JP4549563B2 - ハロゲン含有ガスの処理装置 - Google Patents

ハロゲン含有ガスの処理装置 Download PDF

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Publication number
JP4549563B2
JP4549563B2 JP2001081777A JP2001081777A JP4549563B2 JP 4549563 B2 JP4549563 B2 JP 4549563B2 JP 2001081777 A JP2001081777 A JP 2001081777A JP 2001081777 A JP2001081777 A JP 2001081777A JP 4549563 B2 JP4549563 B2 JP 4549563B2
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Japan
Prior art keywords
gas
halogen
discharge
containing gas
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001081777A
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English (en)
Japanese (ja)
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JP2002273169A5 (enrdf_load_stackoverflow
JP2002273169A (ja
Inventor
昇 和田
昌樹 葛本
雅史 土井
豊一 後藤
清彦 吉田
康隆 稲永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2001081777A priority Critical patent/JP4549563B2/ja
Publication of JP2002273169A publication Critical patent/JP2002273169A/ja
Publication of JP2002273169A5 publication Critical patent/JP2002273169A5/ja
Application granted granted Critical
Publication of JP4549563B2 publication Critical patent/JP4549563B2/ja
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/20—Capture or disposal of greenhouse gases of methane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Treating Waste Gases (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2001081777A 2001-03-22 2001-03-22 ハロゲン含有ガスの処理装置 Expired - Fee Related JP4549563B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001081777A JP4549563B2 (ja) 2001-03-22 2001-03-22 ハロゲン含有ガスの処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001081777A JP4549563B2 (ja) 2001-03-22 2001-03-22 ハロゲン含有ガスの処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009277414A Division JP5258739B2 (ja) 2009-12-07 2009-12-07 ハロゲン含有ガスの処理装置

Publications (3)

Publication Number Publication Date
JP2002273169A JP2002273169A (ja) 2002-09-24
JP2002273169A5 JP2002273169A5 (enrdf_load_stackoverflow) 2006-12-28
JP4549563B2 true JP4549563B2 (ja) 2010-09-22

Family

ID=18937815

Family Applications (1)

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JP2001081777A Expired - Fee Related JP4549563B2 (ja) 2001-03-22 2001-03-22 ハロゲン含有ガスの処理装置

Country Status (1)

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JP (1) JP4549563B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0403797D0 (en) * 2004-02-20 2004-03-24 Boc Group Plc Gas abatement
JP5229203B2 (ja) * 2004-06-29 2013-07-03 三菱電機株式会社 揮発性有機化合物処理装置
JP2006278236A (ja) * 2005-03-30 2006-10-12 Ngk Insulators Ltd プラズマ発生電極及びプラズマ反応器
JP2006314869A (ja) * 2005-05-10 2006-11-24 L'air Liquide Sa Pour L'etude & L'exploitation Des Procede S Georges Claude 半導体プロセスチャンバからの排ガスを除害するためのシステム
GB0602506D0 (en) * 2006-02-08 2006-03-22 Boc Group Plc Method of treating a gas stream
JP4588726B2 (ja) * 2007-02-08 2010-12-01 クリーン・テクノロジー株式会社 排ガス処理装置
JP4733779B1 (ja) * 2010-07-12 2011-07-27 エドワーズ株式会社 ガス処理装置及びガス処理システム
WO2015134156A1 (en) * 2014-03-06 2015-09-11 Applied Materials, Inc. Plasma foreline thermal reactor system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6186403A (ja) * 1984-10-04 1986-05-01 Senichi Masuda セラミツクを用いたオゾナイザ−装置
JPH0838881A (ja) * 1994-08-01 1996-02-13 Toshiba Corp プラズマ化学反応装置
JPH08222354A (ja) * 1995-02-16 1996-08-30 Shinko Pantec Co Ltd 放電装置
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置

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Publication number Publication date
JP2002273169A (ja) 2002-09-24

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