TW201913091A - 紙基生物感測器圖案的製作方法 - Google Patents

紙基生物感測器圖案的製作方法 Download PDF

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TW201913091A
TW201913091A TW106128013A TW106128013A TW201913091A TW 201913091 A TW201913091 A TW 201913091A TW 106128013 A TW106128013 A TW 106128013A TW 106128013 A TW106128013 A TW 106128013A TW 201913091 A TW201913091 A TW 201913091A
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paper
based biosensor
substrate
hydrophobic
photoresist material
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簡秀紋
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鴻海精密工業股份有限公司
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Priority to US15/692,353 priority patent/US20190056656A1/en
Publication of TW201913091A publication Critical patent/TW201913091A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
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    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B2562/00—Details of sensors; Constructional details of sensor housings or probes; Accessories for sensors
    • A61B2562/02—Details of sensors specially adapted for in-vivo measurements
    • A61B2562/0295—Strip shaped analyte sensors for apparatus classified in A61B5/145 or A61B5/157
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    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/52—Use of compounds or compositions for colorimetric, spectrophotometric or fluorometric investigation, e.g. use of reagent paper and including single- and multilayer analytical elements
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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Abstract

本發明涉及一種紙基生物感測器圖案的製作方法。所述一種紙基生物感測器圖案的製作方法，包括以下步驟：提供一紙張作為襯底；提供一疏水性光阻材料，將所述疏水性光阻材料塗覆在所述襯底上形成一塗層；對所述塗層進行曝光處理，使曝光區域的所述疏水性光阻材料變成親水性結構，未曝光區域的所述疏水性光阻材料仍保持疏水結構，從而界定出所述紙基生物感測器的圖案。

Description

紙基生物感測器圖案的製作方法
本發明涉及一種紙基生物感測器圖案的製作方法。
紙基生物感測器作為一種感測器可以快速方便地檢測出神經毒素，其測定結果重複性高。在紙基生物感測器製作過程中，為了劃定紙基生物感測器的電極印刷和反應區的特定區域，必須先在紙張基體中製作出疏水圖案。惟，由於一般的光阻材料均係疏水性的，且紙基生物感測器所用到的紙張基體在空間結構上係一個具有三維纖維素網路矩陣，在運用光刻法形成所需圖案後，非圖案區域較難從紙張基體中去除。
有鑒於此，有必要提供一種能夠有效解決上述問題的紙基生物感測器的製作方法。
一種紙基生物感測器圖案的製作方法，包括以下步驟：
提供一紙張作為襯底；
提供一疏水性光阻材料，將所述疏水性光阻材料塗覆在所述襯底上形成一塗層；
對所述塗層進行曝光處理，使曝光區域的所述疏水性光阻材料變成親水性結構，未曝光區域的所述疏水性光阻材料仍保持疏水結構，從而界定出所述紙基生物感測器的圖案。
本發明提供的紙基生物感測器圖案的製作方法，運用疏水性物質作為光阻材料，在對所述塗層進行曝光處理的過程中，曝光區域的所述疏水性光阻材料在光照射下反應變成親水性基團，未曝光區域的所述疏水性光阻材料仍保持疏水狀態，從而界定出所述紙基生物感測器的圖案，由於所述親水性基團可直接作為紙基的襯底，不需另外去除，簡化了紙基生物感測器的制程，且減少了紙基生物感測器的製作時間。
本發明提供了一種紙基生物感測器圖案的製作方法，包括以下步驟：
第一步，提供一紙張作為紙基生物感測器的襯底。
所述襯底為親水性物質，呈三維網狀結構。所述襯底的主要成分為羥丙基纖維素(HPC)，其分子結構式為。
第二步，提供一光阻材料，將所述光阻材料塗覆在所述襯底上形成一塗層。
所述光阻材料為疏水性物質。本實施方式中，所述光阻材料為螺吡喃(SP)。其分子結構式為。所述螺毗喃在紫外光照射後開環的化學反應式如下：。
具體地，所述R優選為羧基(-COOH)。即，所述螺吡喃為1＇-（3-羧乙基）-3＇,3＇-二甲基-6-硝基螺[吲哚啉-2,2[2H]吲哚啉苯並吡喃](SPCOOH)。
其中，當所述光阻材料為SPCOOH時，將所述光阻材料以及一催化劑同時塗覆於所述襯底並置於常溫環境下，所述催化劑為N,N＇-二環己基碳二亞胺（DCC）或4-二甲氨基吡啶（DMAP），使得SPCOOH與HPC發生酯化反應，形成螺吡喃羥丙基纖維素SP-HPC。其具體反應式如下：。
第三步，提供一光罩，將所述光罩覆蓋在所述塗層上。
所述光罩具有特定的圖案。所述圖案可根據產品需要進行設計和改動。
第四步，藉由所述光罩對所述塗層進行曝光處理，使曝光區域的所述疏水性光阻材料變成親水性結構，未曝光區域的所述疏水性光阻材料仍保持疏水結構，從而界定出所述紙基生物感測器圖案。
具體地，經紫外光照射後，曝光區域的閉環的SP逐漸開環轉變為部花菁式（MC）大共軛結構，使得SP分子變為同時帶有正離子和負離子的兩性離子親水性基團。閉環的SP在紫外光照射下開環轉變為部花菁式（MC）大共軛結構的具體化學反應式如下：。
在其他實施方式中，所述光阻材料可以為其它任意疏水性物質。只需滿足所述疏水性物質在光照射情況下能轉變為親水性物質即可。
本發明提供的紙基生物感測器圖案的製作方法，運用螺吡喃等疏水性物質作為光阻材料。在對所述塗層進行曝光處理的過程中，曝光區域的所述疏水性光阻材料在光照射下反應變成親水性基團，未曝光區域的所述疏水性光阻材料仍保持疏水狀態，從而界定出所述紙基生物感測器的圖案，由於所述親水性基團可直接作為紙基的襯底，不需另外去除，簡化了紙基生物感測器的制程，且減少了紙基生物感測器的製作時間。
可以理解的係，對於本領域具有通常知識者來說，可以根據本發明的技術構思做出其他各種相應的改變與變形，而所有這些改變與變形都應屬於本發明的保護範圍。
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Claims (8)

  1. 一種紙基生物感測器圖案的製作方法，包括以下步驟： 提供一紙張作為襯底； 提供一疏水性光阻材料，將所述疏水性光阻材料塗覆在所述襯底上形成一塗層； 對所述塗層進行曝光處理，使曝光區域的所述疏水性光阻材料變成親水性結構，未曝光區域的所述疏水性光阻材料仍保持疏水結構，從而界定出所述紙基生物感測器的圖案。
  2. 如請求項1所述之紙基生物感測器圖案的製作方法，其中：所述疏水性光阻材料為螺吡喃。
  3. 如請求項2所述之紙基生物感測器圖案的製作方法，其中：所述襯底包含羥丙基纖維素，所述螺吡喃為1＇-（3-羧乙基）-3＇,3＇-二甲基-6-硝基螺[吲哚啉-2,2[2H]吲哚啉苯並吡喃]，所述1＇-（3-羧乙基）-3＇,3＇-二甲基-6-硝基螺[吲哚啉-2,2[2H]吲哚啉苯並吡喃]與一催化劑同時塗覆在所述襯底上，使得所述1＇-（3-羧乙基）-3＇,3＇-二甲基-6-硝基螺[吲哚啉-2,2[2H]吲哚啉苯並吡喃]與所述襯底中的羥丙基纖維素在所述催化劑作用下發生酯化反應，形成螺吡喃羥丙基纖維素。
  4. 如請求項3所述之紙基生物感測器圖案的製作方法，其中：所述催化劑選自N,N＇-二環己基碳二亞胺及4-二甲氨基吡啶中的一種或兩種。
  5. 如請求項2所述之紙基生物感測器圖案的製作方法，其中：在對所述塗層進行曝光處理的步驟中，曝光區域的所述螺吡喃開環形成部花菁式大共軛結構，使所述螺吡喃分子變為同時帶有正離子和負離子的兩性離子親水性基團。
  6. 如請求項1所述之紙基生物感測器圖案的製作方法，其中：所述襯底為三維網狀結構。
  7. 如請求項1所述之紙基生物感測器圖案的製作方法，其中：在所述襯底上形成所述塗層步驟之後，對所述塗層進行曝光處理的步驟之前還包括以下步驟： 提供一具有圖案的光罩，將所述光罩覆蓋在所述塗層上。
  8. 如請求項1所述之紙基生物感測器圖案的製作方法，其中：所述曝光處理採用紫外光照射的方式進行。
TW106128013A 2017-08-17 2017-08-17 紙基生物感測器圖案的製作方法 TW201913091A (zh)

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US15/692,353 US20190056656A1 (en) 2017-08-17 2017-08-31 Method for making paper-based biosensor pattern

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