JP4538493B2 - 圧電/電歪膜型素子 - Google Patents
圧電/電歪膜型素子 Download PDFInfo
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- JP4538493B2 JP4538493B2 JP2007325906A JP2007325906A JP4538493B2 JP 4538493 B2 JP4538493 B2 JP 4538493B2 JP 2007325906 A JP2007325906 A JP 2007325906A JP 2007325906 A JP2007325906 A JP 2007325906A JP 4538493 B2 JP4538493 B2 JP 4538493B2
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- Prior art keywords
- piezoelectric
- electrostrictive
- crystal
- composition
- surface layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012528 membrane Substances 0.000 title claims description 7
- 239000013078 crystal Substances 0.000 claims description 143
- 239000000203 mixture Substances 0.000 claims description 76
- 239000002245 particle Substances 0.000 claims description 56
- 229910052573 porcelain Inorganic materials 0.000 claims description 42
- 239000002344 surface layer Substances 0.000 claims description 41
- 239000000758 substrate Substances 0.000 claims description 32
- 239000006104 solid solution Substances 0.000 claims description 18
- 239000000919 ceramic Substances 0.000 claims description 17
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 15
- 229910002659 PbMg1/3Nb2/3O3 Inorganic materials 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 5
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 4
- 239000012071 phase Substances 0.000 description 31
- 230000005684 electric field Effects 0.000 description 27
- 238000000034 method Methods 0.000 description 24
- 238000006073 displacement reaction Methods 0.000 description 23
- 238000005452 bending Methods 0.000 description 13
- 230000035882 stress Effects 0.000 description 13
- 239000011777 magnesium Substances 0.000 description 10
- 238000010304 firing Methods 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 9
- 229910001928 zirconium oxide Inorganic materials 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000007650 screen-printing Methods 0.000 description 7
- 230000007704 transition Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 230000009466 transformation Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007771 core particle Substances 0.000 description 3
- 239000011258 core-shell material Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000010420 shell particle Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001887 electron backscatter diffraction Methods 0.000 description 2
- 238000002524 electron diffraction data Methods 0.000 description 2
- -1 for example Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000011268 mixed slurry Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 206010027476 Metastases Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000011246 composite particle Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000009401 metastasis Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- HYXGAEYDKFCVMU-UHFFFAOYSA-N scandium oxide Chemical compound O=[Sc]O[Sc]=O HYXGAEYDKFCVMU-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/49—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates
- C04B35/491—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates based on lead zirconates and lead titanates, e.g. PZT
- C04B35/493—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates based on lead zirconates and lead titanates, e.g. PZT containing also other lead compounds
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- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
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- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
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Description
Pbx(Mgy/3Nb2/3)aTibZrcO3 (1)
Pbx{(Mg1−yNiy)1/3×aNb2/3}bTicZrdO3 (2)
Pbx(Mgy/3Nb2/3)aTibZrcO3 (1)
Pbx{(Mg1−yNiy)1/3×aNb2/3}bTicZrdO3 (2)
c/a = d(001)/d(100) (3)
各金属元素の酸化物(PbO、NiO、Nb2O5、TiO2、及びZrO2)を、それぞれの金属元素が、組成式「Pb1.00(Ni1/3Nb2/3)0.35Ti0.41Zr0.25O3」で表される割合(モル比)となるように秤量及び混合し、水と合わせてスラリー状にした。ジルコニア製玉石のボールミルを用いて40時間混合して得られたスラリーを乾燥した後、950℃で仮焼して圧電/電歪磁器組成物を得た。得られた圧電/電歪磁器組成物を再びボールミルにより周速10m/secで粉砕処理し、粉末(粒子)表面がアモルファス相と格子歪みを含んだ結晶相で構成された、平均粒子径0.3μmの粉末状の圧電/電歪磁器組成物を得た。得られた粉末状の圧電/電歪磁器組成物に、バインダー及び溶剤を添加し、トリロールミルを用いて混合することにより圧電/電歪材料ペーストを得た。
キュリー点(Tc)及び正方晶の格子定数比が表1に示した値となるように、圧電/電歪磁器組成物の組成を調整したこと以外は、前述の実施例1と同様にして圧電/電歪膜型素子(実施例2〜3ならびに比較例1および2)を得た。得られた圧電/電歪膜型素子の各種物性値の測定結果を表1に示す。また、実施例2の圧電/電歪膜型素子の圧電/電歪部を、後方散乱電子線回折パターン法により分析した結果をディスプレー上に表示した中間調画像を示す写真を図7に示し、図7の一部を拡大して示すレプリカ図を図8に示す。なお、図7の原図においては、正方晶が赤色、菱面晶が黄色、及び擬立方晶が緑色でそれぞれ示されており、多数の結晶粒子が、正方晶を含む結晶本体部と、結晶本体部の外周に配置された、菱面晶及び擬立方晶を含む表層部と、によって構成されていることを明確に把握することができる。また、図8においては、正方晶が白抜き、菱面晶がドット、及び擬立方晶が斜線でそれぞれ示されている。更に、比較例2の圧電/電歪膜型素子の圧電/電歪部を、後方散乱電子線回折パターン法により分析した結果をディスプレー上に表示した中間調画像を示す写真を図9に示す。図9の原図においても、正方晶が赤色、菱面晶が黄色、及び擬立方晶が緑色でそれぞれ示されており、多数の結晶粒子が、正方晶を含む結晶本体部と、結晶本体部の外周の一部に配置された、菱面晶及び擬立方晶を含む表層部と、によって構成されていることを把握することができる。
Claims (6)
- セラミックス製の基体と、
チタン酸ジルコン酸鉛系の圧電/電歪磁器組成物からなる多数の結晶粒子で構成された圧電/電歪体からなる膜状の圧電/電歪部と、
前記圧電/電歪部に電気的に接続される膜状の電極と、を備え、
前記結晶粒子が、所定の結晶構造を有する結晶本体部と、前記結晶本体部の外周の少なくとも一部に配置される、前記結晶本体部の結晶構造とは異なる結晶構造を有する表層部と、を含むものであり、
前記表層部の平均厚みが、前記結晶粒子の平均粒子径の1〜15%であり、
前記圧電/電歪部が、前記基体に、直接又は前記電極を介して固着された圧電/電歪膜型素子。 - 前記結晶本体部の結晶構造が、少なくとも正方晶を含むものであり、
前記表層部の結晶構造が、菱面晶、単斜晶、及び擬立方晶からなる群より選択される少なくとも一種を含むものである請求項1に記載の圧電/電歪膜型素子。 - 前記圧電/電歪磁器組成物が、PbMg1/3Nb2/3O3−PbZrO3−PbTiO3三成分固溶系組成物を主成分として含有し、NiOを0.5〜10質量%更に含有するものである請求項1又は2に記載の圧電/電歪膜型素子。
- 前記PbMg1/3Nb2/3O3−PbZrO3−PbTiO3三成分固溶系組成物の組成が、下記一般式(1)で表される請求項3に記載の圧電/電歪膜型素子。
Pbx(Mgy/3Nb2/3)aTibZrcO3 (1)
(前記一般式(1)中、0.95≦x≦1.05、0.8≦y≦1.0であり、a、b、及びcが、a、b、及びcを座標軸とする座標中、(a,b,c)=(0.550,0.425,0.025),(0.550,0.325,0.125),(0.375,0.325,0.300),(0.100,0.425,0.475),(0.100,0.475,0.425),(0.375,0.425,0.200)で囲まれる範囲の小数である(但し、a+b+c=1.000である)) - 前記圧電/電歪磁器組成物が、Pb(Mg、Ni)1/3Nb2/3O3−PbZrO3−PbTiO3三成分固溶系組成物を含有するものである請求項1又は2に記載の圧電/電歪膜型素子。
- 前記Pb(Mg、Ni)1/3Nb2/3O3−PbZrO3−PbTiO3三成分固溶系組成物が、下記一般式(2)で表される請求項5に記載の圧電/電歪膜型素子。
Pbx{(Mg1−yNiy)1/3×aNb2/3}bTicZrdO3 (2)
(前記一般式(2)中、0.95≦x≦1.05、0≦y≦1.00、0.90≦a≦1.10であり、b、c、及びdが、b、c、及びdを座標軸とする座標中、(b,c,d)=(0.550,0.425,0.025),(0.550,0.325,0.125),(0.375,0.325,0.300),(0.100,0.425,0.475),(0.100,0.475,0.425),(0.375,0.425,0.200)で囲まれる範囲の小数である(但し、b+c+d=1.000である))
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JP5339885B2 (ja) * | 2008-12-22 | 2013-11-13 | 京セラ株式会社 | 積層型圧電素子、これを備えた噴射装置および燃料噴射システム |
JP5676148B2 (ja) * | 2010-06-01 | 2015-02-25 | 日本碍子株式会社 | 結晶配向セラミックス複合体及び圧電/電歪素子 |
JP5435802B2 (ja) * | 2010-06-25 | 2014-03-05 | 富士フイルム株式会社 | 圧電体薄膜素子及びこれを用いた超音波センサ、並びにその製造方法 |
CN103304235B (zh) * | 2013-03-01 | 2015-11-25 | 苏州市职业大学 | 一种细晶高强度pmn-pzt压电陶瓷材料的生产方法 |
JP5611427B2 (ja) * | 2013-07-31 | 2014-10-22 | 京セラ株式会社 | 積層型圧電素子、これを備えた噴射装置および燃料噴射システム |
JP6478023B2 (ja) | 2014-03-18 | 2019-03-06 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエーター装置、液体噴射ヘッド、液体噴射装置及び超音波測定装置 |
KR20150110126A (ko) * | 2014-03-24 | 2015-10-02 | 삼성전기주식회사 | 압전소자 및 이를 포함하는 압전진동자 |
JP6830527B2 (ja) * | 2017-05-09 | 2021-02-17 | 富士フイルム株式会社 | 圧電マイクロフォンチップおよび圧電マイクロフォン |
CN110795820B (zh) * | 2019-09-24 | 2021-07-16 | 武汉大学 | 工程结构裂纹问题求解方法以及装置 |
CN112257197B (zh) * | 2020-10-19 | 2022-06-28 | 郑州轻工业大学 | 一种大型铸锻件微缺陷工作应力评估方法 |
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