JP4558443B2 - レジスト組成物 - Google Patents

レジスト組成物 Download PDF

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Publication number
JP4558443B2
JP4558443B2 JP2004303890A JP2004303890A JP4558443B2 JP 4558443 B2 JP4558443 B2 JP 4558443B2 JP 2004303890 A JP2004303890 A JP 2004303890A JP 2004303890 A JP2004303890 A JP 2004303890A JP 4558443 B2 JP4558443 B2 JP 4558443B2
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JP
Japan
Prior art keywords
ether
glycol
alkyl
acetate
ether acetate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2004303890A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005301210A (ja
Inventor
洋和 松田
明 堀口
浩司 大谷
一史 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP2004303890A priority Critical patent/JP4558443B2/ja
Priority to TW094102975A priority patent/TW200535573A/zh
Priority to KR1020050020885A priority patent/KR101120297B1/ko
Priority to CN2005100558292A priority patent/CN1670628B/zh
Publication of JP2005301210A publication Critical patent/JP2005301210A/ja
Application granted granted Critical
Publication of JP4558443B2 publication Critical patent/JP4558443B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004303890A 2004-03-15 2004-10-19 レジスト組成物 Active JP4558443B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004303890A JP4558443B2 (ja) 2004-03-15 2004-10-19 レジスト組成物
TW094102975A TW200535573A (en) 2004-03-15 2005-02-01 Resist composition
KR1020050020885A KR101120297B1 (ko) 2004-03-15 2005-03-14 레지스트 조성물
CN2005100558292A CN1670628B (zh) 2004-03-15 2005-03-15 抗蚀剂组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004072206 2004-03-15
JP2004303890A JP4558443B2 (ja) 2004-03-15 2004-10-19 レジスト組成物

Publications (2)

Publication Number Publication Date
JP2005301210A JP2005301210A (ja) 2005-10-27
JP4558443B2 true JP4558443B2 (ja) 2010-10-06

Family

ID=35041924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004303890A Active JP4558443B2 (ja) 2004-03-15 2004-10-19 レジスト組成物

Country Status (4)

Country Link
JP (1) JP4558443B2 (ko)
KR (1) KR101120297B1 (ko)
CN (1) CN1670628B (ko)
TW (1) TW200535573A (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4752556B2 (ja) * 2005-09-22 2011-08-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP2008031248A (ja) * 2006-07-27 2008-02-14 Daicel Chem Ind Ltd 硬化性樹脂組成物及び硬化塗膜の形成方法
JP5090833B2 (ja) * 2007-09-11 2012-12-05 東京応化工業株式会社 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板
AR108932A1 (es) * 2016-07-15 2018-10-10 Dow Global Technologies Llc Concentrados emulsificables

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565947A (en) * 1978-11-10 1980-05-17 Asahi Chem Ind Co Ltd Photosensitive composition
JPH0356960A (ja) * 1989-07-26 1991-03-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH03179354A (ja) * 1989-09-19 1991-08-05 Toray Ind Inc 化学線感応性重合体組成物
JPH0784359A (ja) * 1993-09-16 1995-03-31 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH09244231A (ja) * 1996-03-08 1997-09-19 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2001117221A (ja) * 1999-08-30 2001-04-27 Samsung Electronics Co Ltd ポジティブ型フォトレジスト組成物
JP2003156838A (ja) * 2001-11-20 2003-05-30 Nippon Zeon Co Ltd 感放射線性樹脂組成物、樹脂パターン形成方法、樹脂パターン及びその利用
JP2003255521A (ja) * 2002-02-27 2003-09-10 Clariant (Japan) Kk 感光性樹脂組成物
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005234330A (ja) * 2004-02-20 2005-09-02 Fuji Photo Film Co Ltd 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960015081A (ko) * 1993-07-15 1996-05-22 마쯔모또 에이이찌 화학증폭형 레지스트 조성물
JP3860340B2 (ja) * 1998-06-08 2006-12-20 新日鐵化学株式会社 光重合性樹脂組成物

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565947A (en) * 1978-11-10 1980-05-17 Asahi Chem Ind Co Ltd Photosensitive composition
JPH0356960A (ja) * 1989-07-26 1991-03-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH03179354A (ja) * 1989-09-19 1991-08-05 Toray Ind Inc 化学線感応性重合体組成物
JPH0784359A (ja) * 1993-09-16 1995-03-31 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH09244231A (ja) * 1996-03-08 1997-09-19 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JPH10186637A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd ロールコート用放射線感応性組成物
JP2001117221A (ja) * 1999-08-30 2001-04-27 Samsung Electronics Co Ltd ポジティブ型フォトレジスト組成物
JP2003156838A (ja) * 2001-11-20 2003-05-30 Nippon Zeon Co Ltd 感放射線性樹脂組成物、樹脂パターン形成方法、樹脂パターン及びその利用
JP2003255521A (ja) * 2002-02-27 2003-09-10 Clariant (Japan) Kk 感光性樹脂組成物
JP2005234045A (ja) * 2004-02-17 2005-09-02 Fujifilm Electronic Materials Co Ltd 着色樹脂組成物
JP2005234330A (ja) * 2004-02-20 2005-09-02 Fuji Photo Film Co Ltd 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
CN1670628B (zh) 2011-02-09
KR20060044344A (ko) 2006-05-16
KR101120297B1 (ko) 2012-03-07
TWI363935B (ko) 2012-05-11
TW200535573A (en) 2005-11-01
JP2005301210A (ja) 2005-10-27
CN1670628A (zh) 2005-09-21

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