JP4767157B2 - 垂直構造の窒化ガリウム系led素子の製造方法 - Google Patents
垂直構造の窒化ガリウム系led素子の製造方法 Download PDFInfo
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- JP4767157B2 JP4767157B2 JP2006323308A JP2006323308A JP4767157B2 JP 4767157 B2 JP4767157 B2 JP 4767157B2 JP 2006323308 A JP2006323308 A JP 2006323308A JP 2006323308 A JP2006323308 A JP 2006323308A JP 4767157 B2 JP4767157 B2 JP 4767157B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
- H01L33/32—Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
Description
201 アンドープのGaN層
202 低ドープのn型GaN層
203 n型電極コンタクト用n型GaN層
204 活性層
205 p型GaN層
206 p型電極
207 構造支持層
208 n型透明電極
209 n型反射電極
210 n型電極
300 エッチング停止層
Claims (6)
- サファイア基板上にアンドープのGaN層、低ドープのn型GaN層、エッチング停止層、n型電極コンタクト用n型GaN層、活性層及びp型GaN層を順に形成するステップと、
前記p型GaN層上にp型電極を形成するステップと、
前記p型電極上に構造支持層を形成するステップと、
前記サファイア基板をLLO工程により除去するステップと、
前記サファイア基板が除去された前記アンドープのGaN層及び低ドープのn型GaN層をエッチングするステップと、
前記エッチング停止層を選択的にエッチングし、前記n型電極コンタクト用n型GaN層の少なくとも一部を露出させるステップと、
少なくとも前記n型電極コンタクト用n型GaN層の露出した部分に、n型透明電極及びn型反射電極を順に形成するステップと、
前記n型反射電極上にn型電極を形成するステップと、を含み、
前記エッチング停止層は、前記低ドープのn型GaNをエッチングするステップで前記低ドープのn型GaN層をエッチングする条件でのエッチング速度が、前記低ドープのn型GaN層のエッチング速度より遅い物質から形成される
垂直構造の窒化ガリウム系LED素子の製造方法。 - 前記n型透明電極は、前記n型電極コンタクト用n型GaN層の露出した部分及び前記エッチング停止層の上方を覆って形成され、
前記エッチング停止層上に形成された前記n型透明電極の少なくとも一部は、前記n型反射電極から露出する
請求項1に記載の垂直構造の窒化ガリウム系LED素子の製造方法。 - 前記低ドープのn型GaN層が、10 18 cm −3 以下のドープ濃度を有する請求項1または2に記載の垂直構造の窒化ガリウム系LED素子の製造方法。
- 前記エッチング停止層が、III−VIまたはIII−VII族系の半導体化合物を利用して形成される請求項1から3のいずれか一項に記載の垂直構造の窒化ガリウム系LED素子の製造方法。
- 前記エッチング停止層を選択的にエッチングし、前記n型電極コンタクト用n型GaN層の一部を露出させた後に、
前記エッチング後に残留されたエッチング停止層の表面を凹凸状に形成するステップをさらに含む請求項1から4のいずれか一項に記載の垂直構造の窒化ガリウム系LED素子の製造方法。 - 前記エッチング停止層を選択的にエッチングするステップで、前記エッチング停止層の全体がエッチングされる請求項1に記載の垂直構造の窒化ガリウム系LED素子の製造方法。
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KR1020050117958A KR100730072B1 (ko) | 2005-12-06 | 2005-12-06 | 수직구조 질화갈륨계 발광 다이오드 소자 및 그 제조방법 |
KR10-2005-0117958 | 2005-12-06 |
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JP2007158334A JP2007158334A (ja) | 2007-06-21 |
JP4767157B2 true JP4767157B2 (ja) | 2011-09-07 |
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US8187900B2 (en) | 2007-08-10 | 2012-05-29 | Hong Kong Applied Science and Technology Research Institute Company Limited | Optimization of polishing stop design |
JP5074138B2 (ja) * | 2007-09-27 | 2012-11-14 | 昭和電工株式会社 | 発光ダイオードの製造方法 |
KR100918830B1 (ko) * | 2007-11-19 | 2009-09-25 | 삼성전기주식회사 | 수직구조 질화갈륨계 발광다이오드 소자 및 그 제조방법 |
KR20100099254A (ko) * | 2007-12-10 | 2010-09-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 반도체 발광 소자 및 이의 제조 방법 |
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JP5333479B2 (ja) | 2011-02-15 | 2013-11-06 | 住友電気工業株式会社 | 半導体デバイスの製造方法 |
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KR100730072B1 (ko) | 2007-06-20 |
KR20070059280A (ko) | 2007-06-12 |
US20090181485A1 (en) | 2009-07-16 |
US20070126022A1 (en) | 2007-06-07 |
US7695989B2 (en) | 2010-04-13 |
US7573076B2 (en) | 2009-08-11 |
JP2007158334A (ja) | 2007-06-21 |
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