NL2014453B1 - Positioning system having part of a measuring means move along an auxiliary guide. - Google Patents

Positioning system having part of a measuring means move along an auxiliary guide. Download PDF

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Publication number
NL2014453B1
NL2014453B1 NL2014453A NL2014453A NL2014453B1 NL 2014453 B1 NL2014453 B1 NL 2014453B1 NL 2014453 A NL2014453 A NL 2014453A NL 2014453 A NL2014453 A NL 2014453A NL 2014453 B1 NL2014453 B1 NL 2014453B1
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NL
Netherlands
Prior art keywords
platform
carriage
main
reference element
along
Prior art date
Application number
NL2014453A
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Dutch (nl)
Inventor
Henselmans Rens
Van Den Braber Rens
Johannes Adrianus Te Voert Martijn
Original Assignee
Nts Systems Dev B V
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Application filed by Nts Systems Dev B V filed Critical Nts Systems Dev B V
Priority to PCT/EP2015/075436 priority Critical patent/WO2016074964A1/en
Application granted granted Critical
Publication of NL2014453B1 publication Critical patent/NL2014453B1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

A positioning system, in particular for producing, testing and inspecting wafers, comprises a first linear main guide extending in an x-direction, a first carriage that is movably guided by means of a first main bearing along the first linear main guide, a platform that is connected such to the first carriage that the platform gets moved along with the first carriage in the x- direction, a first actuator for displacing the first carriage together with the platform along the first linear main guide in the x-direction, and a first reference element and a first sensor which together are designed for determining a position of the platform in the y-direction, which y-direction is perpendicular to the x-direction, in which one of the first reference element and first sensor is connected to the platform for moving along with the platform when it is displaced in the y-direction, and in which the other one of the first reference element and first sensor is connected to the first carriage for moving along with the first carriage when it is displaced together with the platform along the first main guide in the x­ direction. A first linear auxiliary guide is provided which extends in the x-direction, wherein the one of the first reference element and first sensor that is connected to the first carriage for moving along therewith, is movably guided by means of a first auxiliary bearing along the first linear auxiliary guide.

Description

Title: Positioning system having part of a measuring means move along an auxiliary guide.
The invention relates to a positioning system, in particular for producing, testing and inspecting wafers.
Such positioning systems are known in various embodiments. For example in the field of wafer production, testing and inspection it is required to move and position the wafers with an accuracy of nanometres. In order to safe costs this moving and positioning not only needs to be done at this aimed accuracy of nanometres, but also needs to be done as quickly as possible at high speed.
Known metrology tools for the testing of wafers for example may comprise a rectangular positioning of two perpendicular sets of interspaced linear guides on top of a granite plate. The first set extends in the x-direction, the second set extends in the y-direction. Along these guides, two elongate carriages are movably guided by means of roller bearings. The first carriage extends in the y-direction, the second carriage extends there below in the x-direction, such that the two carriages intercross each other. Each carriage can be displaced along its respective set of guides in its own distinctive x- or y-direction by means of an actuator. The carriages only have to bear their own weight and not each other’s. A platform is movably connected to the carriages right above where they intercross each other. The platform carries a chuck that may be used to hold a wafer. The platform can be supported by means of suitable bearings on top of the granite plate or by the carriages. By moving the respective carriages in the x- and/or y-directions, the platform can get displaced over the granite plate inside the rectangular space that is delimited by the guides towards certain aimed target x- and y-positions. For being able to accurately steer and control those displacements, it is known to provide linear encoder rulers parallel beside the linear guides. Encoder heads, that are mounted on the carriages then are able to measure the x- and y-positions of the carriages relative to the linear encoder rulers. Thus the position of the platform can be derived from those measured x- and y-positions.
This known metrology tool however may has the disadvantage that its measuring accuracy leaves to be desired, in particular if the straightness of the linear guides leaves to be desired and/or if relative inaccurate bearings, like roller bearings are used between the carriages and their guides. Also small irregularities, unevenness’s, roughness’s, or the like in the guides and/or bearings, may well lead to the carriages getting slightly translated in the direction perpendicular to their guides . This may lead to a measuring fault occurring in the x-y-position measurement, which in turn leads to an inaccurate positioning of the platform.
It is possible to use other straighter types of guides and more accurate types of bearings in order to try to minimize this type of measuring and positioning faults. This however would make the system considerably more expensive, and still would leave the accuracy to be desired.
Alternative configurations exist in which the encoder rulers move along with the platform in the measurement direction of the encoder head when the platform gets displaced. This known layout however may have the disadvantage that it delimits the allowed displacements of the platform to a space smaller than the dimensions of the platform itself.
It is also possible to use other types of measuring means, like interferometers and/or grid plates. Those however also would make the system considerably more expensive, and still would leave the accuracy to be desired.
The present invention aims to overcome those disadvantages at least partly and/or to provide a usable alternative solution. In particular the invention aims to provide a positioning system that is relative economic to manufacture while being able to offer a good or even improved positioning accuracy and speed while maintaining a virtually unlimited range.
This aim is achieved by a positioning system according to claim 1. The positioning system comprises a first linear main guide which extends in an x-direction of a perpendicular x-y-z coordinate system, a first carriage that is movably guided by means of a first main bearing along the first linear main guide, and a platform. The platform for example may comprise a sub-platform part like a chuck part, that is carried by a main platform part of the platform, and which chuck part then can be designed for accurately holding an object like a wafer. The platform is connected such to the first carriage that the platform gets moved along with the carriage in the x-direction. A first actuator is provided for displacing the first carriage together with the platform along the first linear main guide in the x-direction when actuated. Position measuring means are provided that have a first reference element and a first sensor which together are designed for determining a position of the platform, and in particular of said optional chuck part thereof, in the y-direction. For this, either the first reference element either the first sensor is connected to the platform, and in particular to said optional chuck part thereof, for moving along with it when it is displaced in the y-direction. The other one of the first reference element and sensor, that is to say the one that is not connected to the platform, is connected to the first carriage for moving along with it when it is displaced together with the platform along the first main guide in the x-direction. According to the inventive thought, a first linear auxiliary guide is provided which extends in the x-direction. The one of the first reference element and first sensor that is connected to the first carriage for moving along therewith, then can get movably guided by means of a first auxiliary bearing along this first linear auxiliary guide.
This offers the advantage that the y-position of the one of the first reference element and first sensor that is connected to the first carriage no longer needs to be dependent on the straightness of the main linear guide and/or on the accuracy of the main bearing. Instead it gets determined by the linear auxiliary guide. This makes it possible to improve the accuracy of the position measurement and/or use more cost saving, more lightweight, and/or less strong types of linear guides, carriages, bearings and/or measuring means, without this immediately negatively influencing the accuracy and speed of the system.
In a preferred embodiment the one of the first reference element and first sensor that is connected to the first carriage for moving along therewith may be connected to this first carriage by means of a first main connection organ that is rigid in the direction of motion, here the x-direction, and that preferably is able to offer flexibility in the direction of measurement, here the y-direction. Furthermore this one of the first reference element and first sensor, may be connected to its auxiliary bearing by means of a first auxiliary connecting organ that is rigid in the direction of measurement. In this way the first auxiliary connection organ is able to transmit forces in the y-direction between the linear auxiliary guide, the auxiliary bearing and the one of the reference element and the sensor, whereas the first main connection organ is able to transmit forces in the x-direction between the carriage and the one of the reference element and the sensor. At the same time sufficient flexibility is offered, for the two force transmittals to not significantly negatively influence each other. Instead of using distinctive first auxiliary and main connection organs, it is also possible to use one single connection organ which offers both the required flexibility as well as the ability to transmit forces.
In an advantageous embodiment, the platform can be movably guided along the first carriage in the y-direction, while a second actuator then can be provided for displacing the platform along the first carriage in the y-direction.
In a further embodiment the system is constructed such that it further may comprise a second linear main guide extending in the y-direction, a second carriage that is movably guided by means of a second main bearing along the second linear main guide, in which the platform is movably guided along the second carriage in the x-direction, in which the platform is connected such to the second carriage that the platform gets moved along with the second carriage in the y-direction, and in which the second actuator is designed for displacing the second carriage together with the platform along the second linear main guide in the y-direction. The measuring means then may comprise a second reference element and a second sensor which together are designed for determining a position of the platform, and in particular of said earlier mentioned optional chuck part thereof, in the x-direction. For this one of the second reference element and second sensor is connected to the platform, and in particular of said earlier mentioned optional chuck part thereof, for moving along with the platform when it is displaced in the x-direction, whereas the other one of the second reference element and second sensor is connected to the second carriage for moving along with the second carriage when it is displaced together with the platform along the second main guide in the y-direction. In a manner similar to the one described above for the y-direction position measurement, a second linear auxiliary guide can be provided which extends in the y-direction, wherein the one of the second reference element and second sensor that is connected to the second carriage for moving along therewith, gets movably guided by means of a second auxiliary bearing along this second linear auxiliary guide. Thus the same advantages as mentioned above for the y-direction position measurement, can now also be obtained for the position measurement in the x-direction.
With this it is noted that the displacing of the platform by means of the carriages can be achieved by means of one of the carriages being provided directly on top of and thus supported by the other one. It is however also possible that each of the carriages only have to bear their own weight and not have to bear each other’s weight by using two fully independently movable elongate beam-like carriages that have the platform movably connected thereto right above where they intercross each other. The platform then can be supported by means of suitable bearings on top of a bottom plate or by the carriages. By moving the respective carriages in the x- and/or y-directions, the platform then can also get displaced over the bottom plate towards certain aimed target x- and y-positions.
If desired it is also possible to perform a rotational position measurement around the z-axis, by providing two sets of the reference elements and sensors on opposing sides of the platform, both reference elements then extending in a same direction.
In a manner similar to the one described above for the y-direction position measurement, the one of the second reference element and second sensor that is connected to the second carriage for moving along therewith may be connected thereto by means of a suitable connection organ that is rigid in the direction of motion, here the y-direction and that preferably is able to offer flexibility in the direction of measurement, here the x-direction. Furthermore this one of the second reference element and sensor, may be connected to its auxiliary bearing by means of a second auxiliary connection organ that is rigid in the direction of measurement. Again, instead of using distinctive second auxiliary and main connection organs, it is also possible to use one single connection organ which offers both the required flexibility as well as the ability to transmit forces.
In a further embodiment, the system is constructed such that it further may comprise a third linear main guide extending in the z-direction, a third carriage that is movably guided by means of a third main bearing along the third linear main guide, and a third actuator, in which a main platform part of the platform is movably guided along the first - and second carriage in the x- and y-direction, in which the third linear main guide is connected to the main platform part such that the third linear main guide moves along with the main platform part when the main platform part gets displaced, in which a sub-platform part of the platform, which sub-platform part for example may form or carry said earlier mentioned optional chuck part, is carried such by the third carriage that the sub-platform part gets moved along with the third carriage in the z-direction, and in which the third actuator is designed for displacing the third carriage together with the sub-platform part along the third linear main guide in the z-direction. The measuring means then may comprise a third reference element and a third sensor which together are designed for determining a position of the sub-platform part in the z-direction. For this, one of the third reference element and third sensor is connected to the sub-platform part for moving along with the sub-platform part when it is displaced in the z-direction, whereas the other one of the third reference element and third sensor is connected to the main platform part for moving along with the main platform part when it is displaced together with the sub-platform part along the first - or second main guide in the x-or y-direction. A third auxiliary guide can be provided which extends in the x- and/or y-direction, wherein the one of the third reference element and third sensor that is connected to the main platform part for moving along therewith, gets movably guided by means of a third auxiliary bearing along this third linear auxiliary guide. Thus the same advantages as mentioned above for the x- and y-direction position measurement, can now also be obtained for the position measurement in the z-direction.
In a manner similar to the one described above for the x- and y-direction position measurement, the one of the third reference element and third sensor that is connected to the platform for moving along therewith may be connected thereto by means of a suitable connection organ that is rigid in the direction of motion, here the x- and y-direction and that is able to offer flexibility in the direction of measurement, here the z-direction. Furthermore, this one of the third reference element and third sensor, may be connected to its auxiliary bearing by means of a third auxiliary connection organ that is rigid in the direction of measurement. Again, instead of using distinctive third auxiliary and main connection organs, it is also possible to use one single connection organ which offers both the required flexibility as well as the ability to transmit forces.
The auxiliary guide and auxiliary bearing can be of all kinds of types. Important is that together they are able to offer a positioning accuracy of the respective one of the reference element and sensor, that is to say the one that is connected to the carriage, which positioning accuracy is better than the one between the main guide and the main bearing. In particular the auxiliary guide has a greater straightness than the main guide, and/or the auxiliary bearing is more steady than the main bearing.
In a preferred embodiment the auxiliary bearing is a contactless bearing, in particular an air bearing or a magnetic bearing. Thus small irregularities, unevenness’s, roughness’s, or the like in the auxiliary guide hardly have any influence on the positioning of the one of the reference element and sensor in the direction perpendicular thereto.
In a further embodiment, the system is constructed such that the platform comprises a fine-adjustment platform part, that for example may form said earlier mentioned optional chuck part. The fine-adjustment platform part then can be carried such by a main platform part of the platform that it gets moved along with this main platform part when that gets displaced by the respective actuator(s) in the x-, y- and/or z-direction. One or more subactuators can then be provided in between the fine-adjustment platform part and the main platform part, which one or more sub-actuators are designed for a fine-adjustment of an x-, y- and/or z-position of the fine-adjustment platform part with respect to the main platform part. Thus the fine-adjustment platform part advantageously forms a fine-stroke stage in which the one or a set of the sub-actuators are designed for accurate adjustment of the position of the fine-adjustment platform part, in particular with respect to the first, second and/or third reference element, in which the actuators are connected to the main platform part or to the third carriage such that the actuators move along with this main platform part or third carriage when the main platform part or third carriage gets displaced and in which the sub-actuators are connected to the fine-adjustment platform part such that it can be displaced relative to the main platform part such that the accuracy of the position of the fine-adjustment platform part relative to in particular the first, second and/or third reference element can be improved.
In a further embodiment the auxiliary guide may be made out of granite. This material can be made truly flat and thus offer a reliable guiding between the auxiliary guide and auxiliary bearing. Furthermore the granite auxiliary guide can advantageously be combined with a granite plate below the carriages on top of which the platform can be supported.
The measuring means may be of all kinds of types and for example comprise an interferometer. Preferably however, the invention makes it possible to use an encoder ruler as reference element and an encoder head as sensor.
In particular, the sensor can be connected to the platform or to the chuck, and the reference element can be connected to its respective carriage. This may help to save weight for the movable platform, which makes it possible to more accurately or quickly get it positioned.
The main bearing can be a roller bearing or plain bearing or air bearing or any other type. Since according to the invention the measuring accuracy gets to be largely independent of the main bearing, it needs to be less steady and can be made somewhat more lightweight and/or economic.
The main bearing and the actuator can be combined in a spindle drive.
In case of the platform comprising said optional chuck part, the connection between a main platform part of the platform and this chuck part then may have mechanical -, pneumatic -, or magnetic stiffness or may have stiffness that is generated by small stroke actuators in combination with feedback and/or feedforward control.
The reference element advantageously may extend in a direction perpendicular to the direction in which its respective carriage is movably guided. It is then possible to use sets of opposing main guides and auxiliary guides such that both the carriage as well as the one of the reference element and sensor that extend between them and that are guided along them are doubly supported and guided.
Further preferred embodiments are stated in the dependent subclaims.
The invention also relates to a method for operating the positioning system according to claim 15.
The invention shall be explained in more detail below with reference to the accompanying drawings, in which: - Fig. 1 schematically shows a top view of an embodiment of a positioning system according to the invention; - Fig. 2 schematically shows a variant thereof; and - Fig. 3 schematically shows a further embodiment thereof.
In fig. 1 the entire positioning system has been indicated with the reference numeral 1. The system 1 comprises a granite plate with a flat horizontal bottom face 2 on top of which a main platform part 3 is movably supported by means of suitable bearings 4. The main platform part 3 comprises a chuck 5 on top of which a wafer can be placed.
The main platform part 3, which is also referred to as a coarse-stroke stage, can be displaced in an x- and y-direction over the flat bottom face 2. If desired a suitable fine-stroke stage displacement mechanism can be provided in between the main platform part 3 and the chuck 5.
Two interspaced first linear main guides 7 are provided which extend in the x-direction. A first carriage 8 is movably guided along these guides 7 by means of main roller bearings (only schematically shown). The first carriage 8 comprises a beam 9 which extends in the y-direction. The main platform part 3 is movably guided with a slit 10 along the beam 9 in the y-direction. A first actuator 11, comprising a magnet trail 11a and an actuator coil 11 b, is connected to the beam 9 such that when actuated it displaces the beam 9 in the x-direction.
Two interspaced second linear main guides 7’ are provided which extend in the y-direction. A second carriage 8’ is movably guided along these guides 7’ by means of main roller bearings. The second carriage 8’ comprises a beam 12 which extends in the x-direction. The main platform part 3 is movably guided with a slit 13 along the beam 12 in the x-direction. A second actuator 11’, comprising a magnet trail 11a’ and an actuator coil 11b’, is connected to the beam 12 such that when actuated it displaces the beam 12 in the y-direction.
The beam 9 is positioned above the beam 12, and the main platform part 3 is placed over an intercrossing of the beams 9, 12. By means of a suitable actuation of the first and second actuators 11, 11’ the main platform part 3 can now be quickly moved towards aimed x- and y-positions. In order to be able to properly steer and/or correct this, measuring means are provided. Those measuring means comprise two first encoder rulers 15 which extend in the y-direction, and one second encoder ruler 16 which extends in the x-direction. The chuck 5 that is connected to and placed on top of the main platform part 3, is equipped at its lower side with encoder heads (not shown), at least one for each of the rulers 15, 16.
According to the inventive thought, the two first rulers 15 with their outer free ends are connected to a plate-shaped connection organ 18 (one of which is shown). Each organ 18 is connected to a respective outer free end of the beam 9 of the carriage 8.
The organ 18 is such rigid in the x-z direction that it is able to transmit forces in those x- and z-directions between the carriage 8/beam 9 and the two first rulers 15. This effects in that the organ 18 is able to force the two first rulers 15 to move along in the x-direction together with the carriage 8 and the beam 9 as soon as those are forced to move in that x-direction by means of actuation of the first actuator. This has the advantage that the rulers 15 keep on lying at a same distance in the x-direction from their encoder heads on the main platform part 3 and/or chuck 5.
Furthermore the organ 18 is such flexible in the y-direction that any forces in this y-direction between the carriage 8/beam 9 and the two first rulers 15 are only limited transmitted via the organ 18. A first linear auxiliary guide 20 is provided which is formed by a flat vertical side face 21 of the granite plate which extends in the x-z plane. At the free outer ends of the two first rulers 15, first auxiliary bearings 24 are provided. Those auxiliary air bearings 24 are well able to run smoothly along the face 21 during movements of the carriage 8 and beam 9 in the x-direction.
The face 21 advantageously forms a truly smooth and flat linear guide for the auxiliary bearings 24 of the rulers 15, which cause the rulers 15 to maintain their proper positioning in the y-direction under all kinds of circumstances, in particular even when the main roller bearings may introduce oscillatory displacements/deformations into the beam 9 in the y-direction. Thus the position measurement in the y-direction can be made far more accurate relative to the flat vertical side face 21 of the first linear auxiliary guide 20, leading to a more accurate positioning of the main platform part 3 and chuck 5 in that y-direction.
Between the main platform 3 part and the chuck 5 a rotational actuator may be provided with which the chuck 5 can be rotated relative to the main platform part 3. Since two first rulers 15 and two complementary encoder heads are provided it is possible to also perform an accurate measurement of the rotational position around the z-axis of the chuck 5 relative to the encoder rulers 15, 16.
In a similar manner, the second ruler 16 is also connected to a plate-shaped connection organ 18’ which at its lower side is connected to the outer free end of the beam 12, whereas this organ 18’ at its upper side is connected to the free outer end of the second ruler 16. A second linear auxiliary guide 20’ then is provided which is formed by a flat vertical side face 21’ of the granite plate which extends in the y-z plane. At the free outer end of the second ruler 16, a second auxiliary bearing 24’ is provided, that is well able to run smoothly along the respective granite plate face 21’ during movements of the second carriage 8’ and beam 12 in the y-direction.
Thus also the ruler 16 is well able to maintain its proper positioning in the x-direction under all kinds of circumstances, in particular even when the main roller bearings may introduce oscillatory displacements/deformations into the beam 12 in the x-direction. Thus the position measurement in the x-direction can also be made far more accurate relative to the flat vertical side face 21’ of the second linear auxiliary guide 20’, leading to a more accurate positioning of the main platform part 3 and chuck 5 in that x-direction.
Fig. 2 shows a variant in which same parts of the system have been given same reference numerals. Like in fig. 1 the positioning system comprises a main guide 7 and an auxiliary guide 20. A carriage 8 is guided by means of a main bearing along the main guide 7, and an encoder ruler 15 is guided by means of an auxiliary bearing 24 along the auxiliary guide 20. The encoder ruler 15 is connected to the auxiliary bearing 24 by means of a first auxiliary connection organ 30 that here is shown as a kind of strut that is rigid in the y-direction and that is flexible in the x-direction. Furthermore, the encoder ruler 15 is connected to the carriage 8 by means of a first main connection organ 31 that here is shown as a kind of strut that is rigid in the x-direction and that is flexible in the y-direction. In this way also it can advantageously be achieved that any imperfectness’s in the y-direction of the main guide 7 do not get transmitted towards the encoder ruler 15. The position of the encoder ruler 15 in the y-direction remains fully determined by the auxiliary guide 20 and in this y-direction is not and cannot be negatively influenced by the main guide 7. Furthermore, the distance between the encoder ruler 15 and the platform 3 remains constant since the encoder ruler 15 is forced to move along with the carriage 8 in the x-direction. Owing to this, an encoder head 34 that is mounted on the platform 3 is able to perform optimized measurements of the y-position of the platform 3 relative to the encoder ruler 15.
Fig. 3 shows a further embodiment of the positioning system that is described in fig. 1 in which same parts of the system have been given same reference numerals. In fig. 3 the entire positioning system has been indicated with the reference numeral 1. The system 1 comprises a granite plate with a flat horizontal bottom face 2 on top of which a main platform part 3 is movably supported by means of carriages (not shown) that are movably guided along beam 9, 12. The main platform part 3, which is also referred to as a xy-coarse-stroke stage, can be displaced in an x- and y-direction over the flat bottom face 2.
Two interspaced first linear main guides 7 are provided which extend in the x-direction. A first carriage 8 (not shown) is movably guided along these guides 7 by means of main roller bearings. The first carriage 8 comprises a beam 9 which extends in the y-direction. The main platform part 3 is movably guided with a slit 10 along the beam 9 in the y-direction. A first actuator 11, comprising a magnet trail 11a and an actuator coil 11b (not shown), is connected to the beam 9 such that when actuated it displaces the beam 9 in the x-di recti on.
Two interspaced second linear main guides 7’ are provided which extend in the y-direction. A second carriage 8’ is movably guided along these guides by means of main roller bearings. The second carriage comprises a beam 12 which extends in the x-direction. The main platform part 3 is movably guided with a slit 13 along the beam 12 in the x-direction. A second actuator 11’, comprising a actuator coil 11a’ and a magnet trail 11b’, is connected to the beam 12 such that when actuated it displaces the beam 12 in the y-direction.
Three interspaced third linear main guides (not shown) are provided which extend in the z-direction. A third carriage is movably guided along the third linear main guides by means of main roller bearings. The main platform part 3 comprises a plate-shaped subplatform part 35 which extends in the xy-plane. The sub-platform part 35, which is also referred to as a xyztt-coarse-stroke stage, can be displaced in an z-direction perpendicular the flat bottom face 2 and can be rotated around the x- and y-direction. The third linear main guides are connected to the main platform part 3. Three third actuators (not shown), for example linear drives, are connected between the main platform part 3 and the sub-platform part 35 such that when actuated it displaces the sub-platform part 35 in z-direction. The third linear guide and third linear drive may be integrated into a spindle drive.
The beam 9 is positioned below the beam 12, and the main platform part 3 is placed over an intercrossing of the beams 9, 12. By means of a suitable actuation of the first and second actuators the main platform part 3 can now be quickly moved towards aimed x- and y-positions. By means of a suitable actuation of the first, second and third actuators the sub- platform part 35 can now be quickly moved towards aimed x-, y and z-positions and can be rotated around the x- and y-direction.
In order to be able to properly steer and/or correct this, measuring means are provided. Those measuring means comprise two first encoder rulers 15 which extend in the y-direction, and one second encoder ruler 16 which extends in the x-direction. The chuck 5 that here forms a fine-adjustment platform part, is carried by and placed on top of the subplatform part 35, and is equipped at its lower side with encoder heads 34 (only one is shown), at least one for each of the rulers 15, 16. The chuck 5 is also equipped with encoders heads 34’ (only one is shown), at least one for each of rulers 32.
Three interspaced third rulers 32 are connected to a plate-shaped connection organ (not shown) which at one side is connected to the main platform part 3, whereas this organ at its other side is connected to the free outer end of the third ruler 32. A third planar auxiliary guide then is provided which here is formed by the flat horizontal face 2 of the granite plate which extends in the x-y plane. At the free lower ends of the third rulers 32, third auxiliary air bearings 4 are provided, that are well able to run smoothly along the respective granite plate face 2 during movements of the main platform part 3 in the x- and y-direction. Thus also each ruler 32 is well able to maintain its proper positioning in the z-direction under all kinds of circumstances, in particular even when the main roller bearings may introduce oscillatory displacements/deformations into the main platform part 3 in the z-direction. Thus the position measurement in the z-direction can also be made far more accurate relative to the flat horizontal face 2 of the third planar auxiliary guide, leading to a more accurate positioning of the chuck 5 in that z-direction.
The chuck 5 is carried by the sub-platform part 35 by means of sub-actuators 33 (only one is shown). The sub-actuators 33 each comprise a coil 33a and a magnet 33b. The sub-actuators 33 enable improvement of the accurate positioning of the chuck 5 relative to the encoder rulers 15, 16 and 32. The bottoms of the sub-actuators 33 move along with the sub-platform part 35, and the sub-actuators 33 exert force to the chuck 5 such that the chuck 5 can be displaced relative to the main platform part 3 in such a manner that accuracy of the position of the chuck 5 relative to the encoder rulers 15, 16 and 32 can be improved. The sub-actuators 33 in addition may form a rotational sub-actuator with which the chuck 5 can be rotated relative to the main platform part 3. Since two first rulers 15 and two complementary encoder heads are provided it is possible to also perform an accurate measurement of the rotational position around the z-axis of the chuck 5 relative to the main platform part 3.
Besides the embodiment shown, numerous variants are possible. For example, the various shapes and dimensions of the various parts can be varied. Instead of encoder rulers and heads it is also possible to use interferometers or conductive sensors or even other types of measuring means. Important is that at least one of two critical components of such measuring means get to move along with respective carriages for displacing a platform or for displacing part of such a platform. Instead of separate linear main guide and actuator, a spindle drive can be used for displacing the beams. Instead of air bearings on granite reference surface, magnetic bearings can be used on metal reference surface or combinations thereof. Instead of carrying the chuck without mechanical contact, the chuck can be connected to the intermediate body without using actuators or by using piezoactuators. Instead of utilizing the intermediate sub-platform part, the sub-platform part can be omitted and the chuck can directly be carried by or connected to the main platform part. Instead of using the system for the positioning of wafers during testing and production, it is also possible to accurately position other types of products and or devices with it. Instead of using a granite plate, it is also possible to use a ceramic plate, or a plate out of another kind of suitable material.
Thus the invention provides a user-friendly, economic to manufacture, and quickly and accurately to operate positioning system with virtually unlimited range, that can advantageously be used in a metrology tool for the producing, testing and inspecting of wafers.

Claims (15)

1. Positioneersysteem, in het bijzonder voor productie, testen en inspectie van wafers, omvattende: een eerste lineaire hoofdgeleiding die zich uitstrekt in een x-richting; een eerste slede die beweegbaar is geleid door middel van een eerste hoofdlager langs de eerste lineaire hoofdgeleiding; een platform dat zodanig is verbonden met de eerste slede dat het platform wordt meebewogen met de eerste slede in de x-richting; een eerste actuator voor verplaatsing van de eerste slede tezamen met het platform langs de eerste lineaire hoofdgeleiding in de x-richting; en een eerste referentie-element en een eerste sensor die tezamen zijn ingericht voor bepaling van een positie van het platform in de y-richting, welke y-richting loodrecht staat op de x-richting, waarbij één van het eerste referentie-element en de eerste sensor is verbonden met het platform voor meebewegen met het platform wanneer het verplaatst wordt in de y-richting, en waarbij de andere van het eerste referentie-element en eerste sensor verbonden is met de eerste slede voor meebewegen met de eerste slede wanneer deze tezamen met het platform verplaatst wordt langs de eerste hoofdgeleiding in de x-richting, met het kenmerk, dat een eerste lineaire hulpgeleiding voorzien is die zich uitstrekt in de x-richting, en waarbij de ene van het eerste referentie-element en eerste sensor die verbonden is met de eerste slede voor meebewegen daarmee, beweegbaar geleid is door middel van een eerste hulplager langs de eerste lineaire hulpgeleiding.A positioning system, in particular for wafer production, testing and inspection, comprising: a first linear main guide that extends in an x direction; a first carriage that is movably guided by means of a first main bearing along the first linear main guide; a platform connected to the first carriage such that the platform is moved along with the first carriage in the x direction; a first actuator for displacing the first carriage together with the platform along the first linear main guide in the x direction; and a first reference element and a first sensor which are arranged together for determining a position of the platform in the y direction, which y direction is perpendicular to the x direction, one of the first reference element and the first sensor is connected to the platform for moving with the platform when it is moved in the y direction, and the other of the first reference element and first sensor is connected to the first carriage for moving with the first carriage when it is moving together with the platform being moved along the first main guide in the x direction, characterized in that a first linear auxiliary guide is provided which extends in the x direction, and wherein one of the first reference element and first sensor connected to it is movably guided with the first carriage for movement therewith by means of a first auxiliary bearing along the first linear auxiliary guide. 2. Positioneersysteem volgens conclusie 1, waarbij de ene van het eerste referentie-element en eerste sensor die verbonden is met de eerste slede voor meebewegen daarmee, verbonden is met deze eerste slede door middel van een eerste verbindingsorgaan dat stijf is in de x-richting, en/of waarbij de ene van het eerste referentie-element en eerste sensor die verbonden is met de eerste slede voor meebewegen daarmee, verbonden is met het eerste hulplager door middel van een eerste hulpverbindingsorgaan dat stijf is in de y-richting.A positioning system according to claim 1, wherein the one of the first reference element and first sensor connected to the first carriage for moving therewith is connected to this first carriage by means of a first connecting member that is rigid in the x direction and / or wherein the one of the first reference element and first sensor connected to the first carriage for moving therewith is connected to the first auxiliary bearing by means of a first auxiliary connecting member which is rigid in the y direction. 3. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het platform beweegbaar geleid is langs de eerste slede in de y-richting, en waarbij een tweede actuator voorzien is voor verplaatsing van het platform langs de eerste slede in de y-richting.3. A positioning system according to any one of the preceding claims, wherein the platform is movably guided along the first carriage in the y direction, and wherein a second actuator is provided for displacement of the platform along the first carriage in the y direction. 4. Positioneersysteem volgens conclusie 3, verder omvattende: een tweede lineaire hoofdgeleiding die zich uitstrekt in de y-richting; een tweede slede die beweegbaar geleid is door middel van een tweede hoofdlager langs de tweede lineaire hoofdgeleiding, waarbij het platform beweegbaar geleid is langs de tweede slede in de x-richting, waarbij het platform zodanig verbonden is met de tweede slede dat het platform wordt meebewogen met de tweede slede in de y-richting, en waarbij de tweede actuator is ingericht voor verplaatsing van de tweede slede tezamen met het platform langs de tweede lineaire hoofdgeleiding in de y-richting; en een tweede referentie-element en een tweede sensor die tezamen zijn ingericht voor bepaling van een positie van het platform in de x-richting, waarbij één van het tweede referentie-element en tweede sensor verbonden is met het platform voor meebewegen met het platform wanneer dat verplaatst wordt in de x-richting, en waarbij de andere van het tweede referentie-element en tweede sensor verbonden is met de tweede slede voor meebewegen met de tweede slede wanneer het tezamen met het platform verplaatst wordt langs de tweede hoofdgeleiding in de y-richting, waarbij een tweede lineaire hulpgeleiding voorzien is die zich uitstrekt in de y-richting, en waarbij de ene van het tweede referentie-element en tweede sensor die verbonden is met de tweede slede voor meebewegen daarmee, beweegbaar geleid is door middel van een tweede hulplager langs de tweede lineaire hulpgeleiding.The positioning system of claim 3, further comprising: a second linear main guide that extends in the y direction; a second carriage that is movably guided by means of a second main bearing along the second main linear guide, wherein the platform is movably guided along the second carriage in the x direction, the platform being connected to the second carriage such that the platform is moved along with the second carriage in the y direction, and wherein the second actuator is adapted to move the second carriage together with the platform along the second main linear guide in the y direction; and a second reference element and a second sensor which are arranged together for determining a position of the platform in the x direction, one of the second reference element and second sensor being connected to the platform for moving along with the platform when which is moved in the x-direction, and wherein the other of the second reference element and second sensor is connected to the second carriage for moving along with the second carriage when it is moved along with the platform along the second main guide in the y-direction direction, wherein a second linear auxiliary guide is provided that extends in the y direction, and wherein one of the second reference element and second sensor connected to the second carriage for moving therewith is movably guided by means of a second auxiliary bearing along the second linear auxiliary guide. 5. Positioneersysteem volgens conclusie 4, waarbij de ene van het tweede referentie-element en tweede sensor die verbonden is met de tweede slede voor meebewegen daarmee, verbonden is met deze tweede slede door middel van een tweede hoofdverbindings-orgaan dat stijf is in de y-richting, en/of waarbij de ene van het tweede referentie-element en tweede sensor die verbonden is met de tweede slede voor meebewegen daarmee, verbonden is met het tweede hulplager door middel van een tweede hulpverbindingsorgaan dat stijf is in de x-richting.The positioning system of claim 4, wherein the one of the second reference element and second sensor connected to the second carriage for moving therewith is connected to this second carriage by means of a second main connecting member which is rigid in the y direction, and / or wherein the one of the second reference element and second sensor connected to the second carriage for moving therewith is connected to the second auxiliary bearing by means of a second auxiliary connecting member which is rigid in the x direction. 6. Positioneersysteem volgens een van de voorgaande conclusies, waarbij de sensor verbonden is met het platform, en waarbij het referentie-element verbonden is met zijn respectieve slede.A positioning system according to any one of the preceding claims, wherein the sensor is connected to the platform, and wherein the reference element is connected to its respective carriage. 7. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het referen-tie-element zich uitstrekt in een richting loodrecht op de richting waarin zijn respectieve slede beweegbaar geleid is.A positioning system according to any one of the preceding claims, wherein the reference element extends in a direction perpendicular to the direction in which its respective carriage is movably guided. 8. Positioneersysteem volgens een van de voorgaande conclusies, verder omvattende: een derde lineaire hoofdgeleiding die zich uitstrekt in een z-richting, welke z-richting loodrecht staat op de x-richting en op de y-richting; een derde slede die beweegbaar geleid is door middel van een derde hoofdlager langs de derde lineaire hoofdgeleiding, waarbij het platform een hoofdplatformdeel en een sub-platformdeel omvat, waarbij het hoofdplatformdeel verplaatsbaar is door de actuatoren), waarbij het sub-platformdeel zodanig gedragen wordt door de derde slede dat het sub-platformdeel wordt meebewogen met de derde slede in de z-richting, en waarbij de derde lineaire hoofdgeleiding zodanig verbonden is met het hoofdplatformdeel dat de derde lineaire hoofdgeleiding wordt meebewogen met het hoofdplatformdeel wanneer het hoofdplatformdeel verplaatst wordt in de x- of y-richting; een derde actuator voor verplaatsing van de derde slede tezamen met het sub-platformdeel langs de derde lineaire hoofdgeleiding in de z-richting; en een derde referentie-element en een derde sensor die tezamen zijn ingericht voor bepaling van een positie van het sub-platformdeel in de z-richting, waarbij één van het derde referentie-element en derde sensor verbonden is met het sub-platformdeel voor meebewegen met het sub-platformdeel wanneer dat verplaatst wordt in de z-richting, en waarbij de andere van het derde referentie-element en derde sensor verbonden is met het hoofdplatformdeel voor meebewegen met het hoofdplatformdeel wanneer het verplaatst wordt in de x- en/of y-richting, waarbij een derde hulpgeleiding voorzien is die zich uitstrekt in de x- en/of y-richting, en waarbij de ene van het derde referentie-element een derde sensor die verbonden is met het hoofdplatformdeel voor meebewegen daarmee, beweegbaar geleid is door middel van een derde hulplager langs de derde hulpgeleiding.A positioning system according to any one of the preceding claims, further comprising: a third linear main guide that extends in a z direction, which z direction is perpendicular to the x direction and to the y direction; a third carriage which is movably guided by means of a third main bearing along the third linear main guide, the platform comprising a main platform part and a sub-platform part, the main platform part being movable by the actuators, the sub-platform part being supported by the third carriage that the sub-platform member is moved along with the third carriage in the z direction, and wherein the third main linear guide is connected to the main platform member such that the third main linear guide is moved along with the main platform member when the main platform member is moved in the x - or y direction; a third actuator for displacing the third carriage together with the sub-platform member along the third main linear guide in the z direction; and a third reference element and a third sensor which are arranged together for determining a position of the sub-platform part in the z direction, wherein one of the third reference element and third sensor is connected to the sub-platform part for moving along with the sub-platform part when it is moved in the z direction, and wherein the other of the third reference element and third sensor is connected to the main platform part for moving along with the main platform part when it is moved in the x and / or y direction, wherein a third auxiliary guide is provided which extends in the x and / or y direction, and wherein one of the third reference element is a third sensor connected to the main platform part for movement therewith, is movably guided by by means of a third auxiliary bearing along the third auxiliary guide. 9. Positioneersysteem volgens conclusie 8, waarbij de ene van het derde referentie-element en derde sensor die verbonden is met het hoofdplatformdeel voor meebewegen daarmee, verbonden is met het derde hulplager door middel van een derde hulpverbin-dingsorgaan dat stijf is in de z-richting, en/of waarbij de ene van het derde referentie-element en derde sensor die verbonden is met het hoofdplatformdeel voor meebewegen daarmee, verbonden is met het hoofdplatformdeel door middel van een derde hulpgeleidingsorgaan dat stijf is in de x- en y-richting.The positioning system of claim 8, wherein the one of the third reference element and third sensor connected to the main platform part for moving therewith is connected to the third auxiliary bearing by means of a third auxiliary connecting member which is rigid in the z-axis. direction, and / or wherein the one of the third reference element and third sensor connected to the main platform part for movement therewith is connected to the main platform part by means of a third auxiliary guide member which is rigid in the x and y directions. 10. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het platform een fijn-instellingsplatformdeel omvat, dat zodanig gedragen wordt door een hoofdplatformdeel van het platform dat het mee wordt bewogen met dit hoofdplatformdeel wanneer dat verplaatst wordt door de respectieve actuator(en) in de x-, y- en/of z-richting, waarbij één of meerdere sub-actuatoren voorzien zijn tussen het fijn-instellingsplatformdeel en het hoofdplatformdeel, waarbij één of meerdere sub-actuatoren zijn ingericht voor een fijn-instelling van een x-, y- en/of z-positie van het fijn-instellingsplatformdeel ten opzichte van het hoofdplatformdeel.10. A positioning system according to any one of the preceding claims, wherein the platform comprises a fine adjustment platform part that is carried by a main platform part of the platform such that it is moved along with this main platform part when it is moved by the respective actuator (s) in the x, y and / or z direction, wherein one or more sub-actuators are provided between the fine adjustment platform part and the main platform part, wherein one or more sub-actuators are arranged for fine adjustment of an x, y - and / or z position of the fine adjustment platform part relative to the main platform part. 11. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het hulpla-ger een contactloos lager is, in het bijzonder een luchtlager of magnetisch lager.11. A positioning system according to any one of the preceding claims, wherein the auxiliary bearing is a contactless bearing, in particular an air bearing or magnetic bearing. 12. Positioneersysteem volgens een van de voorgaande conclusies, waarbij de hulpge-leiding vervaardigd is uit graniet of uit keramiek.12. Positioning system according to one of the preceding claims, wherein the auxiliary guide is made of granite or ceramic. 13. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het referentie-element een encoderlineaal is, en de sensor een encoderkop is.A positioning system according to any of the preceding claims, wherein the reference element is an encoder linear, and the sensor is an encoder head. 14. Positioneersysteem volgens een van de voorgaande conclusies, waarbij het hoofdla-ger een rollager is.A positioning system according to any one of the preceding claims, wherein the main bearing is a roller bearing. 15. Werkwijze voor werking van het positioneersysteem volgens een van de voorgaande conclusies, omvattende de stappen: aandrijven van de eerste actuator voor verplaatsing van de eerste slede in de x-richting tezamen met het platform en tezamen met de ene van het eerste referentie-element en eerste sensor die verbonden is met de eerste slede; en het de sensor laten bepalen van de positie van het platform in de y-richting ten opzichte van het referentie-element.Method of operation of the positioning system according to one of the preceding claims, comprising the steps of: driving the first actuator for displacement of the first carriage in the x direction together with the platform and together with the one of the first reference element and first sensor connected to the first carriage; and causing the sensor to determine the position of the platform in the y direction relative to the reference element.
NL2014453A 2014-11-13 2015-03-13 Positioning system having part of a measuring means move along an auxiliary guide. NL2014453B1 (en)

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Citations (4)

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Publication number Priority date Publication date Assignee Title
DD207282A1 (en) * 1982-03-12 1984-02-22 Bredo Stitz Precision XY stage
US4676649A (en) * 1985-11-27 1987-06-30 Compact Spindle Bearing Corp. Multi-axis gas bearing stage assembly
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
EP1107067A2 (en) * 1999-12-01 2001-06-13 Asm Lithography B.V. Positioning system and lithographic apparatus comprising the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD207282A1 (en) * 1982-03-12 1984-02-22 Bredo Stitz Precision XY stage
US4676649A (en) * 1985-11-27 1987-06-30 Compact Spindle Bearing Corp. Multi-axis gas bearing stage assembly
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
EP1107067A2 (en) * 1999-12-01 2001-06-13 Asm Lithography B.V. Positioning system and lithographic apparatus comprising the same

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