivmatrix-lichtemittierende vorrichtung und herstellungsverfahren
JP3807096B2 (ja) * 1998-05-15 2006-08-09 セイコーエプソン株式会社 アクティブマトリクス基板及びこれを備えた電気光学パネル

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