JP2007507364A5 - - Google Patents

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Publication number
JP2007507364A5
JP2007507364A5 JP2006526105A JP2006526105A JP2007507364A5 JP 2007507364 A5 JP2007507364 A5 JP 2007507364A5 JP 2006526105 A JP2006526105 A JP 2006526105A JP 2006526105 A JP2006526105 A JP 2006526105A JP 2007507364 A5 JP2007507364 A5 JP 2007507364A5
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JP
Japan
Prior art keywords
layer
radiation
optical microstructure
optical
fabric
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JP2006526105A
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English (en)
Japanese (ja)
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JP4989223B2 (ja
JP2007507364A (ja
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Priority claimed from US10/661,974 external-priority patent/US7192692B2/en
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Publication of JP2007507364A5 publication Critical patent/JP2007507364A5/ja
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Publication of JP4989223B2 publication Critical patent/JP4989223B2/ja
Anticipated expiration legal-status Critical
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JP2006526105A 2003-09-11 2004-08-20 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 Expired - Lifetime JP4989223B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/661,974 2003-09-11
US10/661,974 US7192692B2 (en) 2003-09-11 2003-09-11 Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
PCT/US2004/027071 WO2005036271A2 (en) 2003-09-11 2004-08-20 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby

Publications (3)

Publication Number Publication Date
JP2007507364A JP2007507364A (ja) 2007-03-29
JP2007507364A5 true JP2007507364A5 (cg-RX-API-DMAC7.html) 2007-10-04
JP4989223B2 JP4989223B2 (ja) 2012-08-01

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JP2006526105A Expired - Lifetime JP4989223B2 (ja) 2003-09-11 2004-08-20 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体

Country Status (6)

Country Link
US (3) US7192692B2 (cg-RX-API-DMAC7.html)
EP (1) EP1664929B1 (cg-RX-API-DMAC7.html)
JP (1) JP4989223B2 (cg-RX-API-DMAC7.html)
KR (1) KR101192624B1 (cg-RX-API-DMAC7.html)
AT (1) ATE527579T1 (cg-RX-API-DMAC7.html)
WO (1) WO2005036271A2 (cg-RX-API-DMAC7.html)

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