JP4729328B2 - 欠陥修正装置 - Google Patents

欠陥修正装置 Download PDF

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Publication number
JP4729328B2
JP4729328B2 JP2005108496A JP2005108496A JP4729328B2 JP 4729328 B2 JP4729328 B2 JP 4729328B2 JP 2005108496 A JP2005108496 A JP 2005108496A JP 2005108496 A JP2005108496 A JP 2005108496A JP 4729328 B2 JP4729328 B2 JP 4729328B2
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JP
Japan
Prior art keywords
defect
substrate
unit
image
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005108496A
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English (en)
Japanese (ja)
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JP2006285130A5 (https=
JP2006285130A (ja
Inventor
康雄 森
孝明 大西
周次 秋山
達哉 中村
一仁 堀内
正人 矢部
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Olympus Corp
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Olympus Corp
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Priority to JP2005108496A priority Critical patent/JP4729328B2/ja
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Publication of JP2006285130A5 publication Critical patent/JP2006285130A5/ja
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Publication of JP4729328B2 publication Critical patent/JP4729328B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2005108496A 2005-04-05 2005-04-05 欠陥修正装置 Expired - Fee Related JP4729328B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005108496A JP4729328B2 (ja) 2005-04-05 2005-04-05 欠陥修正装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005108496A JP4729328B2 (ja) 2005-04-05 2005-04-05 欠陥修正装置

Publications (3)

Publication Number Publication Date
JP2006285130A JP2006285130A (ja) 2006-10-19
JP2006285130A5 JP2006285130A5 (https=) 2008-05-22
JP4729328B2 true JP4729328B2 (ja) 2011-07-20

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ID=37407099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005108496A Expired - Fee Related JP4729328B2 (ja) 2005-04-05 2005-04-05 欠陥修正装置

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JP (1) JP4729328B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5711596B2 (ja) * 2010-04-23 2015-05-07 株式会社半導体エネルギー研究所 光電変換装置の作製方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5757246A (en) * 1980-09-25 1982-04-06 Fuji Photo Film Co Ltd Detecting and measuring apparatus for flaw
JP2824101B2 (ja) * 1990-01-12 1998-11-11 シャープ株式会社 表示装置の欠陥修正装置
JPH06109919A (ja) * 1992-09-29 1994-04-22 Ntn Corp Ｌｃｄ用カラーフィルタの欠陥修正法および欠陥修正装置
JP2002071939A (ja) * 1995-06-15 2002-03-12 Ntn Corp カラーフィルタの欠陥修正方法
JP4335422B2 (ja) * 2000-07-31 2009-09-30 Ｎｔｎ株式会社 パターン修正装置
JP2002257749A (ja) * 2001-02-27 2002-09-11 Toray Ind Inc 検査装置、検査方法およびこれを用いたカラーフィルタの製造方法
JP4649051B2 (ja) * 2001-03-21 2011-03-09 オリンパス株式会社 検査画面の表示方法及び基板検査システム
JP3826849B2 (ja) * 2002-06-07 2006-09-27 株式会社Ｓｕｍｃｏ 欠陥検査方法および欠陥検査装置
JP4374176B2 (ja) * 2002-09-25 2009-12-02 大日本印刷株式会社 カラーフィルターの修正方法及びカラーフィルターの修正装置
JP2004177838A (ja) * 2002-11-29 2004-06-24 Dainippon Screen Mfg Co Ltd パターン欠陥修正装置およびパターン欠陥修正方法
JP2004286532A (ja) * 2003-03-20 2004-10-14 Olympus Corp 外観検査方法及びその装置
JP2005017386A (ja) * 2003-06-23 2005-01-20 V Technology Co Ltd 平板状ワークの検査、修正装置
JP2005069721A (ja) * 2003-08-28 2005-03-17 Olympus Corp パターン検査方法及びその装置

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Publication number Publication date
JP2006285130A (ja) 2006-10-19

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