JP4677267B2 - 平面ステージ装置及び露光装置 - Google Patents

平面ステージ装置及び露光装置 Download PDF

Info

Publication number
JP4677267B2
JP4677267B2 JP2005107748A JP2005107748A JP4677267B2 JP 4677267 B2 JP4677267 B2 JP 4677267B2 JP 2005107748 A JP2005107748 A JP 2005107748A JP 2005107748 A JP2005107748 A JP 2005107748A JP 4677267 B2 JP4677267 B2 JP 4677267B2
Authority
JP
Japan
Prior art keywords
mover
auxiliary
stage
planar
flat stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005107748A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006287122A5 (https=
JP2006287122A (ja
Inventor
光夫 西村
伸茂 是永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005107748A priority Critical patent/JP4677267B2/ja
Publication of JP2006287122A publication Critical patent/JP2006287122A/ja
Publication of JP2006287122A5 publication Critical patent/JP2006287122A5/ja
Application granted granted Critical
Publication of JP4677267B2 publication Critical patent/JP4677267B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005107748A 2005-04-04 2005-04-04 平面ステージ装置及び露光装置 Expired - Fee Related JP4677267B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2006287122A JP2006287122A (ja) 2006-10-19
JP2006287122A5 JP2006287122A5 (https=) 2008-05-22
JP4677267B2 true JP4677267B2 (ja) 2011-04-27

Family

ID=37408657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005107748A Expired - Fee Related JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Country Status (1)

Country Link
JP (1) JP4677267B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7538273B2 (en) * 2006-08-08 2009-05-26 Asml Netherlands B.V. Cable connection to decrease the passing on of vibrations from a first object to a second object
KR20150036734A (ko) * 2006-12-27 2015-04-07 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 디바이스의 제조 방법
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
CN101681809B (zh) * 2007-12-28 2012-04-25 株式会社尼康 曝光装置、曝光方法以及器件制造方法
JP2010080641A (ja) 2008-09-25 2010-04-08 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
EP2469339B1 (en) * 2010-12-21 2017-08-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
CN119620563A (zh) * 2017-07-14 2025-03-14 Asml荷兰有限公司 量测设备和衬底平台输送装置系统

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0697051B2 (ja) * 1986-12-02 1994-11-30 キヤノン株式会社 流体軸受用の流体流通機構
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH10223527A (ja) * 1996-12-06 1998-08-21 Nikon Corp 露光装置
DE69829614T2 (de) * 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
JPH1138377A (ja) * 1997-07-23 1999-02-12 Canon Inc ステージ装置およびデバイス製造方法
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6437463B1 (en) * 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
JP2002198284A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置および露光装置
JP2002280283A (ja) * 2001-03-16 2002-09-27 Canon Inc 基板処理装置
KR100547943B1 (ko) * 2001-11-30 2006-02-01 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6815699B2 (en) * 2001-12-11 2004-11-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2003249443A (ja) * 2001-12-21 2003-09-05 Nikon Corp ステージ装置、ステージ位置管理方法、露光方法及び露光装置、並びにデバイス製造方法
DE60302388T2 (de) * 2002-06-13 2006-07-27 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
TWI246114B (en) * 2002-09-24 2005-12-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP2005032917A (ja) * 2003-07-10 2005-02-03 Dainippon Printing Co Ltd 有機薄膜太陽電池の製造方法および転写シート
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
JP2005294468A (ja) * 2004-03-31 2005-10-20 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2006134921A (ja) * 2004-11-02 2006-05-25 Sendai Nikon:Kk 保持装置、ステージ装置、露光装置、及びデバイスの製造方法

Also Published As

Publication number Publication date
JP2006287122A (ja) 2006-10-19

Similar Documents

Publication Publication Date Title
US10725389B2 (en) Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
US6635887B2 (en) Positioning system for use in lithographic apparatus
KR100625625B1 (ko) 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
KR100223624B1 (ko) 위치결정장치와 디바이스 제조장치 및 방법
US5991005A (en) Stage apparatus and exposure apparatus having the same
KR101162108B1 (ko) 반력 처리 기구
US9977345B2 (en) Movable body apparatus, exposure apparatus and device manufacturing method
KR102163139B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
JP4970410B2 (ja) ステージ装置及び半導体検査装置
JP4677267B2 (ja) 平面ステージ装置及び露光装置
JP2006086442A (ja) ステージ装置及び露光装置
JPWO2016159176A1 (ja) 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法
JP2011081367A (ja) 用力伝達部材ガイド装置、及び基板処理装置
JP6681993B2 (ja) 移動プラットフォーム装置、露光装置およびフォトリソグラフィ装置
JP2002022867A (ja) Ｘ−ｙステージ装置
JP2013217950A (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR101210452B1 (ko) 스테이지
JP2011003782A (ja) ステージ装置
KR102151930B1 (ko) 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
KR102202760B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법 및 디바이스 제조 방법
JP6172913B2 (ja) ステージ装置、露光装置および物品の製造方法
KR102181614B1 (ko) 노광 장치, 이동체 장치, 플랫 패널 디스플레이 제조 방법 및 디바이스 제조 방법
JP2012234108A (ja) 用力伝達部材案内装置、移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び用力伝達部材の案内方法
JP5958692B2 (ja) 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法並びに露光方法
KR100541461B1 (ko) 스테이지장치

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080404

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080404

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101025

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101029

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101227

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110121

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110131

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140204

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees