JP4989223B2 - 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 - Google Patents
外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 Download PDFInfo
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- 230000005855 radiation Effects 0.000 title claims abstract description 180
- 238000003384 imaging method Methods 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims description 78
- 230000003287 optical effect Effects 0.000 claims description 214
- 229920002120 photoresistant polymer Polymers 0.000 claims description 117
- 239000004744 fabric Substances 0.000 claims description 43
- 238000004519 manufacturing process Methods 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 13
- 238000010030 laminating Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 223
- 239000000758 substrate Substances 0.000 description 76
- 230000008569 process Effects 0.000 description 21
- 239000002243 precursor Substances 0.000 description 18
- 238000011161 development Methods 0.000 description 16
- 230000018109 developmental process Effects 0.000 description 16
- 238000005286 illumination Methods 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000013519 translation Methods 0.000 description 10
- 239000012467 final product Substances 0.000 description 9
- 238000003491 array Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 5
- 230000010076 replication Effects 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 230000004323 axial length Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000003362 replicative effect Effects 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002789 length control Methods 0.000 description 1
- 230000009021 linear effect Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Laminated Bodies (AREA)
Description
本発明は、微細加工方法およびシステム、特に、微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体に関する。
Claims (15)
- 光学的微細構造マスタ型の生地を製造するための装置であって、
光学的微細構造体の像をその中に結像させるのに適った放射線感応性材料の層で第1のフレキシブル・ウェブ上をコーティングするように構成された放射線感応性材料コーティング・ステーションと、
光学的微細構造体の像をその中に結像させるのに適った前記放射線感応性材料の層に前記第1のフレキシブル・ウェブの反対側にて第2のフレキブル・ウェブでラミネート加工を施すように構成されたラミネート加工ステーションとを具備し、
前記放射線感応性材料の層はネガ型フォトレジストの層で、
前記ネガ型フォトレジストの層は所定の周波数にある放射線に感応し、前記第1のフレキシブル・ウェブはその所定の周波数にある放射線に対して透過性があり、
前記第2のフレキシブル・ウェブは前記所定の周波数にある放射線に対して透過性がない
ことを特徴とする装置。 - 光学的微細構造マスタ型の生地を製造するための方法であって、
光学的微細構造体の像をその中に結像させるのに適った放射線感応性材料の層で第1のフレキシブル・ウェブ上をコーティングする工程と、
光学的微細構造体の像をその中に結像させるのに適った前記放射線感応性材料の層に前記第1のフレキシブル・ウェブの反対側にて第2のフレキブル・ウェブでラミネート加工を施す工程と、
前記放射線感応性材料の層はネガ型フォトレジストの層で、
前記ネガ型フォトレジストの層は所定の周波数にある放射線に感応し、前記第1のフレキシブル・ウェブはその所定の周波数にある放射線に対して透過性があり、
前記第2のフレキシブル・ウェブは前記所定の周波数にある放射線に対して透過性がない
ことを特徴とする方法。 - 光学的微細構造マスタ型の生地であって、
狭い間隔を置いて離れた1対のフレキシブル・ウェブと、
狭い間隔を置いて離れた前記1対のフレキシブル・ウェブの間に挟み込まれており、光学的微細構造体の像をその中に結像させるのに適った放射線感応層と、
を備え、
前記放射線感応層はネガ型フォトレジスト層で、
前記ネガ型フォトレジスト層は所定の周波数にある放射線に感応し、前記1対のフレキシブル・ウェブの一方はその所定の周波数にある放射線に対して透過性があり、
前記1対のフレキシブル・ウェブの他方は前記所定の周波数にある放射線に対して透過性がない
ことを特徴とする生地。 - 光学的微細構造マスタ型を製造する方法であって、
シリンダ形プラットフォーム上に、第1の外層とこの第1の外層上にあるネガ型フォトレジスト層とこのネガ型フォトレジスト層上にある第2の外層とを備える光学的微細構造マスタ型生地を、前記第1の外層が前記シリンダ形プラットフォームに隣接し、かつ前記第2の外層が前記シリンダ形プラットフォームからは離れているように配置する工程と、レーザビームを前記第2の外層を通して前記ネガ型フォトレジスト層内に照射し、その間、それと同時に前記シリンダ形プラットフォームをその軸の周りに回転させ、同じくそれと同時にレーザビームを前記ネガ型フォトレジスト層の少なくとも一部分にわたって軸方向にラスタ走査して、前記ネガ型フォトレジスト層内に光学的微細構造体を結像させる工程と、
前記第1の外層を前記シリンダ形プラットフォームから分離する工程と、
前記第1の外層を前記ネガ型フォトレジストから分離する工程と、
前記ネガ型フォトレジスト層内に結像した光学的微細構造体を現像する工程と、
を含む、ことを特徴とする方法。 - 第2世代のスタンパを、前記ネガ型フォトレジスト層内に現像された光学的微細構造体から、それらの光学的微細構造体をスタンパ生地に接触させることによって生成する工程を更に含む、ことを特徴とする請求項4に記載の方法。
- 前記第2世代のスタンパを生成する工程は、
第2世代のスタンパを、前記ネガ型フォトレジスト層内に現像された光学的微細構造体から、それらの光学的微細構造体をスタンパ生地に対して押しつけることによって生成する工程を含む、ことを特徴とする請求項5に記載の方法。 - 前記第2世代のスタンパを生成する工程は、
第2世代のスタンパを、前記ネガ型フォトレジスト層内に現像された光学的微細構造体から、それらの光学的微細構造体をスタンパ生地に対して転がすことによって生成する工程を含む、ことを特徴とする請求項5に記載の微細構造マスタ型の製造方法。 - 前記光学的微細構造マスタ型生地は第1の光学的微細構造マスタ型生地であって、前記第1の外層を前記シリンダ形プラットフォームから分離する工程の後に、
第2世代のスタンパを、前記第1の光学的微細構造マスタ型生地のネガ型フォトレジスト層内に現像された光学的微細構造体から、それらの光学的微細構造体をスタンパ生地に接触させることによって生成する工程と、
前記シリンダ形プラットフォーム上に、第1の外層とこの第1の外層上にあるネガ型フォトレジスト層とこのネガ型フォトレジスト層上にある第2の外層とから成る第2の光学的微細構造マスタ型生地を、前記第1の外層が前記シリンダ形プラットフォームに隣接し、かつ前記第2の外層が前記シリンダ形プラットフォームからは離れているように配置する工程と、
レーザビームを前記第2の光学的微細構造マスタ型生地の第2の外層を通して前記第2の光学的微細構造マスタ型生地のネガ型フォトレジスト層内に照射し、その間、それと同時に前記シリンダ形プラットフォームをその軸の周りに回転させ、同じくそれと同時にレーザビームを前記第2の光学的微細構造マスタ型生地のネガ型フォトレジスト層の少なくとも一部分にわたって軸方向にラスタ走査して、前記第2の光学的微細構造マスタ型生地のネガ型フォトレジスト層内に光学的微細構造体を結像させる工程と、が実行され、
前記第2世代のスタンパを生成する工程と前記レーザビームを前記第2の光学的微細構造マスタ型生地の第2の外層を通して照射する工程は、時間的に少なくとも部分的に重なる、ことを特徴とする請求項4に記載の方法。 - 前記シリンダ形プラットフォームおよび/またはレーザビームを互いに相対的に軸方向に同時に並進させる工程を更に含む、ことを特徴とする請求項4に記載の方法。
- レーザビームの振幅を同時かつ連続的に変化させる工程を更に含む、ことを特徴とする請求項9に記載の方法。
- 前記光学的微細構造マスタ型生地は、少なくとも約30.48cm(1フィート)四方の面積を有することを特徴とする請求項4に記載の方法。
- 前記レーザビームを照射する工程は、前記光学的微細構造マスタ型生地上において少なくとも約1時間にわたって継続的に実行される、ことを特徴とする請求項11に記載の方法。
- 前記レーザビームを照射する工程は、少なくとも約百万個の光学的微細構造体を形成するために前記光学的微細構造マスタ型生地上において少なくとも約1時間にわたって継続的に実行される、ことを特徴とする請求項12に記載の方法。
- 複数の第3世代の光学的微細構造最終製品をスタンパから直接形成する工程を更に含む、ことを特徴とする請求項6に記載の方法。
- 前記第1および第2の外層はフレキシブルであることを特徴とする請求項4に記載の微細構造マスタ型の製造方法。
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US10/661,974 US7192692B2 (en) | 2003-09-11 | 2003-09-11 | Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers |
US10/661,974 | 2003-09-11 | ||
PCT/US2004/027071 WO2005036271A2 (en) | 2003-09-11 | 2004-08-20 | Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby |
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US7521667B2 (en) * | 2003-06-23 | 2009-04-21 | Advanced Optical Technologies, Llc | Intelligent solid state lighting |
US7192692B2 (en) * | 2003-09-11 | 2007-03-20 | Bright View Technologies, Inc. | Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers |
US7190387B2 (en) * | 2003-09-11 | 2007-03-13 | Bright View Technologies, Inc. | Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam |
US7262912B2 (en) * | 2004-02-12 | 2007-08-28 | Bright View Technologies, Inc. | Front-projection screens including reflecting layers and optically absorbing layers having apertures therein, and methods of fabricating the same |
US7808706B2 (en) | 2004-02-12 | 2010-10-05 | Tredegar Newco, Inc. | Light management films for displays |
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-
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- 2003-09-11 US US10/661,974 patent/US7192692B2/en active Active
-
2004
- 2004-08-20 AT AT04809596T patent/ATE527579T1/de not_active IP Right Cessation
- 2004-08-20 KR KR1020067004898A patent/KR101192624B1/ko not_active IP Right Cessation
- 2004-08-20 WO PCT/US2004/027071 patent/WO2005036271A2/en active Search and Examination
- 2004-08-20 EP EP04809596A patent/EP1664929B1/en not_active Expired - Lifetime
- 2004-08-20 JP JP2006526105A patent/JP4989223B2/ja not_active Expired - Lifetime
-
2006
- 2006-08-17 US US11/465,358 patent/US7425407B1/en not_active Expired - Lifetime
- 2006-08-17 US US11/465,373 patent/US20070003868A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2007507364A (ja) | 2007-03-29 |
KR20070005910A (ko) | 2007-01-10 |
EP1664929B1 (en) | 2011-10-05 |
US20080233519A1 (en) | 2008-09-25 |
WO2005036271A2 (en) | 2005-04-21 |
US7192692B2 (en) | 2007-03-20 |
US20050058949A1 (en) | 2005-03-17 |
US7425407B1 (en) | 2008-09-16 |
ATE527579T1 (de) | 2011-10-15 |
US20070003868A1 (en) | 2007-01-04 |
WO2005036271A3 (en) | 2005-08-04 |
KR101192624B1 (ko) | 2012-10-18 |
EP1664929A2 (en) | 2006-06-07 |
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