JP4723224B2 - 亜酸化ニオブをベースとする焼結体及び亜酸化ニオブを有する固体電解コンデンサの製造方法 - Google Patents

亜酸化ニオブをベースとする焼結体及び亜酸化ニオブを有する固体電解コンデンサの製造方法 Download PDF

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JP4723224B2
JP4723224B2 JP2004299413A JP2004299413A JP4723224B2 JP 4723224 B2 JP4723224 B2 JP 4723224B2 JP 2004299413 A JP2004299413 A JP 2004299413A JP 2004299413 A JP2004299413 A JP 2004299413A JP 4723224 B2 JP4723224 B2 JP 4723224B2
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niobium
sintered body
niobium suboxide
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シュニッター クリストフ
ヴェッティング ゲアハルト
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Description

本発明は、亜酸化ニオブをベースとする焼結体、特にその化学物質耐性のために化学装置において、かつ有利には固体電解コンデンサのためのアノードの製造のために使用される焼結成形体、亜酸化ニオブから製造される焼結アノードに関する。
この種のアノードは焼結された亜酸化ニオブ微細粒子によって製造され、極めて大きい表面積を有するスポンジ状構造を形成する。前記表面上に五酸化ニオブ誘電性層が電解酸化によって製造され、そして二酸化マンガン又はポリマー電解質からなってよいコンデンサカソードが五酸化物層上に製造される。この種のアノード又はコンデンサを製造するのに使用される方法並びにコンデンサ前駆粉末の製造は真空中又は反応性ガス及び/又は保護ガス中での機械的処理及び熱処理の範囲の工程を含むが、それらはコンデンサ特性に悪影響を及ぼす元素による汚染の危険性を伴う。従ってWO02/086923号A2によれば、アノードの製造に関連する機械的処理又は熱処理のために使用される全ての装置はニオブ金属からなるか、又は少なくともニオブ金属で被覆されていることが提案されている。
WO02/086923号A2
このような状況における1つの欠点は、ニオブ金属が高温で酸素を取り込む傾向にある酸素ゲッター材料であるということである。従って亜酸化ニオブアノードの製造に関連する1600℃までの温度を伴うことがある高温処理工程の間に、特にこの高温で亜酸化ニオブとニオブ金属との間に直接的な接触が存在する場合に、酸素が亜酸化ニオブから制御されずに引き抜かれるという高い危険性が存在する。更に該ニオブ金属は、繰り返しの使用で酸素の取り込みの結果としてますます脆弱になり、従って使用期間が短縮される。
本発明によれば、この種のアノードの製造で使用されるデバイスは亜酸化ニオブ、場合により酸化マグネシウムをベースとする焼結体として形成されることが提案される。
この種のデバイスの例は、容器、反応器、反応器ライニング、ミルライニング、ミルビーズ、ミルローラ、圧縮成形型、プレスラムなどを含む。
従って本発明の対象は、30〜100モル%のNbO[式中、0.5<x<1.5である]を含有する亜酸化ニオブ及び70モル%以下の酸化マグネシウムをベースとする焼結体である。
その焼結体は、有利には式NbO[式中、0.7<x<1.3である]の亜酸化ニオブを含有する。
亜酸化ニオブと酸化マグネシウムとのモル%の和が不可避の外的要素の不純物を除いて100%であることが特に有利である。特に該焼結体は実質的に鉄、クロム、ニッケル、アルカリ金属及びハロゲン不含であるべきである。鉄、ニッケル、クロム、ナトリウム、カリウム、塩素及びフッ素の不純物は、特に有利にはそれぞれ10ppm未満まで、特に有利には5ppm未満までであり、有利には全体で30ppm未満であるべきである。他方で数モル%以下、例えば5モル%以下の量のバナジウム、タンタル、モリブデン及びタングステンの不純物又は合金元素は無害である。
本発明による焼結体は有利には35〜100モル%のNbO及び65〜0モル%のMgOからなってよい。本発明による焼結体は、有利には30〜60モル%のNbO及び70〜40モル%のMgO、特に有利には45〜60モル%のNbO及び55〜40モル%のMgOからなる。
本発明による有利な焼結体は、30容量%未満の気孔率、特に有利には20容量%未満の気孔率を有する。
本発明による酸化マグネシウムを含有する焼結体は、有利には少なくとも1方向で多くて1.5μm、有利には多くて1.0μmに亘る実質的に均質な亜酸化ニオブが豊富な領域及び酸化マグネシウムが豊富な領域を含む微細構造を有する。亜酸化ニオブが豊富な領域に関しては、少なくとも95%、特に有利には少なくとも99%の亜酸化ニオブを含有することが有利である。有利には酸化マグネシウムが豊富な領域は99%以下の酸化マグネシウムを含有する。
本発明による焼結体は、標準的なセラミックプロセスを用いて製造できる。例えば成形は軸方向加圧成形及び/又は等方向加圧成形、押出、慣用の無圧又は加圧のスリップキャスティング又は射出成形によって実施できる。使用される方法に依存して、適当な有機助剤、例えばPVA、PEG等(加圧成形のために)、この目的(射出成形などのために)のために慣用に利用できるワックス又は可塑剤が焼結技術から自体公知の方法で粉末に添加され、これらは成形後に空気中、保護ガス又は減圧下の熱処理により如何なる残留物も残さずに無機の基礎粉末の基本特性を変えずに排除(バインダー除去)できる。空気中で、250℃、有利には150℃の温度は、亜酸化ニオブの酸化を避けるために超過すべきでない。
加圧成形の場合に、有機助剤の添加を、有利には粉末の流動特性を改善するために粒状化過程と組み合わせてよい。
スリップキャスティングの場合に、有利には空気中での予備乾燥は脱型の後及びバインダー除去の前に実施されるべきである。更に削りくず形成法、例えば旋削、フライス、掘削等を用いる(慎重な)機械的処理は成形過程の後及びバインダー除去の前に実施して、焼結体の所望の形状にできるだけ近いものを製造することができる。この種の処理はバインダー除去の後及び成形体の強化のための任意の予備焼結工程後に実施してよく、その場合には機械加工法、例えば乾式研削又は湿式研削を使用してもよい。
焼結自体は保護ガス雰囲気、例えばアルゴン又はアルゴンと一緒に典型的に3〜10容量%の水素などをベースとするガス混合物下に気密炉中で、亜酸化ニオブの酸化状態の変化を防止するために実施される。焼結の開始前に、その炉を保護ガスでパージするか、又は排気して保護ガスで充満させる。焼結されるべき成形体と炉ライニングとの間の直接的な接触を避けるために、該成形体を、焼結温度で熱的及び化学的に安定であり、かつ亜酸化物といかなる反応もしない材料から製造される支持体/スペーサ(“焼成補助”)上に載置する。密な又は多孔質の炭化ケイ素から製造される焼結補助は特に適当であると知られている。焼結は有利には1700℃未満、特に有利には1550〜1650℃の温度で、10K/分の緩慢な加熱速度で焼結温度にまで、有利には1〜3K/分の加熱速度で1100℃から焼結温度までの上限温度に、有利には10時間未満の焼結温度での保持時間で、成形体の所望の高密度化及び使用される亜酸化ニオブ及び、場合により酸化マグネシウム粉末の粒度に依存して実施される。
本発明による焼結体の製造のために使用される出発材料は、有利には市販の5〜20m/gの比表面積を有する高純度の五酸化ニオブである。五酸化ニオブは、それ自体で又は流動水素中で還元して二酸化ニオブを形成させた後のいずれかにおいて、950〜1150℃の温度でマグネシウム蒸気により亜酸化物に還元できる。これは、酸化マグネシウム封入体を含有する凝集粉末を形成する。
この粉末はそれ自体で粉砕後に使用して、本発明による焼結体を製造できる。開始点が二酸化ニオブである場合に、約50モル%のMgOを含有する焼結体が得られる。他方で、開始点が五酸化ニオブである場合には、約67モル%の酸化マグネシウムを含有する焼結体が得られる。
全く酸化マグネシウムを含有しない焼結体の製造のための開始点は有利には同様に高い比表面積を有する五酸化ニオブ微細粒子である。この五酸化ニオブは流動水素中で1100℃〜1400℃の温度で還元させて、二酸化ニオブを形成する。二酸化ニオブのいくらかは更にマグネシウム蒸気中で還元されて、ニオブ金属を形成する。次いで、形成される酸化マグネシウムはニオブ金属から、硫酸のような酸によって洗浄される。次いで該ニオブ金属を化学量論量の二酸化ニオブと一緒に水素含有雰囲気中で1100〜1600℃に加熱し、亜酸化ニオブNbOに変換させる。本発明による焼結粉末の他の組成は、相応して各反応成分又は混合物の定量比を変更することによって得られる。
比較的高い密度の焼結体を得るために、凝集微粒子粉末、特に有利には38μm、有利には20μm未満の篩別されたフラクションを使用することが有利である。
更に本発明で使用して焼結体を製造できる粉末は高温又はプラズマ溶射により被覆を製造するために著しく適しており、その場合においては、焼結構造に類似した表面層を金属、例えばニオブ、タンタル、モリブデン及び/又はタングステン上に製造することができる。この場合において、適宜、付加的にニオブ金属粉末を20質量%以下、有利には10〜18質量%の下位量でバインダーとして使用することも可能である。本発明によるニオブ、タンタル、モリブデン又はタングステンから製造されるこの種の被覆されたデバイスはまた亜酸化ニオブをベースとする固体電解コンデンサの製造のためにも適当である。焼結構造に類似した被覆が施されたこの種の金属デバイスはまた本発明によれば、“焼結体”という用語によって包含されることが意図されている。
製造例
固体電解コンデンサアノードのための焼結板の製造を以下に本発明による焼結体に関して例によって説明する。
粒度38μm未満及びASTM B822(Malvern Mastersizer)によるD10値2.8μmに相当し、D50値11.4μmに相当し、かつD90値25.2μmに相当する粒度分布を有する組成NbOの亜酸化ニオブ粉末を使用する。粉末の流動特性を篩別粒状化(screening granulation)及びタンブリング処理によって、更なる添加剤なく圧縮成形型の均質な充填を可能にするのに十分に改善することができる。辺の長さ125mmを有する方形開口部を有する硬質金属の圧縮成形型を使用する。粒状化された粉末を成形型中に導入し、そして2kN/cmで加圧する。およそ125×125×15mmの大きさを有する圧縮体を、脱型後にプラスチックフィルムに結合させ、そして更に200Mpaで等方向加圧する。それによりおよそ122×122×13mmの圧縮体が得られる。この圧縮体を慣用のフライス盤上で、高さ13mm及び底部と縁部の両者について壁厚5mmを有する全周縁部を有する皿状部が残るように機械加工する。
機械加工された成形部を更なる前処理なくSiC容器の内部で、黒鉛抵抗加熱により加熱された気密炉中に載置し、そして焼結させる。焼結の開始時に、該炉を排気し、そして97容量%のアルゴン及び3容量%の水素を含有するガス混合物で充満させる。加熱プログラムは10K/分の加熱速度で500℃まで、5K/分の加熱速度で1100℃まで、次いで2.5K/分の加熱速度で1600℃まで、1600℃で3時間の保持時間、5K/分の制御された冷却速度で800℃まで下げ、引き続き制御されない冷却によって150℃未満までに従う。次いで炉から取り出された成形部は6.9g/cmの密度を有し、かつ14Gpaのビッカース硬さHV10を有する。場合により予定された形態及び表面構造を達成するために内部及び/又は外部に再び機械加工してよい。

Claims (3)

  1. 30〜100モル%のNbOX[式中、0.5<x<1.5である]及び70〜0モル%のMgOを含有し、気孔率が30容量%未満であることを特徴とする焼結体。
  2. 35〜100モル%のNbOX[式中、0.5<x<1.5である]及び65〜0モル%のMgOからなる、請求項1記載の焼結体。
  3. 亜酸化ニオブアノードを有する固体電極コンデンサの製造方法において、請求項1又は2記載の焼結体から製造されるデバイスを少なくとも部分的にコンデンサ前駆体の機械的処理及び熱処理のために使用することを特徴とする、亜酸化ニオブアノードを有する固体電極コンデンサの製造方法。
JP2004299413A 2003-10-14 2004-10-13 亜酸化ニオブをベースとする焼結体及び亜酸化ニオブを有する固体電解コンデンサの製造方法 Expired - Fee Related JP4723224B2 (ja)

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MXPA04009964A (es) 2005-04-19
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JP2005119960A (ja) 2005-05-12
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