JP4535309B2 - 光学記録材料 - Google Patents
光学記録材料 Download PDFInfo
- Publication number
- JP4535309B2 JP4535309B2 JP2002541448A JP2002541448A JP4535309B2 JP 4535309 B2 JP4535309 B2 JP 4535309B2 JP 2002541448 A JP2002541448 A JP 2002541448A JP 2002541448 A JP2002541448 A JP 2002541448A JP 4535309 B2 JP4535309 B2 JP 4535309B2
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- JP
- Japan
- Prior art keywords
- element according
- diffusing element
- silicone
- light
- mask
- Prior art date
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- Expired - Lifetime
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Images
Classifications
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- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- G—PHYSICS
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- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
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- G03H2260/12—Photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Polymerisation Methods In General (AREA)
- Optical Elements Other Than Lenses (AREA)
Description
(a)シリコーンモノマー又はプレポリマーを含むシリコーンプレポリマー、又はモノマー、コモノマー、マクロモノマー又はプレポリマー、
(b)フリーラジカル重合を行うことが可能なエチレン性不飽和モノマー、および
(c)該放射線により励起してフリーラジカルを生成することが可能な光開始剤。
本発明のさらに別の面によると上述の方法により形成された拡散素子が提供される。
(a)シリコーンモノマー又はプレポリマーを含むシリコーン プレポリマー、又はモノマー、コモノマー、マクロモノマー又はプレポリマー、
(b)フリーラジカル重合を行うことが可能なエチレン性不飽和モノマー、および
(c)該放射線による励起でフリーラジカルを生成することが可能な光開始剤。
アクリレート/メタクリレート群
PPTTA(ポリエーテルポリオールテトラアクリレート)RI=1.4772
ACMO(アクリロイル モルホリン)RI=1.53
Sartomer 355、SR−355、DTMPTTA、(ジ−トリメチロールプロパン テトラアクリレート
RI=1.4758
Sartomer 399、SR−399、DiPEPA、(ジペンタエリスリトール ペンタアクリレート)RI=1.4885
Ebecryl 2047(三官能性アクリレート)RI=1.4757
Genomer 4302(脂肪族ポリエステル トリウレタン トリアクリレート、有害成分はウレタンアクリレート 100%である)RI=1.509
Photomer 4810F (アクリル酸とイソC10アルコールのエステル)またはイソデシル(IDA)C10 アクリレートRI=1.4359
Photomer 4072(トリメチロール プロポキシレート(3)トリアクリレート)
RI=1.464
Sartomer 415またはSR−415(エトキシル化トリメチロールプロパン トリアクリレート)RI=1.4699
Sartomer 492またはSR−492(プロポキシル化トリメチロールプロパン トリアクリレート)RI=1.459
Genomer 4269/M22(Genomer1122(単官能性、脂肪族ウレタンアクリレート)で希釈した脂肪族二官能性ウレタンアクリレート)RI=1.4785
トリメチロールプロパン トリアクリレート(TMPTA)
2−フェノキシエチル アクリレート(POEA)
2−フェノキシエチル メタクリレート
フェニル エトキシレート モノアクリレート
2−(p−クロロフェノキシ)エチル アクリレート
フェニル アクリレート
2−(1−ナフチロキシ)エチル アクリレート
商品名 “Genomer 4302”で提供されるウレタン アクリレートまたはアメリカ特許第5470662号;4963471号;4942112号;3658526号公報のいずれかで特定されるようなフリーラジカルで開始する付加重合可能なエチレン性不飽和モノマーのいずれか。特に重合材料に柔軟性を付与し得るポリエステル又はポリエステル アクリレートを用いるのが有利である。
ポリ(ジメチルシロキサン)、ビニル末端―粘度 850−1150cst
N−ビニル ピロリジノン(NVP)
エチル 1−ベンゾイル−2−ビニル−1−シクロプロパン カルボシキレート
バインダー
PVA MW 12800
PVA MW 10−15000
PMMA MW3300−996000
柔軟化剤
トリ(エチレン グリコール)RI=1.4550
ポリ(エチレン グリコール)メチル エーテル(平均Mn 約5000、Tm 52°)
Photomer 4810F(アクリル酸とイソC10 アルコールのエステル)またはイソデシール(IDA)C10アクリレート RI=1.4395
当該柔軟化剤の添加は適切な柔軟性を有する良好な拡散フィルムを製造するのに有利であることが見出された。
バインダー
PVA MW 12800
PVA MW 10−15000
PMMA MW 3300−996000
他のモノマー(ビニル、アクリレート群)
消泡剤
Rhodoline 646
Dehydran 1620
安定剤
4−メトキシフェノール
2,4−ジヒドロキシベンゾフェノン
光開始剤
光開始剤 タイプ1
Daracure 1173、すなわち2−ヒドロキシ−2−メチル−1−フェニル−プロパノン
Genocure DMHA、すなわち2−ヒドロキシ−2−メチル−1−フェニル−プロパノン
Genocure MBF(メチル ベンゾイル ホルメート 芳香族ケトン)RI=1.5270
Irgacure 184(1−ヒドロキシシクロヘキシルフェニルケトン)
Irgacure 369(2−ベンジル−2−(ジメチルアミノ)−4‘−モルホリノ−ブチロフェノン)
Lucrin TPO(ジフェニル(2,4,6−トリメチルベンゾイル)ホスフィン オキサイド)
光開始剤 タイプ II
4−(p−トリルチオ)ベンゾフェノン(タイプ II 開始剤)
Speedcure ITX(2−イソプロピルチオキサンタノンと4−イソプロピルチオキサンタノンの混合物―アミン相乗剤を要するタイプII開始剤)
Speedcure DETX[(2,4−ジエチルチオキサントン)−アミン相乗剤を要するタイプ II開始剤]
Speedcure EDB(エチル−4−(ジメチルアミノ)ベンゾエート(アミン相乗剤)
Speedcure PDA (ポリ[オキシ(メチル−1,2−エタンジイル)] アルファ−[(ジメチルアミノ)ベンジル−w−ブトキシ](アミン相乗剤))
エチル−4−ジメチルアミノベンゾエート
“Speedcure PDA“の商品名で供給されるようなアミノベンゾエート誘導体(アミン相乗剤)
トリエチルアミン
“Genomer 5248および5275”の商品名で供給されるオリゴアミン、エチル−4−(ジメチルアミノ)ベンゾエート(アミン相乗剤)。商品名 Speedcure EDB
Actilane 800は、マンチェスターのAkros化学社から入手されるシリコーン二官能性アクリレート製品である;Daracure 1173は2−ヒドロキシ−2−メチル−1−フェニル−1−プロパノンである;PVAはポリ(ビニルアセテート) MW12800である:TMPTAはトリメチロールプロパン トリアクリレートである;POEAは2−フェノキシエチル アクリレートである;Rahn 99−662はシリコーン アクリレート スイスのRAHN社からの入手される製品である。
“スクリーン印刷技術”により、どの場合もテンプレート(template)(すなわち、重合性材料を収容するための中央開口を画定するプラスチックフィルムの輪郭または枠)がガラス タイルまたは光学マスク上に載置された。重合性処方のものを攪拌し、十分な量が上記開口で区画される凹みに可能な限り泡を生じないよう気をつけながら配置された。一枚の離型剤処理のマイラー(Mylar)(登録商標)(ポリエステル)が、離型剤塗布の面が一定量の配合処方に対するように上を覆うように注意深く置かれ、そしてローラーが、配合処方がテンプレート内の凹みを均一に充填して広がるように重ね置いた上を通過した。
表3
画角(Angle of View)データ
参照試料 画角
MCL 70 23
MCL 71 27
MCL 76 16
MCL 77 22
MCL 78 13
MCL 83 20
注:試料MCL 83は小さすぎるために正確に測定できなかった。
表4
配合−Actilaneベース
表5
配合−Rahnベース
表7
表8
比較目的のために、同じ機器(図6)を用いて同じ操作がシリコーン アクリレートと光開始剤のみからなる対照試料に対して行われた。この対照試料にはまた等価のサンプルがマスクの有る無しで拡散素子を作成するのに使用された。これらの対照試料に対する対応する結果が以下の表9に示される。マスクの有り無しで拡散素子を作成しそしてホログラム創生のための操作は表7と8に関連して上に記載されるとおりであった。
表9
表9の参照記号”曇り(haze ヘーズ)”に関連し非常に弱い拡散素子では軸外光伝達(off-axis transmission)を観測することにより当該曇りと光ガイド構造の拡散素子の拡散特性の差異を認識することが可能であることが示されるべきである。ヘーズは厚みに依存しているから、軸上のものと比較してヘーズは入射光が軸外である程度に応じて増加する。光ガイド構造を含む材料は軸外ではより透明となる。
上の表7、8および9に示すように、露光工程の間粘度が十分低く拡散できるならば、シリコーン アクリレートは開口マスクを使用すると、またマスク無しでもある程度は拡散素子を形成する能力がある。MCL213におけるPPTTAモノマーの存在はこのことを説明しており、そして211と213の違いは分子量(MW)の重要性を示唆する。これらの結果からシリコーン(またはシロキサン)とアクリル(またはメタクリレート)モノマーの適当な割合による組み合わせが拡散素子とホログラムの両方を創製するのに用いることができると理解できる。
セクション A
セクション B
表10
CN990はSartomer社からで、
Perenol S71 UVはCognis社からである。
表12
表13:非平行化対平行化光
Claims (21)
- 固体の光透過性拡散素子であって、該光拡散素子はフリーラジカル光重合系に実質的に平行な放射線を照射することにより形成される体積屈折率変調または表面起伏を有し、前記系は、以下からなる。
(a)アクリル酸エステル末端のポリ(ジメチルシロキサン)、シリコーン アクリル酸エステルまたは多官能性シリコーン アクリル酸エステルからなるシリコーン基含有モノマー、プレポリマー、マクロモノマー、またはコモノマー、
(b)トリメチロールプロパン トリアクリレート(TMPTA)、N−ビニルピペリジノン(NVP)、2−フェノキシエチルアクリレート(POEA)またはアクリロイルモルホリン(ACMO)からなる群から選ばれる少なくとも1種からなるフリーラジカル重合を行なうことが可能なエチレン性不飽和モノマー
(c)以下から選ばれる光重合開始剤
a)ベンゾイル蟻酸メチル
b)1−ヒドロキシシクロヘキシル フェニルケトン
c)2−ヒドロキシ−2−メチル−1−フェニル−1−プロパノン
d)ジフェニル(2,4,6−トリメチルベンゾイル)ホスフィンオキシド
e)2,4−ジエチルチオキサントンおよび適宜のアミン相乗剤、または
上記の二つまたはそれ以上の混合物
ここで、前記系はフリーラジカル開始光重合によって完全に重合するものである。 - シリコーン基を含むモノマー、マクロモノマー、コモノマーまたはプレポリマーが二官能性シリコーン アクリル酸エステルである請求項1に記載の拡散素子。
- シリコーン基を含むモノマー、マクロモノマー、コモノマーまたはプレポリマーが置換多官能性シリコーン アクリル酸エステルである請求項1または2に記載の拡散素子。
- シリコーン基を含むモノマー、マクロモノマー、コモノマーまたはプレポリマーが、ウレタン アクリル酸エステルまたはアクリルアミドの置換多官能シリコーン アクリル酸エステルである請求項1〜3のいずれかに記載の拡散素子。
- さらに相溶する一つまたは複数のポリマーまたはモノマーを含む請求項1〜4のいずれかに記載の光拡散素子。
- 一つまたはそれ以上の追加の相溶性成分が前記フリーラジカル光重合系の成分を構成する重合性シリコーンと実質的に相違する屈折率を有する請求項5に記載の拡散素子。
- 相溶性の複数のポリマーがポリ酢酸ビニル、ポリメタクリ酸メチルおよびシリコーンガム材を含む請求項5に記載の拡散素子。
- 一つまたは複数の相溶性モノマーが不飽和有機化合物である請求項5に記載の拡散素子。
- 不飽和有機化合物が多官能である請求項8に記載の拡散素子。
- 不飽和有機化合物が、アクリル酸エステル、メタクリル酸エステル、エポキシまたはエチレン性基を含む請求項8または9に記載の拡散素子。
- 相溶する極性有機溶剤を含む請求項5に記載の拡散素子。
- 極性有機溶剤がメチルエチルケトンである請求項11に記載の拡散素子。
- 前記放射線が紫外線である請求項1〜12のいずれかに記載の拡散素子。
- シリコーン含量が前記フリーラジカル光重合系の光重合性配合中の15−90%である請求項1〜13のいずれかに記載の拡散素子。
- シリコーン含量が前記フリーラジカル光重合系の光重合性配合中の25−80%である請求項1〜14のいずれかに記載の拡散素子。
- シリコーン含量が前記フリーラジカル光重合系の光重合性配合中の30−60%である請求項1〜15のいずれかに記載の拡散素子。
- 97%以上の偏光保持を示す請求項1から13のいずれかに記載の拡散素子。
- 99%以上の偏光保持を示す請求項17に記載の拡散素子。
- 40度より大なる画角を有する請求項1から13のいずれかに記載の拡散素子。
- 50度より大なる画角を有する請求項19に記載の拡散素子。
- 画角が表面起伏に依存することなく定められる請求項19または20に記載の拡散素子。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0027580A GB0027580D0 (en) | 2000-11-10 | 2000-11-10 | Improvements in or relating to optical recording materials |
GB0029403A GB0029403D0 (en) | 2000-12-01 | 2000-12-01 | Improvements in or relating to optical recording materials |
GB0109809A GB0109809D0 (en) | 2001-04-20 | 2001-04-20 | Improvements in or relating to optical recording materials |
PCT/GB2001/004981 WO2002039185A1 (en) | 2000-11-10 | 2001-11-09 | Optical recording materials |
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JP2004526174A JP2004526174A (ja) | 2004-08-26 |
JP2004526174A5 JP2004526174A5 (ja) | 2005-12-22 |
JP4535309B2 true JP4535309B2 (ja) | 2010-09-01 |
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JP2002541448A Expired - Lifetime JP4535309B2 (ja) | 2000-11-10 | 2001-11-09 | 光学記録材料 |
JP2002541446A Pending JP2004525394A (ja) | 2000-11-10 | 2001-11-09 | 光学記録材料 |
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JP2002541446A Pending JP2004525394A (ja) | 2000-11-10 | 2001-11-09 | 光学記録材料 |
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US (2) | US20040067323A1 (ja) |
EP (2) | EP1344108B1 (ja) |
JP (2) | JP4535309B2 (ja) |
AU (3) | AU2002223792A1 (ja) |
WO (3) | WO2002039185A1 (ja) |
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2001
- 2001-11-09 US US10/416,481 patent/US20040067323A1/en not_active Abandoned
- 2001-11-09 WO PCT/GB2001/004981 patent/WO2002039185A1/en active Application Filing
- 2001-11-09 AU AU2002223792A patent/AU2002223792A1/en not_active Abandoned
- 2001-11-09 WO PCT/GB2001/004973 patent/WO2002039183A1/en active Application Filing
- 2001-11-09 EP EP01993846.3A patent/EP1344108B1/en not_active Expired - Lifetime
- 2001-11-09 JP JP2002541448A patent/JP4535309B2/ja not_active Expired - Lifetime
- 2001-11-09 WO PCT/GB2001/004978 patent/WO2002039184A1/en not_active Application Discontinuation
- 2001-11-09 AU AU2002223793A patent/AU2002223793A1/en not_active Abandoned
- 2001-11-09 AU AU2002214143A patent/AU2002214143A1/en not_active Abandoned
- 2001-11-09 EP EP01982601A patent/EP1336131A1/en not_active Withdrawn
- 2001-11-09 JP JP2002541446A patent/JP2004525394A/ja active Pending
- 2001-11-09 US US10/416,397 patent/US7232651B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU2002214143A1 (en) | 2002-05-21 |
JP2004525394A (ja) | 2004-08-19 |
EP1344108B1 (en) | 2018-07-11 |
EP1336131A1 (en) | 2003-08-20 |
AU2002223793A1 (en) | 2002-05-21 |
US20040067323A1 (en) | 2004-04-08 |
US7232651B2 (en) | 2007-06-19 |
WO2002039184A1 (en) | 2002-05-16 |
US20040219457A1 (en) | 2004-11-04 |
AU2002223792A1 (en) | 2002-05-21 |
JP2004526174A (ja) | 2004-08-26 |
WO2002039185A1 (en) | 2002-05-16 |
EP1344108A1 (en) | 2003-09-17 |
WO2002039183A1 (en) | 2002-05-16 |
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