JP4706850B2 - ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 - Google Patents
ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 Download PDFInfo
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- JP4706850B2 JP4706850B2 JP2006081129A JP2006081129A JP4706850B2 JP 4706850 B2 JP4706850 B2 JP 4706850B2 JP 2006081129 A JP2006081129 A JP 2006081129A JP 2006081129 A JP2006081129 A JP 2006081129A JP 4706850 B2 JP4706850 B2 JP 4706850B2
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14241—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14459—Matrix arrangement of the pressure chambers
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
まず、本発明の特徴であるノズルプレートの製造方法を説明する。
次に、前記の製造方法により製造されたノズルプレート61を利用した印字ヘッド50の構造について説明する。インク色ごとに設けられている各印字ヘッド12K、12M、12C、12Yの構造は共通しているので、以下、これらを代表して符号50によって印字ヘッドを示すものとする。
次に、前記の印字ヘッド50を利用した画像形成装置として、インクジェット記録装置の構造について説明する。
られるが、印字領域をローラー・ニップ搬送すると、印字直後に用紙の印字面にローラーが接触するので、画像が滲み易いという問題がある。従って、本例のように、印字領域では画像面と接触させない吸着ベルト搬送が好ましい。
がライン状に配列されたRセンサ列と、緑(G)の色フィルタが設けられたGセンサ列と、青(B)の色フィルタが設けられたBセンサ列とからなる色分解ラインCCDセンサで構成されている。なお、ラインセンサに代えて、受光素子が二次元配列されて成るエリアセンサを用いることも可能である。
Claims (7)
- シリコン基板の一方の面に前記シリコン基板のエッチングの進行を阻止するエッチストッパ層を形成するエッチストッパ層形成工程と、
前記シリコン基板の他方の面にマスク層を形成するマスク層形成工程と、
前記マスク層の開口部をパターニングするマスクパターニング工程と、
前記マスク層側からドライエッチングを行うことにより、前記シリコン基板にノズルのテーパ部を形成するテーパ部形成工程と、
前記マスク層側からドライエッチングを行うことにより、前記エッチストッパ層にノズルの直線部を形成する直線部形成工程と、
前記マスク層を剥離するマスク層剥離工程と、を有すること、
を特徴とするノズルプレートの製造方法。 - 請求項1に記載のノズルプレートの製造方法において、
前記テーパ部形成工程は少なくとも、
前記シリコン基板のドライエッチングを行う第1エッチング工程と、
前記第1エッチング工程にてドライエッチングされた面にデポジションを行い保護膜を形成する第1保護膜形成工程と、
前記第1エッチング工程の時よりもエッチング幅が小さくなるようにして前記シリコン基板のドライエッチングを行う第2エッチング工程と、
前記第2エッチング工程にてドライエッチングされた面にデポジションを行い保護膜を形成する第2保護膜形成工程と、を有すること、
を特徴とするノズルプレートの製造方法。 - 請求項2に記載のノズルプレートの製造方法において、
前記テーパ部形成工程のドライエッチングは、エッチング用ガスと保護膜形成用ガスとの混合ガスを用いて行うこと、
を特徴とするノズルプレートの製造方法。 - 請求項1乃至3に記載のいずれか1項のノズルプレートの製造方法において、
前記マスク層に重ねて感光性樹脂層を形成し、前記感光性樹脂層をパターニングする感光性樹脂層形成工程を有し、
前記マスクパターニング工程では、前記感光性樹脂層形成工程にてパターニングされた前記感光性樹脂層をマスクとしてエッチングを行うことにより前記マスク層をパターニングすること、
を特徴とするノズルプレートの製造方法。 - 請求項1乃至4に記載のいずれか1項のノズルプレートの製造方法において、
前記エッチストッパ層に重ねて撥液膜を形成する撥液膜形成工程を有し、
前記直線部形成工程では、前記マスク層側からドライエッチングを行うことにより、前記撥液膜にノズルの直線部を形成すること、
を特徴とするノズルプレートの製造方法。 - 請求項1乃至請求項5のいずれか1項に記載のノズルプレートの製造方法によって製造されたノズルプレートを備えることを特徴とする液滴吐出ヘッド。
- 請求項6に記載の液滴吐出ヘッドを備えたことを特徴とする画像形成装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006081129A JP4706850B2 (ja) | 2006-03-23 | 2006-03-23 | ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 |
US11/723,913 US8043518B2 (en) | 2006-03-23 | 2007-03-22 | Method of manufacturing nozzle plate, liquid ejection head and image forming apparatus |
US13/238,802 US8500248B2 (en) | 2006-03-23 | 2011-09-21 | Method of manufacturing nozzle plate, liquid ejection head and image forming apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006081129A JP4706850B2 (ja) | 2006-03-23 | 2006-03-23 | ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 |
Publications (2)
Publication Number | Publication Date |
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JP2007253479A JP2007253479A (ja) | 2007-10-04 |
JP4706850B2 true JP4706850B2 (ja) | 2011-06-22 |
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JP2006081129A Active JP4706850B2 (ja) | 2006-03-23 | 2006-03-23 | ノズルプレートの製造方法、液滴吐出ヘッド及び画像形成装置 |
Country Status (2)
Country | Link |
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US (2) | US8043518B2 (ja) |
JP (1) | JP4706850B2 (ja) |
Families Citing this family (23)
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US7347532B2 (en) * | 2004-08-05 | 2008-03-25 | Fujifilm Dimatix, Inc. | Print head nozzle formation |
JP5012484B2 (ja) * | 2007-12-19 | 2012-08-29 | コニカミノルタホールディングス株式会社 | 液体吐出ヘッド用ノズルプレートの製造方法、液体吐出ヘッド用ノズルプレート及び液体吐出ヘッド |
US20090181329A1 (en) * | 2008-01-08 | 2009-07-16 | Seiko Epson Corporation | Method for manufacturing a liquid jet head, a liquid jet head, and a liquid jet apparatus |
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US20100141709A1 (en) * | 2008-10-31 | 2010-06-10 | Gregory Debrabander | Shaping a Nozzle Outlet |
US8197029B2 (en) * | 2008-12-30 | 2012-06-12 | Fujifilm Corporation | Forming nozzles |
JP5728795B2 (ja) | 2009-04-01 | 2015-06-03 | セイコーエプソン株式会社 | ノズルプレートの製造方法、及び、液滴吐出ヘッドの製造方法 |
US8567910B2 (en) * | 2010-03-31 | 2013-10-29 | Fujifilm Corporation | Durable non-wetting coating on fluid ejector |
JP6031735B2 (ja) | 2011-06-13 | 2016-11-24 | ソニー株式会社 | 情報処理装置、情報処理方法およびコンピュータプログラム |
JP5862116B2 (ja) * | 2011-08-26 | 2016-02-16 | 大日本印刷株式会社 | 液体吐出装置の流路板の製造方法 |
US9496425B2 (en) * | 2012-04-10 | 2016-11-15 | Kla-Tencor Corporation | Back-illuminated sensor with boron layer |
US8551692B1 (en) * | 2012-04-30 | 2013-10-08 | Fujilfilm Corporation | Forming a funnel-shaped nozzle |
US9601299B2 (en) | 2012-08-03 | 2017-03-21 | Kla-Tencor Corporation | Photocathode including silicon substrate with boron layer |
US9748294B2 (en) | 2014-01-10 | 2017-08-29 | Hamamatsu Photonics K.K. | Anti-reflection layer for back-illuminated sensor |
US9484376B2 (en) * | 2014-05-30 | 2016-11-01 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor isolation structure and manufacturing method thereof |
US10308541B2 (en) | 2014-11-13 | 2019-06-04 | Gerresheimer Glas Gmbh | Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter |
JP6780466B2 (ja) * | 2016-11-22 | 2020-11-04 | コニカミノルタ株式会社 | ノズルプレートの製造方法およびインクジェットヘッドの製造方法 |
JP7035553B2 (ja) * | 2018-01-19 | 2022-03-15 | 株式会社リコー | ノズル板の製造方法、吐出ヘッドの製造方法、吐出ユニットの製造方法、吐出する装置の製造方法 |
US11114489B2 (en) | 2018-06-18 | 2021-09-07 | Kla-Tencor Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
US11114491B2 (en) | 2018-12-12 | 2021-09-07 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
CN113286709B (zh) * | 2019-01-11 | 2023-02-17 | 柯尼卡美能达株式会社 | 喷墨头、喷墨头的制造方法以及喷墨记录方法 |
CN110106504B (zh) * | 2019-04-04 | 2021-03-23 | Tcl华星光电技术有限公司 | 一种蚀刻设备 |
US11848350B2 (en) | 2020-04-08 | 2023-12-19 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer |
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JP2005074799A (ja) * | 2003-08-29 | 2005-03-24 | Sharp Corp | ノズルプレートの製造方法 |
JP2005074635A (ja) * | 2003-08-29 | 2005-03-24 | Sharp Corp | ノズルプレートおよびその製造方法 |
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JP2007253479A (ja) | 2007-10-04 |
US20120007920A1 (en) | 2012-01-12 |
US8043518B2 (en) | 2011-10-25 |
US8500248B2 (en) | 2013-08-06 |
US20070221617A1 (en) | 2007-09-27 |
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