JP2006287122A5 - - Google Patents

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Publication number
JP2006287122A5
JP2006287122A5 JP2005107748A JP2005107748A JP2006287122A5 JP 2006287122 A5 JP2006287122 A5 JP 2006287122A5 JP 2005107748 A JP2005107748 A JP 2005107748A JP 2005107748 A JP2005107748 A JP 2005107748A JP 2006287122 A5 JP2006287122 A5 JP 2006287122A5
Authority
JP
Japan
Prior art keywords
mover
flat stage
flat
auxiliary
stage device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005107748A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006287122A (ja
JP4677267B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005107748A priority Critical patent/JP4677267B2/ja
Priority claimed from JP2005107748A external-priority patent/JP4677267B2/ja
Publication of JP2006287122A publication Critical patent/JP2006287122A/ja
Publication of JP2006287122A5 publication Critical patent/JP2006287122A5/ja
Application granted granted Critical
Publication of JP4677267B2 publication Critical patent/JP4677267B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005107748A 2005-04-04 2005-04-04 平面ステージ装置及び露光装置 Expired - Fee Related JP4677267B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107748A JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2006287122A JP2006287122A (ja) 2006-10-19
JP2006287122A5 true JP2006287122A5 (https=) 2008-05-22
JP4677267B2 JP4677267B2 (ja) 2011-04-27

Family

ID=37408657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005107748A Expired - Fee Related JP4677267B2 (ja) 2005-04-04 2005-04-04 平面ステージ装置及び露光装置

Country Status (1)

Country Link
JP (1) JP4677267B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7538273B2 (en) 2006-08-08 2009-05-26 Asml Netherlands B.V. Cable connection to decrease the passing on of vibrations from a first object to a second object
EP2998983B1 (en) * 2006-12-27 2018-03-21 Nikon Corporation Stage apparatus, exposure apparatus and device fabricating method
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
KR101477833B1 (ko) * 2007-12-28 2014-12-30 가부시키가이샤 니콘 노광 장치, 이동체 구동 시스템, 패턴 형성 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP2010080641A (ja) 2008-09-25 2010-04-08 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
EP2469339B1 (en) 2010-12-21 2017-08-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI818915B (zh) * 2017-07-14 2023-10-21 荷蘭商Ａｓｍｌ荷蘭公司 度量衡裝置及基板載物台處置器系統

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0697051B2 (ja) * 1986-12-02 1994-11-30 キヤノン株式会社 流体軸受用の流体流通機構
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH10223527A (ja) * 1996-12-06 1998-08-21 Nikon Corp 露光装置
EP0900412B1 (en) * 1997-03-10 2005-04-06 ASML Netherlands B.V. Lithographic apparatus comprising a positioning device having two object holders
JPH1138377A (ja) * 1997-07-23 1999-02-12 Canon Inc ステージ装置およびデバイス製造方法
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6437463B1 (en) * 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
JP2002198284A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置および露光装置
JP2002280283A (ja) * 2001-03-16 2002-09-27 Canon Inc 基板処理装置
US6879377B2 (en) * 2001-11-30 2005-04-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6815699B2 (en) * 2001-12-11 2004-11-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2003249443A (ja) * 2001-12-21 2003-09-05 Nikon Corp ステージ装置、ステージ位置管理方法、露光方法及び露光装置、並びにデバイス製造方法
TWI251125B (en) * 2002-06-13 2006-03-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
TWI246114B (en) * 2002-09-24 2005-12-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP2005032917A (ja) * 2003-07-10 2005-02-03 Dainippon Printing Co Ltd 有機薄膜太陽電池の製造方法および転写シート
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
JP2005294468A (ja) * 2004-03-31 2005-10-20 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
JP2006134921A (ja) * 2004-11-02 2006-05-25 Sendai Nikon:Kk 保持装置、ステージ装置、露光装置、及びデバイスの製造方法

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