JP4585697B2 - 露光装置及び光源の位置調整方法 - Google Patents

露光装置及び光源の位置調整方法 Download PDF

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Publication number
JP4585697B2
JP4585697B2 JP2001018097A JP2001018097A JP4585697B2 JP 4585697 B2 JP4585697 B2 JP 4585697B2 JP 2001018097 A JP2001018097 A JP 2001018097A JP 2001018097 A JP2001018097 A JP 2001018097A JP 4585697 B2 JP4585697 B2 JP 4585697B2
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Japan
Prior art keywords
light source
optical axis
light
optical system
projection optical
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Expired - Fee Related
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JP2001018097A
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Japanese (ja)
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JP2002222753A5 (enExample
JP2002222753A (ja
Inventor
堅一郎 森
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Canon Inc
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Canon Inc
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Priority to JP2001018097A priority Critical patent/JP4585697B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2001018097A 2001-01-26 2001-01-26 露光装置及び光源の位置調整方法 Expired - Fee Related JP4585697B2 (ja)

Priority Applications (1)

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JP2001018097A JP4585697B2 (ja) 2001-01-26 2001-01-26 露光装置及び光源の位置調整方法

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JP2001018097A JP4585697B2 (ja) 2001-01-26 2001-01-26 露光装置及び光源の位置調整方法

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JP2002222753A JP2002222753A (ja) 2002-08-09
JP2002222753A5 JP2002222753A5 (enExample) 2008-03-13
JP4585697B2 true JP4585697B2 (ja) 2010-11-24

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4489982B2 (ja) * 2001-02-05 2010-06-23 大日本印刷株式会社 露光装置
JP2004079778A (ja) * 2002-08-19 2004-03-11 Nikon Corp 露光装置、露光システム、および露光方法
US7307694B2 (en) * 2005-06-29 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method
JP2019079029A (ja) 2017-10-24 2019-05-23 キヤノン株式会社 露光装置および物品の製造方法
WO2019082727A1 (ja) * 2017-10-24 2019-05-02 キヤノン株式会社 露光装置および物品の製造方法
JP7059105B2 (ja) * 2018-05-18 2022-04-25 キヤノン株式会社 データ処理装置、データ処理方法、プログラム、およびデータ処理システム

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0622193B2 (ja) * 1986-06-02 1994-03-23 キヤノン株式会社 露光装置
JPS6320715A (ja) * 1986-07-14 1988-01-28 Matsushita Electric Ind Co Ltd 浮動型磁気ヘツド装置
JP2928277B2 (ja) * 1989-08-03 1999-08-03 株式会社日立製作所 投影露光方法及びその装置
JPH0653121A (ja) * 1992-07-28 1994-02-25 Oki Electric Ind Co Ltd 露光装置における光源ランプの位置決め機構
JP3275575B2 (ja) * 1993-10-27 2002-04-15 キヤノン株式会社 投影露光装置及び該投影露光装置を用いたデバイスの製造方法
JP2809081B2 (ja) * 1993-12-27 1998-10-08 日本電気株式会社 露光装置
JP3610175B2 (ja) * 1996-10-29 2005-01-12 キヤノン株式会社 投影露光装置及びそれを用いた半導体デバイスの製造方法
JPH10189428A (ja) * 1996-12-20 1998-07-21 Nikon Corp 照明光学装置
JP3262039B2 (ja) * 1997-07-18 2002-03-04 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JPH11102074A (ja) * 1997-09-25 1999-04-13 Nikon Corp 照明光学系及び照明光学系を有する投影露光装置
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP2000121498A (ja) * 1998-10-15 2000-04-28 Nikon Corp 結像性能の評価方法及び装置
JP2000208386A (ja) * 1999-01-08 2000-07-28 Sony Corp 露光装置および露光装置の照度均一性調整方法
JP2000260698A (ja) * 1999-03-09 2000-09-22 Canon Inc 投影露光装置およびそれを用いた半導体デバイスの製造方法

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JP2002222753A (ja) 2002-08-09

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