JP4748978B2 - 圧電／電歪素子及びその製造方法 - Google Patents

圧電／電歪素子及びその製造方法 Download PDF

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Publication number
JP4748978B2
JP4748978B2 JP2004349378A JP2004349378A JP4748978B2 JP 4748978 B2 JP4748978 B2 JP 4748978B2 JP 2004349378 A JP2004349378 A JP 2004349378A JP 2004349378 A JP2004349378 A JP 2004349378A JP 4748978 B2 JP4748978 B2 JP 4748978B2
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Japan
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piezoelectric
electrostrictive
layer
temperature
electrode layer
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JP2004349378A
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English (en)
Japanese (ja)
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JP2006165007A5 (enExample
JP2006165007A (ja
Inventor
貴昭 小泉
浩文 山口
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NGK Insulators Ltd
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NGK Insulators Ltd
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Priority to JP2004349378A priority Critical patent/JP4748978B2/ja
Priority to US11/273,828 priority patent/US7441317B2/en
Publication of JP2006165007A publication Critical patent/JP2006165007A/ja
Publication of JP2006165007A5 publication Critical patent/JP2006165007A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/09—Forming piezoelectric or electrostrictive materials
    • H10N30/093—Forming inorganic materials
    • H10N30/097—Forming inorganic materials by sintering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047—Membrane type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
JP2004349378A 2004-12-02 2004-12-02 圧電／電歪素子及びその製造方法 Expired - Fee Related JP4748978B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004349378A JP4748978B2 (ja) 2004-12-02 2004-12-02 圧電／電歪素子及びその製造方法
US11/273,828 US7441317B2 (en) 2004-12-02 2005-11-15 Piezoelectric/electrostrictive device and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004349378A JP4748978B2 (ja) 2004-12-02 2004-12-02 圧電／電歪素子及びその製造方法

Publications (3)

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JP2006165007A JP2006165007A (ja) 2006-06-22
JP2006165007A5 JP2006165007A5 (enExample) 2007-09-06
JP4748978B2 true JP4748978B2 (ja) 2011-08-17

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Family Applications (1)

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JP2004349378A Expired - Fee Related JP4748978B2 (ja) 2004-12-02 2004-12-02 圧電／電歪素子及びその製造方法

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US (1) US7441317B2 (enExample)
JP (1) JP4748978B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7888842B2 (en) * 2004-02-13 2011-02-15 University Of Maine System Board Of Trustees Ultra-thin film electrodes and protective layer for high temperature device applications
EP1890345B1 (en) * 2006-08-14 2011-04-13 NGK Insulators, Ltd. Method for manufacturing piezoelectric/electrostrictive element
JP4800989B2 (ja) * 2006-11-15 2011-10-26 日本碍子株式会社 圧電／電歪材料、圧電／電歪体、及び圧電／電歪素子
JP5006354B2 (ja) 2009-01-29 2012-08-22 日本碍子株式会社 圧電／電歪共振子
JP5790835B2 (ja) * 2009-02-24 2015-10-07 セイコーエプソン株式会社 圧電素子の製造方法
JP5561463B2 (ja) * 2009-02-24 2014-07-30 セイコーエプソン株式会社 液体噴射ヘッドの製造方法、液体噴射ヘッド及び液体噴射装置
JP5077506B2 (ja) 2010-06-30 2012-11-21 パナソニック株式会社 インクジェットヘッド、インクジェットヘッドを用いて画像を形成する方法、角速度センサ、角速度センサを用いて角速度を測定する方法、圧電発電素子ならびに圧電発電素子を用いた発電方法
JP4962663B2 (ja) * 2010-08-23 2012-06-27 パナソニック株式会社 アクチュエータ、及びアクチュエータを駆動する方法
WO2012026107A1 (ja) 2010-08-27 2012-03-01 パナソニック株式会社 インクジェットヘッド、インクジェットヘッドを用いて画像を形成する方法、角速度センサ、角速度センサを用いて角速度を測定する方法、圧電発電素子ならびに圧電発電素子を用いた発電方法
CN102834943B (zh) * 2011-03-25 2015-09-09 日本碍子株式会社 层叠体及其制造方法
DE102011081279A1 (de) * 2011-08-19 2013-02-21 Siemens Aktiengesellschaft Verfahren zur elektrischen Passivierung elektromechanischer Bauelemente
JP2014155350A (ja) 2013-02-08 2014-08-25 Canon Inc 振動体とその製造方法及び振動型駆動装置
DE102014211465A1 (de) 2013-08-07 2015-02-12 Pi Ceramic Gmbh Keramische Technologien Und Bauelemente Bleifreier piezokeramischer Werkstoff auf Bismut-Natrium-Titanat (BNT)-Basis
US10056539B2 (en) 2014-04-30 2018-08-21 Oregon State University Electrocaloric device
CN105036736B (zh) * 2015-08-19 2017-03-08 湖北大学 一种钛酸铋钠基无铅电致伸缩陶瓷材料及其制备方法
DE102022122840A1 (de) 2022-03-01 2023-09-07 Tdk Electronics Ag Piezoelektrisches Bauteil
EP4487665A1 (de) 2022-03-01 2025-01-08 TDK Electronics AG Piezoelektrisches bauteil

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2557598B1 (fr) * 1983-12-29 1986-11-28 Armines Alliage monocristallin a matrice a base de nickel
JPH07108102B2 (ja) * 1990-05-01 1995-11-15 日本碍子株式会社 圧電／電歪膜型アクチュエータの製造方法
JP3307400B2 (ja) * 1996-09-12 2002-07-24 シチズン時計株式会社 強誘電体素子及びその製法ならびにインクジェットヘッド
US6337805B1 (en) * 1999-08-30 2002-01-08 Micron Technology, Inc. Discrete devices including EAPROM transistor and NVRAM memory cell with edge defined ferroelectric capacitance, methods for operating same, and apparatuses including same
JP3921918B2 (ja) 2000-03-31 2007-05-30 日本碍子株式会社 圧電／電歪素子の製造方法
JP2001298135A (ja) * 2000-04-14 2001-10-26 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法
JP2001354497A (ja) * 2000-06-07 2001-12-25 Matsushita Electric Ind Co Ltd 強誘電体膜の製造方法
WO2002042239A1 (en) * 2000-11-21 2002-05-30 Tdk Corporation Piezoelectric ceramic
EP1262467B1 (en) * 2000-12-25 2007-07-25 TDK Corporation Dielectric porcelain composition and electronic parts
US7019438B2 (en) * 2002-06-21 2006-03-28 Ngk Insulators, Ltd. Piezoelectric/electrostrictive film device
JP2004291584A (ja) * 2003-03-28 2004-10-21 Sharp Corp インクジェットヘッド

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Publication number Publication date
US20060119229A1 (en) 2006-06-08
US7441317B2 (en) 2008-10-28
JP2006165007A (ja) 2006-06-22

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