JP4580781B2 - スパッタリング方法及びその装置 - Google Patents
スパッタリング方法及びその装置 Download PDFInfo
- Publication number
- JP4580781B2 JP4580781B2 JP2005043618A JP2005043618A JP4580781B2 JP 4580781 B2 JP4580781 B2 JP 4580781B2 JP 2005043618 A JP2005043618 A JP 2005043618A JP 2005043618 A JP2005043618 A JP 2005043618A JP 4580781 B2 JP4580781 B2 JP 4580781B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- processing substrate
- magnetic flux
- sputtering
- magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004544 sputter deposition Methods 0.000 title claims description 78
- 239000000758 substrate Substances 0.000 claims description 108
- 230000004907 flux Effects 0.000 claims description 52
- 238000000429 assembly Methods 0.000 claims description 28
- 230000000712 assembly Effects 0.000 claims description 28
- 230000015572 biosynthetic process Effects 0.000 claims description 26
- 230000003628 erosive effect Effects 0.000 claims description 15
- 230000032258 transport Effects 0.000 claims description 9
- 230000005684 electric field Effects 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 59
- 239000007789 gas Substances 0.000 description 25
- 239000011521 glass Substances 0.000 description 18
- 230000002093 peripheral effect Effects 0.000 description 16
- 230000002159 abnormal effect Effects 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000010409 thin film Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000010891 electric arc Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Images
Classifications
-
- E—FIXED CONSTRUCTIONS
- E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
- E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
- E06B3/00—Window sashes, door leaves, or like elements for closing wall or like openings; Layout of fixed or moving closures, e.g. windows in wall or like openings; Features of rigidly-mounted outer frames relating to the mounting of wing frames
- E06B3/70—Door leaves
- E06B3/72—Door leaves consisting of frame and panels, e.g. of raised panel type
- E06B3/76—Door leaves consisting of frame and panels, e.g. of raised panel type with metal panels
-
- E—FIXED CONSTRUCTIONS
- E05—LOCKS; KEYS; WINDOW OR DOOR FITTINGS; SAFES
- E05Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES E05D AND E05F, RELATING TO CONSTRUCTION ELEMENTS, ELECTRIC CONTROL, POWER SUPPLY, POWER SIGNAL OR TRANSMISSION, USER INTERFACES, MOUNTING OR COUPLING, DETAILS, ACCESSORIES, AUXILIARY OPERATIONS NOT OTHERWISE PROVIDED FOR, APPLICATION THEREOF
- E05Y2900/00—Application of doors, windows, wings or fittings thereof
- E05Y2900/10—Application of doors, windows, wings or fittings thereof for buildings or parts thereof
- E05Y2900/13—Type of wing
- E05Y2900/132—Doors
- E05Y2900/134—Fire doors
Landscapes
- Engineering & Computer Science (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005043618A JP4580781B2 (ja) | 2004-03-19 | 2005-02-21 | スパッタリング方法及びその装置 |
CNB2005100563642A CN100535178C (zh) | 2004-03-19 | 2005-03-18 | 溅射方法及其装置 |
KR1020050022494A KR101135389B1 (ko) | 2004-03-19 | 2005-03-18 | 스퍼터링 방법 및 그 장치 |
TW094108481A TW200538569A (en) | 2004-03-19 | 2005-03-18 | Sputtering method and sputtering system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004079750 | 2004-03-19 | ||
JP2005043618A JP4580781B2 (ja) | 2004-03-19 | 2005-02-21 | スパッタリング方法及びその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005298966A JP2005298966A (ja) | 2005-10-27 |
JP4580781B2 true JP4580781B2 (ja) | 2010-11-17 |
Family
ID=35041676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005043618A Active JP4580781B2 (ja) | 2004-03-19 | 2005-02-21 | スパッタリング方法及びその装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4580781B2 (ko) |
KR (1) | KR101135389B1 (ko) |
CN (1) | CN100535178C (ko) |
TW (1) | TW200538569A (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8500975B2 (en) | 2004-01-07 | 2013-08-06 | Applied Materials, Inc. | Method and apparatus for sputtering onto large flat panels |
JP4781964B2 (ja) * | 2006-10-27 | 2011-09-28 | 信越化学工業株式会社 | マグネトロンスパッタ装置 |
JP4707693B2 (ja) * | 2007-05-01 | 2011-06-22 | 株式会社アルバック | スパッタリング装置及びスパッタリング方法 |
JP5291907B2 (ja) * | 2007-08-31 | 2013-09-18 | 株式会社アルバック | スパッタリング装置 |
US8535494B2 (en) * | 2008-03-04 | 2013-09-17 | National University Corporation Tohoku University | Rotary magnet sputtering apparatus |
US8460965B2 (en) | 2008-10-17 | 2013-06-11 | Ulvac, Inc. | Manufacturing method for solar cell |
CN102191470A (zh) * | 2010-03-09 | 2011-09-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种磁控溅射源及等离子体处理设备 |
CN102071403B (zh) * | 2011-01-30 | 2012-09-05 | 东莞市汇成真空科技有限公司 | 一种平面磁控溅射靶 |
US10106883B2 (en) | 2011-11-04 | 2018-10-23 | Intevac, Inc. | Sputtering system and method using direction-dependent scan speed or power |
KR20140071058A (ko) * | 2012-12-03 | 2014-06-11 | 코닝정밀소재 주식회사 | 롤투롤 스퍼터링 장치 |
KR102181665B1 (ko) * | 2017-11-01 | 2020-11-23 | 가부시키가이샤 알박 | 스퍼터링 장치 및 성막 방법 |
JP7007457B2 (ja) * | 2018-03-16 | 2022-01-24 | 株式会社アルバック | 成膜方法 |
CN115058695B (zh) * | 2022-08-11 | 2022-11-04 | 广州粤芯半导体技术有限公司 | 溅射方法及半导体器件的制造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0421775A (ja) * | 1990-05-14 | 1992-01-24 | Fujitsu Ltd | スパッタリング装置のカソード |
JP3514488B2 (ja) * | 1993-06-30 | 2004-03-31 | 株式会社アルバック | マグネトロンスパッタ方法及び装置 |
CN1157335A (zh) * | 1996-02-13 | 1997-08-20 | 王福贞 | 新型永磁控平面阴极电弧源 |
JP3344318B2 (ja) * | 1998-05-27 | 2002-11-11 | 日本電気株式会社 | スパッタ装置 |
JP2003239069A (ja) * | 2002-02-15 | 2003-08-27 | Ulvac Japan Ltd | 薄膜の製造方法及び装置 |
JP4246547B2 (ja) * | 2003-05-23 | 2009-04-02 | 株式会社アルバック | スパッタリング装置、及びスパッタリング方法 |
-
2005
- 2005-02-21 JP JP2005043618A patent/JP4580781B2/ja active Active
- 2005-03-18 CN CNB2005100563642A patent/CN100535178C/zh active Active
- 2005-03-18 KR KR1020050022494A patent/KR101135389B1/ko active IP Right Grant
- 2005-03-18 TW TW094108481A patent/TW200538569A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TWI377263B (ko) | 2012-11-21 |
CN1670243A (zh) | 2005-09-21 |
JP2005298966A (ja) | 2005-10-27 |
CN100535178C (zh) | 2009-09-02 |
KR101135389B1 (ko) | 2012-04-17 |
KR20060044372A (ko) | 2006-05-16 |
TW200538569A (en) | 2005-12-01 |
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