JP4607881B2 - シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法 - Google Patents

シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法 Download PDF

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Publication number
JP4607881B2
JP4607881B2 JP2006526110A JP2006526110A JP4607881B2 JP 4607881 B2 JP4607881 B2 JP 4607881B2 JP 2006526110 A JP2006526110 A JP 2006526110A JP 2006526110 A JP2006526110 A JP 2006526110A JP 4607881 B2 JP4607881 B2 JP 4607881B2
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radiation
sensitive layer
cylindrical platform
rotation
radiation beam
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JP2007507725A (ja
JP2007507725A5 (cg-RX-API-DMAC7.html
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ラインハート，トーマス・エイ
ウッド，ロバート・エル
フリース，ロバート・ピー
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ブライト・ヴュー・テクノロジーズ，インコーポレイテッド
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00278—Lenticular sheets
    • B29D11/00288—Lenticular sheets made by a rotating cylinder
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
JP2006526110A 2003-09-11 2004-08-20 シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法 Expired - Fee Related JP4607881B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/661,916 US7190387B2 (en) 2003-09-11 2003-09-11 Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
PCT/US2004/027208 WO2005036216A2 (en) 2003-09-11 2004-08-20 Systems and methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam

Publications (3)

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JP2007507725A JP2007507725A (ja) 2007-03-29
JP2007507725A5 JP2007507725A5 (cg-RX-API-DMAC7.html) 2007-10-04
JP4607881B2 true JP4607881B2 (ja) 2011-01-05

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JP2006526110A Expired - Fee Related JP4607881B2 (ja) 2003-09-11 2004-08-20 シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法

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US (2) US7190387B2 (cg-RX-API-DMAC7.html)
EP (1) EP1664859B1 (cg-RX-API-DMAC7.html)
JP (1) JP4607881B2 (cg-RX-API-DMAC7.html)
KR (1) KR101060324B1 (cg-RX-API-DMAC7.html)
AT (1) ATE440298T1 (cg-RX-API-DMAC7.html)
DE (1) DE602004022682D1 (cg-RX-API-DMAC7.html)
WO (1) WO2005036216A2 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007507364A (ja) * 2003-09-11 2007-03-29 ブライト・ヴュー・テクノロジーズ，インコーポレイテッド 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
JP2007507364A (ja) * 2003-09-11 2007-03-29 ブライト・ヴュー・テクノロジーズ，インコーポレイテッド 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体

Also Published As

Publication number Publication date
EP1664859A2 (en) 2006-06-07
JP2007507725A (ja) 2007-03-29
US20050058947A1 (en) 2005-03-17
EP1664859B1 (en) 2009-08-19
ATE440298T1 (de) 2009-09-15
KR101060324B1 (ko) 2011-08-29
WO2005036216A3 (en) 2005-07-28
KR20070012616A (ko) 2007-01-26
DE602004022682D1 (de) 2009-10-01
US7763417B2 (en) 2010-07-27
US20060275714A1 (en) 2006-12-07
US7190387B2 (en) 2007-03-13
WO2005036216A2 (en) 2005-04-21

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