JP4630541B2 - Ct検出器用の鋳造コリメータ及びその製作方法 - Google Patents
Ct検出器用の鋳造コリメータ及びその製作方法 Download PDFInfo
- Publication number
- JP4630541B2 JP4630541B2 JP2003420294A JP2003420294A JP4630541B2 JP 4630541 B2 JP4630541 B2 JP 4630541B2 JP 2003420294 A JP2003420294 A JP 2003420294A JP 2003420294 A JP2003420294 A JP 2003420294A JP 4630541 B2 JP4630541 B2 JP 4630541B2
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- Prior art keywords
- collimator
- patient
- ray
- collimators
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005266 casting Methods 0.000 title description 21
- 238000004519 manufacturing process Methods 0.000 title description 7
- 230000005855 radiation Effects 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 23
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 23
- 229910052721 tungsten Inorganic materials 0.000 claims description 23
- 239000010937 tungsten Substances 0.000 claims description 23
- 238000013170 computed tomography imaging Methods 0.000 claims description 17
- 239000004593 Epoxy Substances 0.000 claims description 7
- 229910000978 Pb alloy Inorganic materials 0.000 claims description 7
- 239000011159 matrix material Substances 0.000 claims description 7
- 239000002002 slurry Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 description 17
- 230000000712 assembly Effects 0.000 description 13
- 238000000429 assembly Methods 0.000 description 13
- 238000002591 computed tomography Methods 0.000 description 10
- 229910052715 tantalum Inorganic materials 0.000 description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 210000001520 comb Anatomy 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000012907 honey Nutrition 0.000 description 1
- 238000009206 nuclear medicine Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
Description
12 ガントリ
14 X線源
16 X線ビーム
18 検出器素子アレイ
22 患者
46 テーブル
48 ガントリ開口
200 ハニカム形状コリメータ
211 矩形状チャンネル
212 テーパ付き台形状ベーン
213 台形状チャンネル
215 X線射出表面
216 X線入射表面
220 奥行き
Claims (7)
- CTイメージング・システムであって、
ガントリと、
焦点を有し、前記ガントリに位置付けられたX線管と、
前記ガントリの前記X線管と反対に位置付けられた検出器と、
前記X線管と前記CT検出器の間に位置付けられたコリメータと、
を備え、
前記コリメータは、前記X線をコリメートするチャンネルの2次元アレイを備え、
前記チャンネルは、前記X線と一致する軸に沿ってテーパ付けされた複数の壁を備え、
前記テーパ付けされた複数の壁の厚さは、前記コリメータのX線入射表面(216)近傍の第1のアパーチャが前記コリメータのX線射出表面(215)近傍の第2のアパーチャよりも大きくなるように、X線と平行な方向で増加し、
前記コリメータがプリペイシェント・コリメータであり、
前記システムは、前記X線管と前記プリペイシェント・コリメータとの間に位置付けられたフィルタを備え、
前記コリメータは、前記チャンネル内に前記フィルタ内で発生した散乱X線放射を吸収するインサートを備えている、システム。 - 前記第1のアパーチャがX方向とY方向の両方で前記第2のアパーチャより大きい請求項1に記載のシステム。
- 前記チャンネルの2次元アレイが前記X線管の焦点位置に集束する請求項1に記載のシステム。
- 前記コリメータがタングステンと同じ又は、より高密度で高原子番号の材料を含む、請求項1に記載のシステム。
- 前記高密度高原子番号材料が、鉛、鉛合金、タングステン、エポキシ・マトリックス内に懸濁させたタングステン、及びスラリー内に懸濁させたタングステンのうちの少なくとも1つを含む、請求項4に記載のシステム。
- 前記チャンネルの所定の形状が、矩形、円形、長円形、台形、六角形及び正方形のうちの少なくとも1つを含む、請求項1に記載のシステム。
- 前記チャンネルが、ハニカム構造を形成する、請求項1に記載のシステム。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/326,020 US20040120464A1 (en) | 2002-12-19 | 2002-12-19 | Cast collimators for CT detectors and methods of making same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004195235A JP2004195235A (ja) | 2004-07-15 |
JP4630541B2 true JP4630541B2 (ja) | 2011-02-09 |
Family
ID=32593918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003420294A Expired - Fee Related JP4630541B2 (ja) | 2002-12-19 | 2003-12-18 | Ct検出器用の鋳造コリメータ及びその製作方法 |
Country Status (5)
Country | Link |
---|---|
US (3) | US20040120464A1 (ja) |
JP (1) | JP4630541B2 (ja) |
DE (1) | DE10358866A1 (ja) |
IL (1) | IL159314A (ja) |
NL (1) | NL1025090C2 (ja) |
Families Citing this family (35)
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EP1404501B1 (en) * | 2001-06-05 | 2012-08-01 | Mikro Systems Inc. | Method and mold system for manufacturing three-dimensional devices |
US7496181B2 (en) * | 2005-11-28 | 2009-02-24 | The Board Of Trustees Of The Leland Stanford Junior University | X-ray collimator for imaging with multiple sources and detectors |
US7831024B2 (en) * | 2006-03-17 | 2010-11-09 | The Trustees Of The University Of Pennsylvania | Slit-slat collimation |
US7470906B2 (en) * | 2006-09-21 | 2008-12-30 | Siemens Medical Solutions Usa, Inc. | Adaptive collimator for nuclear medicine and imaging |
JP5242080B2 (ja) * | 2007-05-31 | 2013-07-24 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | X線検出器およびx線ct装置 |
JP2008304349A (ja) * | 2007-06-08 | 2008-12-18 | Ge Medical Systems Global Technology Co Llc | シンチレータ部材およびx線ct装置 |
JP5670742B2 (ja) * | 2007-12-28 | 2015-02-18 | コーニンクレッカ フィリップス エヌ ヴェ | コンピュータ断層撮影システム用のフィルタ組立体 |
CN101661806B (zh) * | 2008-08-27 | 2012-09-26 | 北京固鸿科技有限公司 | 准直缝模块及其制造方法、准直器及辐射成像检查系统 |
WO2010036801A2 (en) | 2008-09-26 | 2010-04-01 | Michael Appleby | Systems, devices, and/or methods for manufacturing castings |
DE102008061487B4 (de) * | 2008-12-10 | 2013-01-17 | Siemens Aktiengesellschaft | Verfahren zur Herstellung eines kammartigen Kollimatorelements für eine Kollimator-Anordnung sowie Kollimatorelement |
US20100175854A1 (en) * | 2009-01-15 | 2010-07-15 | Luca Joseph Gratton | Method and apparatus for multi-functional capillary-tube interface unit for evaporation, humidification, heat exchange, pressure or thrust generation, beam diffraction or collimation using multi-phase fluid |
US9601223B2 (en) | 2009-07-21 | 2017-03-21 | Analogic Corporation | Anti-scatter grid or collimator |
US8262288B2 (en) * | 2010-01-21 | 2012-09-11 | Analogic Corporation | Focal spot position determiner |
JP2012132715A (ja) * | 2010-12-20 | 2012-07-12 | Yamaha Motor Co Ltd | 放射線遮蔽板、放射線撮像装置 |
EP2662023A1 (en) | 2011-01-07 | 2013-11-13 | Kabushiki Kaisha Toshiba, Inc. | Collimator and x-ray computed tomography apparatus |
US8571176B2 (en) * | 2011-06-17 | 2013-10-29 | General Electric Company | Methods and apparatus for collimation of detectors |
US8699659B2 (en) | 2011-06-23 | 2014-04-15 | General Electric Company | Systems and methods for focal spot motion correction |
CN102949200A (zh) * | 2011-08-26 | 2013-03-06 | 通用电气公司 | 准直器及其制造方法及专用于制造该准直器的模具组合 |
US8813824B2 (en) | 2011-12-06 | 2014-08-26 | Mikro Systems, Inc. | Systems, devices, and/or methods for producing holes |
DE102012206546B4 (de) | 2012-04-20 | 2019-06-27 | Siemens Healthcare Gmbh | Verfahren zur Herstellung eines Streustrahlungsgitters und Streustrahlungsgitter eines CT -Detektors |
EP3647822A3 (en) | 2012-05-08 | 2020-08-12 | Spectrum Dynamics Medical Limited | Nuclear medicine tomography systems, detectors and methods |
US9332946B2 (en) | 2012-06-22 | 2016-05-10 | University Of Utah Research Foundation | Adaptive control of sampling frequency for computed tomography |
US9125572B2 (en) * | 2012-06-22 | 2015-09-08 | University Of Utah Research Foundation | Grated collimation system for computed tomography |
US9198626B2 (en) | 2012-06-22 | 2015-12-01 | University Of Utah Research Foundation | Dynamic power control of computed tomography radiation source |
US9259191B2 (en) | 2012-06-22 | 2016-02-16 | University Of Utah Research Foundation | Dynamic collimation for computed tomography |
US10082473B2 (en) | 2015-07-07 | 2018-09-25 | General Electric Company | X-ray filtration |
US10646176B2 (en) | 2015-09-30 | 2020-05-12 | General Electric Company | Layered radiation detector |
US11350892B2 (en) * | 2016-12-16 | 2022-06-07 | General Electric Company | Collimator structure for an imaging system |
CN107297031B (zh) * | 2017-05-17 | 2021-05-28 | 上海交通大学 | 一种高精度放疗准直器 |
CN107703712B (zh) * | 2017-11-13 | 2023-11-14 | 中国工程物理研究院激光聚变研究中心 | 一种硬x射线条纹相机及其探测硬x射线能段的方法 |
US10799717B2 (en) * | 2018-09-29 | 2020-10-13 | Uih America, Inc. | Systems and methods for reducing a radial distance of a collimator assembly occupying |
US11723609B2 (en) * | 2020-08-28 | 2023-08-15 | Argospect Technologies Inc. | Spread field imaging collimators for radiation-based imaging and methods of using the same |
CN112730477B (zh) * | 2020-12-22 | 2023-06-16 | 北京航星机器制造有限公司 | 一种ct前准直器及其制造方法 |
US11744531B2 (en) * | 2021-06-29 | 2023-09-05 | GE Precision Healthcare LLC | Systems and methods for focal spot motion detection in both x- and y-directions and correction |
CN114054874B (zh) * | 2021-11-19 | 2022-08-16 | 厦门虹鹭钨钼工业有限公司 | 一种高精度3d打印二维准直器定位加工方法 |
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2002
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-
2003
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- 2003-12-16 DE DE10358866A patent/DE10358866A1/de not_active Withdrawn
- 2003-12-18 JP JP2003420294A patent/JP4630541B2/ja not_active Expired - Fee Related
- 2003-12-19 NL NL1025090A patent/NL1025090C2/nl not_active IP Right Cessation
-
2006
- 2006-09-20 US US11/533,611 patent/US7769127B2/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
US20070064876A1 (en) | 2007-03-22 |
US7769127B2 (en) | 2010-08-03 |
US20040120464A1 (en) | 2004-06-24 |
US7609804B2 (en) | 2009-10-27 |
NL1025090A1 (nl) | 2004-06-22 |
JP2004195235A (ja) | 2004-07-15 |
IL159314A0 (en) | 2004-06-01 |
IL159314A (en) | 2010-11-30 |
DE10358866A1 (de) | 2004-09-30 |
NL1025090C2 (nl) | 2006-04-13 |
US20070025501A1 (en) | 2007-02-01 |
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